Patents by Inventor Shoji Shiba
Shoji Shiba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11072720Abstract: The present invention provides an aqueous ink of active energy ray curable type for ink jet. The aqueous ink contains resin particles and a photo acid generator. The resin particles include a reactive group-containing resin having at least one reactive group selected from the group consisting of an epoxy group, an oxetanyl group and a vinyl ether group. Further provided are an ink cartridge and an ink jet recording method in which the aqueous ink is used.Type: GrantFiled: August 16, 2019Date of Patent: July 27, 2021Assignee: Canon Kabushiki KaishaInventors: Tsuyoshi Furuse, Naofumi Shimomura, Takayuki Horiuchi, Akemi Watanabe, Yoko Uetake, Shoji Shiba
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Publication number: 20200071554Abstract: The present invention provides an aqueous ink of active energy ray curable type for ink jet. The aqueous ink contains resin particles and a photo acid generator. The resin particles include a reactive group-containing resin having at least one reactive group selected from the group consisting of an epoxy group, an oxetanyl group and a vinyl ether group. Further provided are an ink cartridge and an ink jet recording method in which the aqueous ink is used.Type: ApplicationFiled: August 16, 2019Publication date: March 5, 2020Inventors: Tsuyoshi Furuse, Naofumi Shimomura, Takayuki Horiuchi, Akemi Watanabe, Yoko Uetake, Shoji Shiba
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Patent number: 10363740Abstract: A liquid ejection head includes a substrate including an energy generating element configured to generate energy used for ejecting a liquid, a flow channel member overlying the substrate and defining a flow channel through which a liquid is supplied, and an ejection opening member overlying the flow channel member and defining an ejection opening through which the liquid supplied through the flow channel is ejected by the energy from the energy generating element. The flow channel member contains a crosslinked cured product of a multifunctional epoxy resin and a polyhydric alcohol having a perfluoroalkyl group in the molecular structure, and the concentration of a component derived from the polyhydric alcohol in the flow channel member is lower on the side adjacent to the substrate than on the side adjacent to the ejection opening member.Type: GrantFiled: January 10, 2018Date of Patent: July 30, 2019Assignee: Canon Kabushiki KaishaInventors: Hiroaki Mihara, Shoji Shiba
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Publication number: 20180201018Abstract: A liquid ejection head includes a substrate including an energy generating element configured to generate energy used for ejecting a liquid, a flow channel member overlying the substrate and defining a flow channel through which a liquid is supplied, and an ejection opening member overlying the flow channel member and defining an ejection opening through which the liquid supplied through the flow channel is ejected by the energy from the energy generating element. The flow channel member contains a crosslinked cured product of a multifunctional epoxy resin and a polyhydric alcohol having a perfluoroalkyl group in the molecular structure, and the concentration of a component derived from the polyhydric alcohol in the flow channel member is lower on the side adjacent to the substrate than on the side adjacent to the ejection opening member.Type: ApplicationFiled: January 10, 2018Publication date: July 19, 2018Inventors: Hiroaki Mihara, Shoji Shiba
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Patent number: 9798236Abstract: In at least one embodiment of a method for forming a pattern having a hollow structure, a light-absorbing layer capable of absorbing light is formed on a surface of a photosensitive resin film. Subsequently, a substrate having a protrusion and the photosensitive resin film are bonded together so that the protrusion and the light-absorbing layer come into contact with each other. Then, the photosensitive resin film and the light-absorbing layer are patterned at one time by photolithography.Type: GrantFiled: August 12, 2015Date of Patent: October 24, 2017Assignee: Canon Kabushiki KaishaInventors: Yohei Hamade, Shoji Shiba
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Publication number: 20160054655Abstract: In at least one embodiment of a method for forming a pattern having a hollow structure, a light-absorbing layer capable of absorbing light is formed on a surface of a photosensitive resin film. Subsequently, a substrate having a protrusion and the photosensitive resin film are bonded together so that the protrusion and the light-absorbing layer come into contact with each other. Then, the photosensitive resin film and the light-absorbing layer are patterned at one time by photolithography.Type: ApplicationFiled: August 12, 2015Publication date: February 25, 2016Inventors: Yohei Hamade, Shoji Shiba
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Patent number: 9254660Abstract: A process for producing a liquid ejection head including a silicon substrate having a supply port to supply a liquid to a flow path, and an ejection-orifice-forming member forming the flow path between the ejection-orifice-forming member and the silicon substrate and having an ejection orifice to eject the liquid in the flow path. The process includes forming an etching protection film so as to cover the ejection-orifice-forming member; forming the supply port passing through the silicon substrate by anisotropic etching using an alkaline aqueous solution; and removing the etching protection film. The etching protection film includes an organic polymer material having a storage modulus at 80° C. of 1.0×106 Pa or higher.Type: GrantFiled: August 25, 2014Date of Patent: February 9, 2016Assignee: Canon Kabushiki KaishaInventors: Hiroaki Mihara, Etsuko Sawada, Shoji Shiba
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Publication number: 20150060398Abstract: A process for producing a liquid ejection head including a silicon substrate having a supply port to supply a liquid to a flow path, and an ejection-orifice-forming member forming the flow path between the ejection-orifice-forming member and the silicon substrate and having an ejection orifice to eject the liquid in the flow path. The process includes forming an etching protection film so as to cover the ejection-orifice-forming member; forming the supply port passing through the silicon substrate by anisotropic etching using an alkaline aqueous solution; and removing the etching protection film. The etching protection film includes an organic polymer material having a storage modulus at 80° C. of 1.0×106 Pa or higher.Type: ApplicationFiled: August 25, 2014Publication date: March 5, 2015Inventors: Hiroaki Mihara, Etsuko Sawada, Shoji Shiba
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Patent number: 8673546Abstract: A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.Type: GrantFiled: October 25, 2011Date of Patent: March 18, 2014Assignee: Canon Kabushiki KaishaInventors: Kazunari Ishizuka, Ken Ikegame, Shoji Shiba
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Publication number: 20130244183Abstract: Provided is a process for producing an ink jet recording head, including: forming, on a substrate, a resin composition layer including a cationically polymerizable epoxy resin composition containing a specific compound; carrying out a first pattern exposure and a first heat treatment at the resin composition layer; carrying out a second pattern exposure and a second heat treatment at an unexposed portion of the resin composition layer; and, removing an unexposed portion in the first pattern exposure and in the second pattern exposure by a development treatment, thereby forming an ejection orifice for ejecting ink and an ejection portion having a taper shape in which an inner diameter reduces toward the ejection orifice.Type: ApplicationFiled: February 19, 2013Publication date: September 19, 2013Applicant: CANON KABUSHIKI KAISHAInventors: Shoji Shiba, Isamu Horiuchi
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Patent number: 8444253Abstract: Provided is an inkjet head, including: a substrate having an energy generating element for generating energy to be used for ejecting liquid; and a liquid flow path forming member, which forms patterns of an ejection orifice for ejecting the liquid and a liquid flow path communicating with the ejection orifice and which has a surface subjected to water-repellent treatment, in which the inkjet head includes, in a surface having the ejection orifice, multiple water-repellent areas subjected to water-repellent treatment, and multiple recesses each having a bottom in the liquid flow path forming member and having a surface not subjected to water-repellent treatment. Also provided is a method of manufacturing an inkjet head.Type: GrantFiled: September 23, 2011Date of Patent: May 21, 2013Assignee: Canon Kabushiki KaishaInventors: Isamu Horiuchi, Shoji Shiba
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Patent number: 8409454Abstract: A production process for a structure includes preparing a substrate on which a first layer and a second layer are provided in this order; forming a second mold, which is a part of a mold member serving as a mold for forming the structure, from the second layer; etching the first layer using the second mold as a mask and thereby forming a first mold, which is another part of the mold member from the first layer; providing a coating layer which serves as the structure to cover the first mold and the second mold; and removing the first mold and the second mold and thereby forming the structure.Type: GrantFiled: March 25, 2010Date of Patent: April 2, 2013Assignee: Canon Kabushiki KaishaInventors: Etsuko Hino, Shoji Shiba
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Patent number: 8304177Abstract: A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming layer, irradiating part of the ink flow path forming layer with ultraviolet rays for development, thereby forming an ink ejection orifice, and removing the pattern, thereby forming an ink flow path. The step of forming the pattern includes applying a positive resist containing a resin having a phenolic hydroxyl group on the substrate to form a positive resist layer, patterning the positive resist layer to form an ink flow path pattern prior to insolubilization treatment, applying a coating agent containing a compound having two vinyl ether groups on the pattern, and heat-treating the pattern coated with the coating agent.Type: GrantFiled: August 26, 2011Date of Patent: November 6, 2012Assignee: Canon Kabushiki KaishaInventors: Shoji Shiba, Masumi Ikeda
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Patent number: 8227043Abstract: A method for manufacturing a liquid discharge head includes the steps of: forming a solid layer for forming a flow path on a substrate on which an energy generating element is arranged to generate energy that is used to discharge liquid; forming, on the substrate where the solid layer is mounted, a coating layer for coating the solid layer; forming a discharge port used to discharge a liquid, through a photolithographic process, in the coating layer deposited on the solid layer; and removing the solid layer to form a flow path that communicates with the energy element and the discharge port. A material used for the coating layer contains a cationically polymerizable chemical compound, a cationic photopolymerization initiator and an inhibitor of cationic photopolymerization, and a material of the solid layer that forms a boundary with a portion where the discharge port of the coating layer is formed contains a copolymer of methacrylic acid and methacrylate ester.Type: GrantFiled: June 27, 2005Date of Patent: July 24, 2012Assignee: Canon Kabushiki KaishaInventors: Masahiko Kubota, Takumi Suzuki, Tamaki Sato, Ryoji Kanri, Maki Hatta, Kazuhiro Asai, Shoji Shiba, Etsuko Hino, Hiroe Ishikura, Akihiko Okano
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Publication number: 20120115985Abstract: A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.Type: ApplicationFiled: October 25, 2011Publication date: May 10, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Kazunari Ishizuka, Ken Ikegame, Shoji Shiba
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Publication number: 20120105546Abstract: Provided is an inkjet head, including: a substrate having an energy generating element for generating energy to be used for ejecting liquid; and a liquid flow path forming member, which forms patterns of an ejection orifice for ejecting the liquid and a liquid flow path communicating with the ejection orifice and which has a surface subjected to water-repellent treatment, in which the inkjet head includes, in a surface having the ejection orifice, multiple water-repellent areas subjected to water-repellent treatment, and multiple recesses each having a bottom in the liquid flow path forming member and having a surface not subjected to water-repellent treatment. Also provided is a method of manufacturing an inkjet head.Type: ApplicationFiled: September 23, 2011Publication date: May 3, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Isamu Horiuchi, Shoji Shiba
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Publication number: 20120058433Abstract: A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming layer, irradiating part of the ink flow path forming layer with ultraviolet rays for development, thereby forming an ink ejection orifice, and removing the pattern, thereby forming an ink flow path. The step of forming the pattern includes applying a positive resist containing a resin having a phenolic hydroxyl group on the substrate to form a positive resist layer, patterning the positive resist layer to form an ink flow path pattern prior to insolubilization treatment, applying a coating agent containing a compound having two vinyl ether groups on the pattern, and heat-treating the pattern coated with the coating agent.Type: ApplicationFiled: August 26, 2011Publication date: March 8, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Shoji Shiba, Masumi Ikeda
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Patent number: 8124791Abstract: The invention provides an active energy ray curable liquid composition containing a compound represented by a general formula (I): wherein A is a hydrogen atom or a monovalent organic residue which may be substituted, R1 and R2 are, independently of each other, a divalent organic group which may be substituted, E is an amide bond, Rn is a cyclic linking group having a carbonyl group and an unsaturated carbon-carbon bond adjacent to the carbon atom of the carbonyl group, m is a number of 0 or greater, n is a number of 2 or greater, m+n is 3, and Z is a secondary or tertiary amino bond structure, with the proviso that the amino bond may be a salt of a secondary or tertiary amine, and a liquid cartridge.Type: GrantFiled: March 25, 2008Date of Patent: February 28, 2012Assignee: Canon Kabushiki KaishaInventors: Kenji Shinjo, Norio Ohkuma, Shoji Shiba, Hikaru Ueda, Hiroe Ishikura, Shinsuke Tsuji, Yoshikazu Saito, Kouji Harada, Yuichiro Kanasugi
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Patent number: 8017307Abstract: A method for manufacturing a minute structure comprises a step of forming an ionizing radiation decomposing type positive type resist layer including a methyl isopropenyl ketone as a first positive type photosensitive material layer, a step of forming an ionizing radiation decomposing type positive type resist layer including a photosensitive material of a copolymer as a second positive type photosensitive material layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer, and development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer to form a convex shape pattern.Type: GrantFiled: June 27, 2005Date of Patent: September 13, 2011Assignee: Canon Kabushiki KaishaInventors: Masahiko Kubota, Takumi Suzuki, Tamaki Sato, Ryoji Kanri, Maki Hatta, Kazuhiro Asai, Shoji Shiba, Hiroe Ishikura, Akihiko Okano
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Patent number: 7971964Abstract: A method for manufacturing a liquid discharge head including an energy generating element, which generates energy utilized for discharging a liquid, and a discharge portion provided at a position facing the energy generating element and having a discharge port for discharging the liquid is provided. This method includes the steps of forming a negative photosensitive resin layer used for a member that forms the discharge port on the substrate, and exposing the layer to an i-line to form the discharge portion that is tapered in a direction from the substrate to the discharge port, wherein the layer has an absorbance per 1 ?m thickness of about 0.02 to about 0.07 for light used for the exposure.Type: GrantFiled: November 16, 2007Date of Patent: July 5, 2011Assignee: Canon Kabushiki KaishaInventors: Shoji Shiba, Akihiko Okano, Yoshikazu Saito, Kazuhiro Asai, Tamaki Sato, Takumi Suzuki, Masahiko Kubota, Maki Kato, Hiroe Ishikura, Shinsuke Tsuji