Patents by Inventor Shojiro Yukawa
Shojiro Yukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11194252Abstract: This cured film-forming resin composition is characterized in comprising: as a component (A), a polymer containing a structural unit derived from a first monomer having the structure with formula (1); a photoacid generator as a component (B); fine particles as a component (C); and a solvent (in the formula, R1 represents hydrogen or a methyl group and R2 represents an organic group capable of undergoing elimination with the oxygen atom bonded thereto). The cured film-forming resin composition forms a cured film that has solvent resistance to organic solvents and a high liquid repellency (lyophobicity) wherein the lyophilicity/lyophobicity can be easily varied using small ultraviolet exposure doses and the lyophilic areas have a high lyophilicity even for high surface tension liquids.Type: GrantFiled: September 20, 2017Date of Patent: December 7, 2021Assignee: NISSAN CHEMICAL CORPORATIONInventors: Shojiro Yukawa, Yuki Hoshino
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Patent number: 10669376Abstract: Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R1 denotes hydrogen or a methyl group, and R2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R2.Type: GrantFiled: March 30, 2017Date of Patent: June 2, 2020Assignee: NISSAN CHEMICAL CORPORATIONInventors: Shojiro Yukawa, Yuki Hoshino, Kayo Takeda
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Patent number: 10590219Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.Type: GrantFiled: August 17, 2018Date of Patent: March 17, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Shojiro Yukawa, Jun Ito, Kohei Goto, Yuta Kanno, Hiroyuki Omura, Tadashi Hatanaka
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Publication number: 20200019061Abstract: This cured film-forming resin composition is characterized in comprising: as a component (A), a polymer containing a structural unit derived from a first monomer having the structure with formula (1); a photoacid generator as a component (B); fine particles as a component (C); and a solvent (in the formula, R1 represents hydrogen or a methyl group and R2 represents an organic group capable of undergoing elimination with the oxygen atom bonded thereto). The cured film-forming resin composition forms a cured film that has solvent resistance to organic solvents and a high liquid repellency (lyophobicity) wherein the lyophilicity/lyophobicity can be easily varied using small ultraviolet exposure doses and the lyophilic areas have a high lyophilicity even for high surface tension liquids.Type: ApplicationFiled: September 20, 2017Publication date: January 16, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Shojiro YUKAWA, Yuki HOSHINO
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Publication number: 20190085130Abstract: Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R1 denotes hydrogen or a methyl group, and R2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R2.Type: ApplicationFiled: March 30, 2017Publication date: March 21, 2019Applicant: NISSAN CHEMICAL CORPORATIONInventors: Shojiro YUKAWA, Yuki HOSHINO, Kayo TAKEDA
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Publication number: 20180355087Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.Type: ApplicationFiled: August 17, 2018Publication date: December 13, 2018Applicant: Nissan Chemical Industries, Ltd.Inventors: Shojiro YUKAWA, Jun Ito, Kohei Goto, Yuta Kanno, Hiroyuki Omura, Tadashi Hatanaka
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Patent number: 10100201Abstract: A cured-film formation composition suitable to form a cured film having liquid-crystal alignment properties. A cured-film formation composition including a component (A) that is one or more monomers having a group having a photo-alignment moiety and thermally reactive moiety, and a polymerizable group; component (B) that is at least one polymer selected from the group of components (B-1) to (B-3) (the component (B-1) being a polymer having, in a quantity of at least two of at least one group selected from the group of hydroxy group, carboxyl group, amide group, amino group, an alkoxysilyl group and group of Formula (2), component (B-2) being a polymer capable of thermally reacting with thermally reactive moiety of component (A) and is self-cross-linkable, and component (B-3) being a melamine formaldehyde resin); and component (C) that is a cross-linking agent; and an orientation material and retardation material which are formed of the cured-film formation composition.Type: GrantFiled: February 27, 2015Date of Patent: October 16, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Jun Ito, Shojiro Yukawa, Yuta Kanno, Kohei Goto, Tadashi Hatanaka
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Patent number: 10081693Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable liquid crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.Type: GrantFiled: February 27, 2015Date of Patent: September 25, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Shojiro Yukawa, Jun Ito, Kohei Goto, Yuta Kanno, Hiroyuki Omura, Tadashi Hatanaka
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Patent number: 10000701Abstract: There is provided a cured-film formation composition for providing an orientation material that has high photoreaction efficiency and excellent solvent resistance with adhesion durability, and that enables a polymerizable liquid crystal to be aligned even on a resin film in a highly sensitive manner. A cured-film formation composition including: (A) an acrylic polymer having a photo-aligning group; (B) a polymer having any one of a hydroxy group, a carboxy group, and an amino group on at least two terminals of a group bonded to a main chain; and (C) a cross-linking agent. An orientation material and a retardation material are obtained with the cured-film formation composition.Type: GrantFiled: June 20, 2013Date of Patent: June 19, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Tadashi Hatanaka, Tomohisa Ishida, Shojiro Yukawa
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Patent number: 9862677Abstract: An acrylic or methacrylic compound having N-alkoxyalkyl group; and a method for producing the compound. An acrylic or methacrylic compound having N-alkoxyalkyl group, of Formula [1]: [where R1 is a hydrogen atom or methyl group; R2 is a C2-20 alkylene group etc.; R3 is an r-valent C2-20 aliphatic group etc.; R4 is a C1-20 alkyl group etc.; Z is >NCOO— or —OCON< (where “-” is a bond, “>” and “<” each have two bonds, and any one of “>” and “<” is bonded to —CH2OR4); and r is a natural number of 2 or more and 9 or less].Type: GrantFiled: March 23, 2015Date of Patent: January 9, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yoshikazu Harada, Mitsumasa Kondo, Shojiro Yukawa
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Patent number: 9823400Abstract: There is provided a cured-film formation composition that forms a cured film having excellent photoreaction efficiency and solvent resistance, and high adhesion, an orientation material for photo-alignment, and a retardation material formed with the orientation material.Type: GrantFiled: September 15, 2015Date of Patent: November 21, 2017Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Tadashi Hatanaka, Tomohisa Ishida, Shojiro Yukawa
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Patent number: 9823401Abstract: A cured-film formation composition that includes: (A) one or more compounds having a photo-aligning group and hydroxy group, etc.; (B) a polymer having at least one substituent from the group of a hydroxy group, carboxy group, amino group, and alkoxysilyl group, and the like; and (C) a cross-linking agent. Component (A) contains a compound having a group of Formula [1] below as the photo-aligning group: where A1 and A2 are independently a hydrogen atom or methyl group; and A3 is a hydroxy group. A cured-film is formed from the cured-film formation composition, and orientation material is formed by use of photo-alignment technique. A retardation material is obtained by applying a polymerizable liquid crystal on the orientation material and curing it.Type: GrantFiled: June 15, 2016Date of Patent: November 21, 2017Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kohei Goto, Shojiro Yukawa, Masato Moriuchi, Tadashi Hatanaka
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Publication number: 20170107176Abstract: An acrylic or methacrylic compound having N-alkoxyalkyl group; and a method for producing the compound. An acrylic or methacrylic compound having N-alkoxyalkyl group, of Formula [1]: [where R1 is a hydrogen atom or methyl group; R2 is a C2-20 alkylene group etc.; R3 is an r-valent C2-20 aliphatic group etc.; R4 is a C1-20 alkyl group etc.; Z is >NCOO— or —OCON< (where “—” is a bond, “>” and “<” each have two bonds, and any one of “>” and “<” is bonded to —CH2OR4); and r is a natural number of 2 or more and 9 or less].Type: ApplicationFiled: March 23, 2015Publication date: April 20, 2017Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yoshikazu HARADA, Mitsumasa KONDO, Shojiro YUKAWA
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Patent number: 9598547Abstract: A cured-film formation composition for forming a cured film having photoreaction efficiency and solvent resistance, and high adhesiveness alignment uniformity, and an orientation material for photo-alignment, and a retardation material formed by use of the orientation material. A cured-film formation composition includes (A) a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, and an amino group; (B) a hydrophilic polymer having one or more substituents selected from a hydroxy group, a carboxy group, and an amino group; and (C) a polymer obtained by polymerizing a monomer including an N-hydroxymethyl compound or an N-alkoxymethyl (meth)acrylamide compound, and optionally further a cross-linking catalyst as a component (D). By use of the composition, a cured-film is formed and an orientation material is formed by utilizing photo-alignment technique.Type: GrantFiled: September 16, 2015Date of Patent: March 21, 2017Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Tadashi Hatanaka, Tomohisa Ishida, Shojiro Yukawa
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Patent number: 9529132Abstract: A cured-film formation composition to form a cured film having excellent liquid-crystal alignment properties, orientation material, and retardation material by use of the orientation material. A cured-film formation composition includes: (A) one or more compounds having a photo-aligning group and hydroxy group, etc.; (B) a polymer having at least one substituent from the group of a hydroxy group, carboxy group, amino group, and alkoxysilyl group, and the like; and (C) a cross-linking agent, the component (A) contains at least a compound having a group of Formula [1] below as the photo-aligning group: (in the Formula, A1 and A2 are independently a hydrogen atom or methyl group; and A3 is a hydroxy group, etc.). A cured-film is formed from the cured-film formation composition, and orientation material is formed by use of photo-alignment technique. A retardation material is obtained by applying a polymerizable liquid crystal on the orientation material and curing it.Type: GrantFiled: March 6, 2014Date of Patent: December 27, 2016Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kohei Goto, Shojiro Yukawa, Masato Moriuchi, Tadashi Hatanaka
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Publication number: 20160369025Abstract: A retardation material-forming resin composition for providing an orientation material that has high photoreaction efficiency and with which a polymerizable liquid crystal can be aligned in a highly sensitive manner. A retardation material-forming resin composition being thermally curable wherein including a resin (component (A)) having a photo-aligning group to which a thermally reactive moiety is bonded directly or connected via a linking group; an orientation material obtained by use of the composition, and a retardation material formed by use of a cured film obtained from the composition.Type: ApplicationFiled: February 27, 2015Publication date: December 22, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Shojiro YUKAWA, Jun ITO, Kohei GOTO, Yuta KANNO, Hiroyuki OMURA, Tadashi HATANAKA
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Publication number: 20160369105Abstract: A cured-film formation composition suitable to form a cured film having liquid-crystal alignment properties. A cured-film formation composition including a component (A) that is one or more monomers having a group having a photo-alignment moiety and thermally reactive moiety, and a polymerizable group; component (B) that is at least one polymer selected from the group of components (B-1) to (B-3) (the component (B-1) being a polymer having, in a quantity of at least two of at least one group selected from the group of hydroxy group, carboxyl group, amide group, amino group, an alkoxysilyl group and group of Formula (2), component (B-2) being a polymer capable of thermally reacting with thermally reactive moiety of component (A) and is self-cross-linkable, and component (B-3) being a melamine formaldehyde resin); and component (C) that is a cross-linking agent; and an orientation material and retardation material which are formed of the cured-film formation composition.Type: ApplicationFiled: February 27, 2015Publication date: December 22, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Jun ITO, Shojiro YUKAWA, Yuta KANNO, Kohei GOTO, Tadashi HATANAKA
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Publication number: 20160291412Abstract: A cured-film formation composition that includes: (A) one or more compounds having a photo-aligning group and hydroxy group, etc.; (B) a polymer having at least one substituent from the group of a hydroxy group, carboxy group, amino group, and alkoxysilyl group, and the like; and (C) a cross-linking agent. Component (A) contains a compound having a group of Formula [1] below as the photo-aligning group: where A1 and A2 are independently a hydrogen atom or methyl group; and A3 is a hydroxy group. A cured-film is formed from the cured-film formation composition, and orientation material is formed by use of photo-alignment technique. A retardation material is obtained by applying a polymerizable liquid crystal on the orientation material and curing it.Type: ApplicationFiled: June 15, 2016Publication date: October 6, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kohei GOTO, Shojiro YUKAWA, Masato MORIUCHI, Tadashi HATANAKA
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Patent number: 9348222Abstract: There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1): where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3?n1?1.0.Type: GrantFiled: July 7, 2009Date of Patent: May 24, 2016Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Shojiro Yukawa, Takahiro Kishioka, Takahiro Sakaguchi, Hiroyuki Soda
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Patent number: 9321862Abstract: There is provided provide a photosensitive resin composition which can markedly improve transparency, heat resistance, heat discoloration resistance, solvent resistance, and patterning properties. A photosensitive resin composition including: a polymer (A) in which a content of a unit structure containing a boronic acid group, a unit structure containing a boronic acid ester group, or a combination of these unit structures is 20 mol % to 100 mol % of a total molar number of unit structures constituting the polymer; and a photosensitizer (B). The polymer (A) preferably has a weight average molecular weight of 1,000 to 50,000. A cured film obtained from the photosensitive resin composition. A microlens prepared from the photosensitive resin composition.Type: GrantFiled: May 9, 2012Date of Patent: April 26, 2016Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventor: Shojiro Yukawa