Patents by Inventor Shoji Miyake
Shoji Miyake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240039853Abstract: A communication device to be coupled to a transmission device with MC-LAG, the communication device includes a first output port coupled to an other communication device within a first route, a second output port within a second route, an iTAS device arranged in each of the first output port and the second output port, and configured to preferentially output a high priority flow, based on a set an iTAS period, a memory, and a processor coupled to the memory and configured to acquire a first iTAS period set to the iTAS device arranged in the first output port and a second iTAS period set to an iTAS device arranged in a third output port in the other communication device within the first route, and set an iTAS period of the iTAS device arranged in the second output port, based on the first and second iTAS periods.Type: ApplicationFiled: June 1, 2023Publication date: February 1, 2024Applicant: Fujitsu LimitedInventors: Norikazu HIKIMOCHI, Kazuto NISHIMURA, Shoji MIYAKE, Jiro TAKEZAWA, Yoshikazu SABETTO
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Patent number: 8444806Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.Type: GrantFiled: July 14, 2010Date of Patent: May 21, 2013Assignees: Japan Science and Technology AgencyInventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
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Patent number: 8419894Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.Type: GrantFiled: July 14, 2010Date of Patent: April 16, 2013Assignees: Japan Science and Technology AgencyInventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
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Publication number: 20100304046Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.Type: ApplicationFiled: July 14, 2010Publication date: December 2, 2010Applicants: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
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Patent number: 7785441Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas 16 are located on the sidewall of a vacuum chamber 11, and a RF power source is connected to three or four antennas 16 in parallel via a plate-shaped conductor 19. The length of the conductor of each antenna 16 is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor 19 improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.Type: GrantFiled: December 12, 2003Date of Patent: August 31, 2010Assignees: Japan Science and Technology AgencyInventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
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Publication number: 20090026195Abstract: This utility model relates to the improvement of the high-frequency heating device providing high-frequency electricity with the box used for the heating-up. The high-frequency electricity was generated by high-frequency oscillator in the high-frequency heating device based on the high-frequency induction heating method.Type: ApplicationFiled: March 6, 2006Publication date: January 29, 2009Inventors: Shoji Miyake, Tasaburo Saji, Toshiyuki Ueno
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Patent number: 7179337Abstract: The invention provides a method for preparing a soft magnetic material which meets demands for low iron loss, high density, high strength and high productivity. The method comprises a surface oxidation step of forming oxide films on the surfaces of a soft magnetic powder, a step of preparing a molding compound of the soft magnetic powder by mixing a soft magnetic powder and a binder with a predetermined blending ratio, a press molding step of press-molding the molding compound of the soft magnetic powder into a predetermined shape, and a sintering step of sintering the press-molded soft magnetic powder to produce a soft magnetic material, wherein a millimeter wave sintering apparatus or a discharge plasma sintering apparatus is used as a heating means in the surface oxidation step or in the sintering step.Type: GrantFiled: October 17, 2003Date of Patent: February 20, 2007Assignee: Denso CorporationInventors: Yasuyoshi Suzuki, Yurio Nomura, Yoshiaki Nishijima, Shoji Miyake, Yukio Makino, Teppei Satoh
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Patent number: 7098599Abstract: The whole antenna conductor is housed in the interior of a vacuum container of a plasma generator thereby to eliminate the need for an insulating partition or a top plate so that the whole induction field radiated from the antenna can be effectively utilized. Furthermore, the occurrence of abnormal discharge is suppressed to stabilize a high-density plasma by reducing the inductance of the antenna and covering the antenna conductor with an insulator.Type: GrantFiled: December 27, 2000Date of Patent: August 29, 2006Assignee: Japan Science & Technology CorporationInventors: Shoji Miyake, Tatsuo Shoji, Yuichi Setsuhara
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Patent number: 7022530Abstract: A silicon oxide film 102, a Pt film 103x, a Ti film 104x and a PZT film 105x are deposited in this order over a Si substrate 101. The Si substrate 101 is placed in a chamber 106 so that the PZT film 105x is irradiated with an EHF wave 108. The irradiation with the EHF wave locally heats a dielectric film such as the PZT film. As a result, it is possible to improve, for example, the leakage property of the dielectric film without adversely affecting a device formed on the Si substrate 101.Type: GrantFiled: April 3, 2002Date of Patent: April 4, 2006Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Kiyoyuki Morita, Shoji Miyake, Michihito Ueda, Takashi Ohtsuka, Takashi Nishikawa
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Publication number: 20060049138Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas 16 are located on the sidewall of a vacuum chamber 11, and a RF power source is connected to three or four antennas 16 in parallel via a plate-shaped conductor 19. The length of the conductor of each antenna 16 is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor 19 improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.Type: ApplicationFiled: December 12, 2003Publication date: March 9, 2006Applicants: Japan Science and Technology AgencyInventors: Shoji Miyake, Akinori Ebe, Tatsuo Shoji, Yuichi Setsuhara
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Publication number: 20040142579Abstract: A silicon oxide film 102, a Pt film 103x, a Ti film 104x and a PZT film 105x are deposited in this order over a Si substrate 101. The Si substrate 101 is placed in a chamber 106 so that the PZT film 105x is irradiated with an EHF wave 108. The irradiation with the EHF wave locally heats a dielectric film such as the PZT film. As a result, it is possible to improve, for example, the leakage property of the dielectric film without adversely affecting a device formed on the Si substrate 101.Type: ApplicationFiled: December 17, 2002Publication date: July 22, 2004Inventors: Kiyoyuki Morita, Shoji Miyake, Michihito Ueda, Takashi Ohtsuka, Takashi Nichikawa, Akira Inoue, Takeshi Takagi, Yoshihiro Hara, Minoru Kubo
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Publication number: 20040086412Abstract: The invention provides a method for preparing a soft magnetic material which meets demands for low iron loss, high density, high strength and high productivity. The method comprises a surface oxidation step of forming oxide films on the surfaces of a soft magnetic powder, a step of preparing a molding compound of the soft magnetic powder by mixing a soft magnetic powder and a binder with a predetermined blending ratio, a press molding step of press-molding the molding compound of the soft magnetic powder into a predetermined shape, and a sintering step of sintering the press-molded soft magnetic powder to produce a soft magnetic material, wherein a millimeter wave sintering apparatus or a discharge plasma sintering apparatus is used as a heating means in the surface oxidation step or in the sintering step.Type: ApplicationFiled: October 17, 2003Publication date: May 6, 2004Inventors: Yasuyoshi Suzuki, Yurio Nomura, Yoshiaki Nishijima, Shoji Miyake, Yukio Makino, Teppei Satoh
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Publication number: 20040027293Abstract: The whole antenna conductor is housed in the interior of a vacuum container of a plasma generator thereby to eliminate the need for an insulating partition or a top plate so that the whole induction field radiated from the antenna can be effectively utilized. Furthermore, the occurrence of abnormal discharge is suppressed to stabilize a high-density plasma by reducing the inductance of the antenna and covering the antenna conductor with an insulator.Type: ApplicationFiled: June 25, 2003Publication date: February 12, 2004Inventors: Shoji Miyake, Tatsuo Shoji, Yuichi Setsuhara
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Patent number: 6287889Abstract: An improved gas phase synthesized diamond, CBN, BCN, or CN thin film having a modified region in which strain, defects, color and the like are reduced and/or eliminated. The thin film can be formed on a substrate or be a free-standing thin film from which the substrate has been removed. The thin film can be stably and reproducibly modified to have an oriented polycrystal structure or a single crystal structure. The thin film is modified by being subjected to and heated by microwave irradiation in a controlled atmosphere. The thin film has a modified region in which a line width of the diamond spectrum evaluated by Raman spectroscopy of 0.1 microns or greater is substantially constant along a film thickness direction of the thin film, and the line width of the modified region is 85% or less of a maximum line width of the residual portion of the film thickness.Type: GrantFiled: January 26, 2000Date of Patent: September 11, 2001Assignee: Applied Diamond, Inc.Inventors: Shoji Miyake, Shu-Ichi Takeda
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Patent number: 6041052Abstract: A call control system can cope with a plurality of exchanges that support call control messages issued in accordance with different protocols. The call control system for use in a subscriber transmission device is located along a transmission path between a plurality of subscribers and a plurality of exchanges. The call control system includes call control message terminal sections, each of which is provided for each of the protocols that are supported by the exchanges for terminating a data link for sending and receiving a call control message to and from a corresponding exchange. A call change data processor is provided in the system for detecting a call and a clearance by a subscriber, and for requesting the call control message terminal section, which supports a protocol that corresponds to a protocol of an exchange to which is connected to the subscriber, to transmit the detected contents to the exchange that supports the protocol.Type: GrantFiled: February 3, 1997Date of Patent: March 21, 2000Assignee: Fujitsu LimitedInventors: Shoji Miyake, Toru Inaba, Eiji Koda
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Patent number: 5612793Abstract: An image processing apparatus includes an image processing unit, a counter, and a determining unit. The image processing unit processes image data between first and second color values of an input image. The counter counts generation frequencies of the respective color values of the input image. The determining unit determines the first and second color values on the basis of the count result obtained by the counter.Type: GrantFiled: March 4, 1996Date of Patent: March 18, 1997Assignee: Canon Kabushiki KaishaInventors: Akio Ito, Hiroyuki Ichikawa, Yoshinori Abe, Shoji Miyake
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Patent number: 5551679Abstract: A recording apparatus having a recording unit for recording images of documents on a lengthwise recording sheet or a plurality of cut recording sheets, a cutter for cutting the lengthwise recording sheet by a length corresponding to one page or the overall length of each document, and a binding device for binding with a binding member a plurality of cut recording sheets on which a group of images of each document are recorded. The group of images is recorded on one recording sheet or image data is stored in a memory, if no staple is left. The stapling position can be changed according to the selected size and orientation of recording sheets and the orientation of recorded images.Type: GrantFiled: June 24, 1992Date of Patent: September 3, 1996Assignee: Canon Kabushiki KaishaInventors: Takehiro Yoshida, Shoji Miyake
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Patent number: 5135817Abstract: Zn-Mg alloy is plated by vapor deposition on the surface of metals. Since Zn and Mg are vapor-deposited as a vapor mixture of an optional ratio on the surface of metals, plated layers of excellent corrosion resistance, peeling resistance of coating film, formability, etc. can be formed. There is disclosed a method of forming uniform vapor mixtures of Zn and Mg, and vapor-depositing them on the surface of metals as the method forming the vapor-deposited layers.Type: GrantFiled: October 23, 1990Date of Patent: August 4, 1992Assignee: Kabushiki Kaisha Kobe Seiko ShoInventors: Kazutoshi Shimogori, Hiroshi Satoh, Masao Toyama, Hidetoshi Nishimoto, Koki Ikeda, Junji Kawahuku, Shoji Miyake, Shingo Nomura, Hirohiko Sakai
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Patent number: 5002837Abstract: Zn-Mg alloy is plated by vapor deposition on the surface of metals. Since Zn and Mg are vapor-deposited as a vapor mixture of an optional ratio on the surface of metals, plated layers of excellent corrosion resistance, peeling resistance of coating film, formability, etc. can be formed. There is disclosed a method of forming uniform vapor mixtures of Zn and Mg, and vapor-depositing them on the surface of metals as the method forming the vapor-deposited layers.Type: GrantFiled: January 4, 1989Date of Patent: March 26, 1991Assignee: Kabushiki Kaisha Kobe Seiko ShoInventors: Kazutoshi Shimogori, Hiroshi Satoh, Masao Toyama, Hidetoshi Shimoto, Koki Ikeda, Junji Kawahuku, Shoji Miyake, Shingo Nomura, Hirohiko Sakai