Patents by Inventor Shoji Ikuhara

Shoji Ikuhara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process monitoring device for sample processing apparatus and control method of sample processing apparatus
    Publication number: 20020123816
    Abstract: A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.
    Type: Application
    Filed: September 5, 2001
    Publication date: September 5, 2002
    Inventors: Junichi Tanaka, Hiroyuki Kitsunai, Hideyuki Yamamoto, Shoji Ikuhara, Kazue Takahashi
  • Remote diagnostic system for facilities and remote diagnostic method
    Publication number: 20020013908
    Abstract: The present invention provides a remote diagnostic system and diagnostic method to ensure harmony between two requirements of protection of company security and prevention of increased economic loss in the remote diagnosis of facilities.
    Type: Application
    Filed: February 23, 2001
    Publication date: January 31, 2002
    Inventors: Kouji Nishihata, Kenji Nakata, Shoji Ikuhara, Hideyuki Yamamoto, Hideaki Kondo
  • Operating method of vacuum processing system and vacuum processing system
    Patent number: 6069096
    Abstract: A vacuum processing system including two or more processing units for processing wafers and a transferring unit for carrying the wafers. In this system, even when any one of the processing units becomes inoperable because of a failure, the operation of the system can be continued, and even when a processing unit in the system requires repair or maintenance at the time of the start of operation, the system can be operated using other operable processing units without subjecting the operator to danger due to improper operation. As a result, the working efficiency of the system can be increased and the safety of the operator can be secured. In this system, the cleaning of the interior of each processing unit is performed by carrying a cleaning dummy wafer into each processing unit using the transferring unit, followed by recovery of the dummy wafer after cleaning, so that processing of wafers in the processing unit can be carried out once again.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: May 30, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Kouji Nishihata, Kazuhiro Joo, Shoji Ikuhara, Tetsuya Tahara, Shoji Okiguchi
  • Method of detecting an end point of plasma treatment
    Patent number: 4936967
    Abstract: The present invention relates to a method of and apparatus for detecting an end point of plasma treatment of a specimen.
    Type: Grant
    Filed: January 5, 1987
    Date of Patent: June 26, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Shoji Ikuhara, Keiji Tada, Yoshinao Kawasaki, Katsuyoshi Kudo, Minoru Soraoka