Patents by Inventor Shoji Miyake

Shoji Miyake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240039853
    Abstract: A communication device to be coupled to a transmission device with MC-LAG, the communication device includes a first output port coupled to an other communication device within a first route, a second output port within a second route, an iTAS device arranged in each of the first output port and the second output port, and configured to preferentially output a high priority flow, based on a set an iTAS period, a memory, and a processor coupled to the memory and configured to acquire a first iTAS period set to the iTAS device arranged in the first output port and a second iTAS period set to an iTAS device arranged in a third output port in the other communication device within the first route, and set an iTAS period of the iTAS device arranged in the second output port, based on the first and second iTAS periods.
    Type: Application
    Filed: June 1, 2023
    Publication date: February 1, 2024
    Applicant: Fujitsu Limited
    Inventors: Norikazu HIKIMOCHI, Kazuto NISHIMURA, Shoji MIYAKE, Jiro TAKEZAWA, Yoshikazu SABETTO
  • Patent number: 8444806
    Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
    Type: Grant
    Filed: July 14, 2010
    Date of Patent: May 21, 2013
    Assignees: Japan Science and Technology Agency
    Inventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
  • Patent number: 8419894
    Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
    Type: Grant
    Filed: July 14, 2010
    Date of Patent: April 16, 2013
    Assignees: Japan Science and Technology Agency
    Inventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
  • Publication number: 20100304046
    Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
    Type: Application
    Filed: July 14, 2010
    Publication date: December 2, 2010
    Applicants: JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
  • Patent number: 7785441
    Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas 16 are located on the sidewall of a vacuum chamber 11, and a RF power source is connected to three or four antennas 16 in parallel via a plate-shaped conductor 19. The length of the conductor of each antenna 16 is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor 19 improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
    Type: Grant
    Filed: December 12, 2003
    Date of Patent: August 31, 2010
    Assignees: Japan Science and Technology Agency
    Inventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
  • Publication number: 20090026195
    Abstract: This utility model relates to the improvement of the high-frequency heating device providing high-frequency electricity with the box used for the heating-up. The high-frequency electricity was generated by high-frequency oscillator in the high-frequency heating device based on the high-frequency induction heating method.
    Type: Application
    Filed: March 6, 2006
    Publication date: January 29, 2009
    Inventors: Shoji Miyake, Tasaburo Saji, Toshiyuki Ueno
  • Patent number: 7179337
    Abstract: The invention provides a method for preparing a soft magnetic material which meets demands for low iron loss, high density, high strength and high productivity. The method comprises a surface oxidation step of forming oxide films on the surfaces of a soft magnetic powder, a step of preparing a molding compound of the soft magnetic powder by mixing a soft magnetic powder and a binder with a predetermined blending ratio, a press molding step of press-molding the molding compound of the soft magnetic powder into a predetermined shape, and a sintering step of sintering the press-molded soft magnetic powder to produce a soft magnetic material, wherein a millimeter wave sintering apparatus or a discharge plasma sintering apparatus is used as a heating means in the surface oxidation step or in the sintering step.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: February 20, 2007
    Assignee: Denso Corporation
    Inventors: Yasuyoshi Suzuki, Yurio Nomura, Yoshiaki Nishijima, Shoji Miyake, Yukio Makino, Teppei Satoh
  • Patent number: 7098599
    Abstract: The whole antenna conductor is housed in the interior of a vacuum container of a plasma generator thereby to eliminate the need for an insulating partition or a top plate so that the whole induction field radiated from the antenna can be effectively utilized. Furthermore, the occurrence of abnormal discharge is suppressed to stabilize a high-density plasma by reducing the inductance of the antenna and covering the antenna conductor with an insulator.
    Type: Grant
    Filed: December 27, 2000
    Date of Patent: August 29, 2006
    Assignee: Japan Science & Technology Corporation
    Inventors: Shoji Miyake, Tatsuo Shoji, Yuichi Setsuhara
  • Patent number: 7022530
    Abstract: A silicon oxide film 102, a Pt film 103x, a Ti film 104x and a PZT film 105x are deposited in this order over a Si substrate 101. The Si substrate 101 is placed in a chamber 106 so that the PZT film 105x is irradiated with an EHF wave 108. The irradiation with the EHF wave locally heats a dielectric film such as the PZT film. As a result, it is possible to improve, for example, the leakage property of the dielectric film without adversely affecting a device formed on the Si substrate 101.
    Type: Grant
    Filed: April 3, 2002
    Date of Patent: April 4, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kiyoyuki Morita, Shoji Miyake, Michihito Ueda, Takashi Ohtsuka, Takashi Nishikawa
  • Publication number: 20060049138
    Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas 16 are located on the sidewall of a vacuum chamber 11, and a RF power source is connected to three or four antennas 16 in parallel via a plate-shaped conductor 19. The length of the conductor of each antenna 16 is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor 19 improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.
    Type: Application
    Filed: December 12, 2003
    Publication date: March 9, 2006
    Applicants: Japan Science and Technology Agency
    Inventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
  • Publication number: 20040142579
    Abstract: A silicon oxide film 102, a Pt film 103x, a Ti film 104x and a PZT film 105x are deposited in this order over a Si substrate 101. The Si substrate 101 is placed in a chamber 106 so that the PZT film 105x is irradiated with an EHF wave 108. The irradiation with the EHF wave locally heats a dielectric film such as the PZT film. As a result, it is possible to improve, for example, the leakage property of the dielectric film without adversely affecting a device formed on the Si substrate 101.
    Type: Application
    Filed: December 17, 2002
    Publication date: July 22, 2004
    Inventors: Kiyoyuki Morita, Shoji Miyake, Michihito Ueda, Takashi Ohtsuka, Takashi Nichikawa, Akira Inoue, Takeshi Takagi, Yoshihiro Hara, Minoru Kubo
  • Publication number: 20040086412
    Abstract: The invention provides a method for preparing a soft magnetic material which meets demands for low iron loss, high density, high strength and high productivity. The method comprises a surface oxidation step of forming oxide films on the surfaces of a soft magnetic powder, a step of preparing a molding compound of the soft magnetic powder by mixing a soft magnetic powder and a binder with a predetermined blending ratio, a press molding step of press-molding the molding compound of the soft magnetic powder into a predetermined shape, and a sintering step of sintering the press-molded soft magnetic powder to produce a soft magnetic material, wherein a millimeter wave sintering apparatus or a discharge plasma sintering apparatus is used as a heating means in the surface oxidation step or in the sintering step.
    Type: Application
    Filed: October 17, 2003
    Publication date: May 6, 2004
    Inventors: Yasuyoshi Suzuki, Yurio Nomura, Yoshiaki Nishijima, Shoji Miyake, Yukio Makino, Teppei Satoh
  • Publication number: 20040027293
    Abstract: The whole antenna conductor is housed in the interior of a vacuum container of a plasma generator thereby to eliminate the need for an insulating partition or a top plate so that the whole induction field radiated from the antenna can be effectively utilized. Furthermore, the occurrence of abnormal discharge is suppressed to stabilize a high-density plasma by reducing the inductance of the antenna and covering the antenna conductor with an insulator.
    Type: Application
    Filed: June 25, 2003
    Publication date: February 12, 2004
    Inventors: Shoji Miyake, Tatsuo Shoji, Yuichi Setsuhara
  • Patent number: 6287889
    Abstract: An improved gas phase synthesized diamond, CBN, BCN, or CN thin film having a modified region in which strain, defects, color and the like are reduced and/or eliminated. The thin film can be formed on a substrate or be a free-standing thin film from which the substrate has been removed. The thin film can be stably and reproducibly modified to have an oriented polycrystal structure or a single crystal structure. The thin film is modified by being subjected to and heated by microwave irradiation in a controlled atmosphere. The thin film has a modified region in which a line width of the diamond spectrum evaluated by Raman spectroscopy of 0.1 microns or greater is substantially constant along a film thickness direction of the thin film, and the line width of the modified region is 85% or less of a maximum line width of the residual portion of the film thickness.
    Type: Grant
    Filed: January 26, 2000
    Date of Patent: September 11, 2001
    Assignee: Applied Diamond, Inc.
    Inventors: Shoji Miyake, Shu-Ichi Takeda
  • Patent number: 6041052
    Abstract: A call control system can cope with a plurality of exchanges that support call control messages issued in accordance with different protocols. The call control system for use in a subscriber transmission device is located along a transmission path between a plurality of subscribers and a plurality of exchanges. The call control system includes call control message terminal sections, each of which is provided for each of the protocols that are supported by the exchanges for terminating a data link for sending and receiving a call control message to and from a corresponding exchange. A call change data processor is provided in the system for detecting a call and a clearance by a subscriber, and for requesting the call control message terminal section, which supports a protocol that corresponds to a protocol of an exchange to which is connected to the subscriber, to transmit the detected contents to the exchange that supports the protocol.
    Type: Grant
    Filed: February 3, 1997
    Date of Patent: March 21, 2000
    Assignee: Fujitsu Limited
    Inventors: Shoji Miyake, Toru Inaba, Eiji Koda
  • Patent number: 5612793
    Abstract: An image processing apparatus includes an image processing unit, a counter, and a determining unit. The image processing unit processes image data between first and second color values of an input image. The counter counts generation frequencies of the respective color values of the input image. The determining unit determines the first and second color values on the basis of the count result obtained by the counter.
    Type: Grant
    Filed: March 4, 1996
    Date of Patent: March 18, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Akio Ito, Hiroyuki Ichikawa, Yoshinori Abe, Shoji Miyake
  • Patent number: 5551679
    Abstract: A recording apparatus having a recording unit for recording images of documents on a lengthwise recording sheet or a plurality of cut recording sheets, a cutter for cutting the lengthwise recording sheet by a length corresponding to one page or the overall length of each document, and a binding device for binding with a binding member a plurality of cut recording sheets on which a group of images of each document are recorded. The group of images is recorded on one recording sheet or image data is stored in a memory, if no staple is left. The stapling position can be changed according to the selected size and orientation of recording sheets and the orientation of recorded images.
    Type: Grant
    Filed: June 24, 1992
    Date of Patent: September 3, 1996
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takehiro Yoshida, Shoji Miyake
  • Patent number: 5135817
    Abstract: Zn-Mg alloy is plated by vapor deposition on the surface of metals. Since Zn and Mg are vapor-deposited as a vapor mixture of an optional ratio on the surface of metals, plated layers of excellent corrosion resistance, peeling resistance of coating film, formability, etc. can be formed. There is disclosed a method of forming uniform vapor mixtures of Zn and Mg, and vapor-depositing them on the surface of metals as the method forming the vapor-deposited layers.
    Type: Grant
    Filed: October 23, 1990
    Date of Patent: August 4, 1992
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Kazutoshi Shimogori, Hiroshi Satoh, Masao Toyama, Hidetoshi Nishimoto, Koki Ikeda, Junji Kawahuku, Shoji Miyake, Shingo Nomura, Hirohiko Sakai
  • Patent number: 5002837
    Abstract: Zn-Mg alloy is plated by vapor deposition on the surface of metals. Since Zn and Mg are vapor-deposited as a vapor mixture of an optional ratio on the surface of metals, plated layers of excellent corrosion resistance, peeling resistance of coating film, formability, etc. can be formed. There is disclosed a method of forming uniform vapor mixtures of Zn and Mg, and vapor-depositing them on the surface of metals as the method forming the vapor-deposited layers.
    Type: Grant
    Filed: January 4, 1989
    Date of Patent: March 26, 1991
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Kazutoshi Shimogori, Hiroshi Satoh, Masao Toyama, Hidetoshi Shimoto, Koki Ikeda, Junji Kawahuku, Shoji Miyake, Shingo Nomura, Hirohiko Sakai