Patents by Inventor Shoji Shiba

Shoji Shiba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11072720
    Abstract: The present invention provides an aqueous ink of active energy ray curable type for ink jet. The aqueous ink contains resin particles and a photo acid generator. The resin particles include a reactive group-containing resin having at least one reactive group selected from the group consisting of an epoxy group, an oxetanyl group and a vinyl ether group. Further provided are an ink cartridge and an ink jet recording method in which the aqueous ink is used.
    Type: Grant
    Filed: August 16, 2019
    Date of Patent: July 27, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tsuyoshi Furuse, Naofumi Shimomura, Takayuki Horiuchi, Akemi Watanabe, Yoko Uetake, Shoji Shiba
  • Publication number: 20200071554
    Abstract: The present invention provides an aqueous ink of active energy ray curable type for ink jet. The aqueous ink contains resin particles and a photo acid generator. The resin particles include a reactive group-containing resin having at least one reactive group selected from the group consisting of an epoxy group, an oxetanyl group and a vinyl ether group. Further provided are an ink cartridge and an ink jet recording method in which the aqueous ink is used.
    Type: Application
    Filed: August 16, 2019
    Publication date: March 5, 2020
    Inventors: Tsuyoshi Furuse, Naofumi Shimomura, Takayuki Horiuchi, Akemi Watanabe, Yoko Uetake, Shoji Shiba
  • Patent number: 10363740
    Abstract: A liquid ejection head includes a substrate including an energy generating element configured to generate energy used for ejecting a liquid, a flow channel member overlying the substrate and defining a flow channel through which a liquid is supplied, and an ejection opening member overlying the flow channel member and defining an ejection opening through which the liquid supplied through the flow channel is ejected by the energy from the energy generating element. The flow channel member contains a crosslinked cured product of a multifunctional epoxy resin and a polyhydric alcohol having a perfluoroalkyl group in the molecular structure, and the concentration of a component derived from the polyhydric alcohol in the flow channel member is lower on the side adjacent to the substrate than on the side adjacent to the ejection opening member.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: July 30, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroaki Mihara, Shoji Shiba
  • Publication number: 20180201018
    Abstract: A liquid ejection head includes a substrate including an energy generating element configured to generate energy used for ejecting a liquid, a flow channel member overlying the substrate and defining a flow channel through which a liquid is supplied, and an ejection opening member overlying the flow channel member and defining an ejection opening through which the liquid supplied through the flow channel is ejected by the energy from the energy generating element. The flow channel member contains a crosslinked cured product of a multifunctional epoxy resin and a polyhydric alcohol having a perfluoroalkyl group in the molecular structure, and the concentration of a component derived from the polyhydric alcohol in the flow channel member is lower on the side adjacent to the substrate than on the side adjacent to the ejection opening member.
    Type: Application
    Filed: January 10, 2018
    Publication date: July 19, 2018
    Inventors: Hiroaki Mihara, Shoji Shiba
  • Patent number: 9798236
    Abstract: In at least one embodiment of a method for forming a pattern having a hollow structure, a light-absorbing layer capable of absorbing light is formed on a surface of a photosensitive resin film. Subsequently, a substrate having a protrusion and the photosensitive resin film are bonded together so that the protrusion and the light-absorbing layer come into contact with each other. Then, the photosensitive resin film and the light-absorbing layer are patterned at one time by photolithography.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: October 24, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yohei Hamade, Shoji Shiba
  • Publication number: 20160054655
    Abstract: In at least one embodiment of a method for forming a pattern having a hollow structure, a light-absorbing layer capable of absorbing light is formed on a surface of a photosensitive resin film. Subsequently, a substrate having a protrusion and the photosensitive resin film are bonded together so that the protrusion and the light-absorbing layer come into contact with each other. Then, the photosensitive resin film and the light-absorbing layer are patterned at one time by photolithography.
    Type: Application
    Filed: August 12, 2015
    Publication date: February 25, 2016
    Inventors: Yohei Hamade, Shoji Shiba
  • Patent number: 9254660
    Abstract: A process for producing a liquid ejection head including a silicon substrate having a supply port to supply a liquid to a flow path, and an ejection-orifice-forming member forming the flow path between the ejection-orifice-forming member and the silicon substrate and having an ejection orifice to eject the liquid in the flow path. The process includes forming an etching protection film so as to cover the ejection-orifice-forming member; forming the supply port passing through the silicon substrate by anisotropic etching using an alkaline aqueous solution; and removing the etching protection film. The etching protection film includes an organic polymer material having a storage modulus at 80° C. of 1.0×106 Pa or higher.
    Type: Grant
    Filed: August 25, 2014
    Date of Patent: February 9, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroaki Mihara, Etsuko Sawada, Shoji Shiba
  • Publication number: 20150060398
    Abstract: A process for producing a liquid ejection head including a silicon substrate having a supply port to supply a liquid to a flow path, and an ejection-orifice-forming member forming the flow path between the ejection-orifice-forming member and the silicon substrate and having an ejection orifice to eject the liquid in the flow path. The process includes forming an etching protection film so as to cover the ejection-orifice-forming member; forming the supply port passing through the silicon substrate by anisotropic etching using an alkaline aqueous solution; and removing the etching protection film. The etching protection film includes an organic polymer material having a storage modulus at 80° C. of 1.0×106 Pa or higher.
    Type: Application
    Filed: August 25, 2014
    Publication date: March 5, 2015
    Inventors: Hiroaki Mihara, Etsuko Sawada, Shoji Shiba
  • Patent number: 8673546
    Abstract: A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: March 18, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazunari Ishizuka, Ken Ikegame, Shoji Shiba
  • Publication number: 20130244183
    Abstract: Provided is a process for producing an ink jet recording head, including: forming, on a substrate, a resin composition layer including a cationically polymerizable epoxy resin composition containing a specific compound; carrying out a first pattern exposure and a first heat treatment at the resin composition layer; carrying out a second pattern exposure and a second heat treatment at an unexposed portion of the resin composition layer; and, removing an unexposed portion in the first pattern exposure and in the second pattern exposure by a development treatment, thereby forming an ejection orifice for ejecting ink and an ejection portion having a taper shape in which an inner diameter reduces toward the ejection orifice.
    Type: Application
    Filed: February 19, 2013
    Publication date: September 19, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Shoji Shiba, Isamu Horiuchi
  • Patent number: 8444253
    Abstract: Provided is an inkjet head, including: a substrate having an energy generating element for generating energy to be used for ejecting liquid; and a liquid flow path forming member, which forms patterns of an ejection orifice for ejecting the liquid and a liquid flow path communicating with the ejection orifice and which has a surface subjected to water-repellent treatment, in which the inkjet head includes, in a surface having the ejection orifice, multiple water-repellent areas subjected to water-repellent treatment, and multiple recesses each having a bottom in the liquid flow path forming member and having a surface not subjected to water-repellent treatment. Also provided is a method of manufacturing an inkjet head.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: May 21, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Isamu Horiuchi, Shoji Shiba
  • Patent number: 8409454
    Abstract: A production process for a structure includes preparing a substrate on which a first layer and a second layer are provided in this order; forming a second mold, which is a part of a mold member serving as a mold for forming the structure, from the second layer; etching the first layer using the second mold as a mask and thereby forming a first mold, which is another part of the mold member from the first layer; providing a coating layer which serves as the structure to cover the first mold and the second mold; and removing the first mold and the second mold and thereby forming the structure.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: April 2, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventors: Etsuko Hino, Shoji Shiba
  • Patent number: 8304177
    Abstract: A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming layer, irradiating part of the ink flow path forming layer with ultraviolet rays for development, thereby forming an ink ejection orifice, and removing the pattern, thereby forming an ink flow path. The step of forming the pattern includes applying a positive resist containing a resin having a phenolic hydroxyl group on the substrate to form a positive resist layer, patterning the positive resist layer to form an ink flow path pattern prior to insolubilization treatment, applying a coating agent containing a compound having two vinyl ether groups on the pattern, and heat-treating the pattern coated with the coating agent.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: November 6, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shoji Shiba, Masumi Ikeda
  • Patent number: 8227043
    Abstract: A method for manufacturing a liquid discharge head includes the steps of: forming a solid layer for forming a flow path on a substrate on which an energy generating element is arranged to generate energy that is used to discharge liquid; forming, on the substrate where the solid layer is mounted, a coating layer for coating the solid layer; forming a discharge port used to discharge a liquid, through a photolithographic process, in the coating layer deposited on the solid layer; and removing the solid layer to form a flow path that communicates with the energy element and the discharge port. A material used for the coating layer contains a cationically polymerizable chemical compound, a cationic photopolymerization initiator and an inhibitor of cationic photopolymerization, and a material of the solid layer that forms a boundary with a portion where the discharge port of the coating layer is formed contains a copolymer of methacrylic acid and methacrylate ester.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: July 24, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Kubota, Takumi Suzuki, Tamaki Sato, Ryoji Kanri, Maki Hatta, Kazuhiro Asai, Shoji Shiba, Etsuko Hino, Hiroe Ishikura, Akihiko Okano
  • Publication number: 20120115985
    Abstract: A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.
    Type: Application
    Filed: October 25, 2011
    Publication date: May 10, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazunari Ishizuka, Ken Ikegame, Shoji Shiba
  • Publication number: 20120105546
    Abstract: Provided is an inkjet head, including: a substrate having an energy generating element for generating energy to be used for ejecting liquid; and a liquid flow path forming member, which forms patterns of an ejection orifice for ejecting the liquid and a liquid flow path communicating with the ejection orifice and which has a surface subjected to water-repellent treatment, in which the inkjet head includes, in a surface having the ejection orifice, multiple water-repellent areas subjected to water-repellent treatment, and multiple recesses each having a bottom in the liquid flow path forming member and having a surface not subjected to water-repellent treatment. Also provided is a method of manufacturing an inkjet head.
    Type: Application
    Filed: September 23, 2011
    Publication date: May 3, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Isamu Horiuchi, Shoji Shiba
  • Publication number: 20120058433
    Abstract: A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming layer, irradiating part of the ink flow path forming layer with ultraviolet rays for development, thereby forming an ink ejection orifice, and removing the pattern, thereby forming an ink flow path. The step of forming the pattern includes applying a positive resist containing a resin having a phenolic hydroxyl group on the substrate to form a positive resist layer, patterning the positive resist layer to form an ink flow path pattern prior to insolubilization treatment, applying a coating agent containing a compound having two vinyl ether groups on the pattern, and heat-treating the pattern coated with the coating agent.
    Type: Application
    Filed: August 26, 2011
    Publication date: March 8, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Shoji Shiba, Masumi Ikeda
  • Patent number: 8124791
    Abstract: The invention provides an active energy ray curable liquid composition containing a compound represented by a general formula (I): wherein A is a hydrogen atom or a monovalent organic residue which may be substituted, R1 and R2 are, independently of each other, a divalent organic group which may be substituted, E is an amide bond, Rn is a cyclic linking group having a carbonyl group and an unsaturated carbon-carbon bond adjacent to the carbon atom of the carbonyl group, m is a number of 0 or greater, n is a number of 2 or greater, m+n is 3, and Z is a secondary or tertiary amino bond structure, with the proviso that the amino bond may be a salt of a secondary or tertiary amine, and a liquid cartridge.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: February 28, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kenji Shinjo, Norio Ohkuma, Shoji Shiba, Hikaru Ueda, Hiroe Ishikura, Shinsuke Tsuji, Yoshikazu Saito, Kouji Harada, Yuichiro Kanasugi
  • Patent number: 8017307
    Abstract: A method for manufacturing a minute structure comprises a step of forming an ionizing radiation decomposing type positive type resist layer including a methyl isopropenyl ketone as a first positive type photosensitive material layer, a step of forming an ionizing radiation decomposing type positive type resist layer including a photosensitive material of a copolymer as a second positive type photosensitive material layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer, and development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer to form a convex shape pattern.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: September 13, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Kubota, Takumi Suzuki, Tamaki Sato, Ryoji Kanri, Maki Hatta, Kazuhiro Asai, Shoji Shiba, Hiroe Ishikura, Akihiko Okano
  • Patent number: 7971964
    Abstract: A method for manufacturing a liquid discharge head including an energy generating element, which generates energy utilized for discharging a liquid, and a discharge portion provided at a position facing the energy generating element and having a discharge port for discharging the liquid is provided. This method includes the steps of forming a negative photosensitive resin layer used for a member that forms the discharge port on the substrate, and exposing the layer to an i-line to form the discharge portion that is tapered in a direction from the substrate to the discharge port, wherein the layer has an absorbance per 1 ?m thickness of about 0.02 to about 0.07 for light used for the exposure.
    Type: Grant
    Filed: November 16, 2007
    Date of Patent: July 5, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shoji Shiba, Akihiko Okano, Yoshikazu Saito, Kazuhiro Asai, Tamaki Sato, Takumi Suzuki, Masahiko Kubota, Maki Kato, Hiroe Ishikura, Shinsuke Tsuji