Patents by Inventor Shoki MIZUGUCHI

Shoki MIZUGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240021445
    Abstract: A substrate processing apparatus according to the present disclosure includes a substrate holding unit, a fluid supplying unit, a processing-liquid supplying unit, a nozzle, a fluid amount adjusting unit, and a controller. The substrate holding unit holds a substrate to be rotatable. The fluid supplying unit supplies fluid including pressurized vapor or mist of deionized water. The processing-liquid supplying unit supplies processing liquid including at least a sulfuric acid. The nozzle is connected to the fluid supplying unit and the processing-liquid supplying unit to discharge mixed fluid of the fluid and the processing liquid toward the substrate. The fluid amount adjusting unit adjusts a flow volume of the fluid that is flowing through the fluid supplying unit. The controller controls the fluid amount adjusting unit to adjust a ratio of the fluid to the processing liquid.
    Type: Application
    Filed: June 28, 2023
    Publication date: January 18, 2024
    Applicant: Tokyo Electron Limited
    Inventors: Hiroki SAKURAI, Yenrui HSU, Shoki MIZUGUCHI, Nobuhiro OGATA, Shinichi UMENO, Kazuya GODA, Minsung KIM, Hiroyuki HIGASHI
  • Publication number: 20230185199
    Abstract: A nozzle that mixes fluid containing steam or mist of pressurized pure water and processing liquid containing at least sulfuric acid and ejects mixed fluid of the fluid and the processing liquid, the nozzle comprising: at least one first ejection port ejecting the fluid; at least one second ejection port ejecting the processing liquid; and at least one lead-out path being in fluid communication with the at least one first ejection port and the at least one second ejection port and leading out the mixed fluid of the fluid ejected from the at least one first ejection port and the processing liquid ejected from the at least one second ejection port, wherein the at least one first ejection port or the at least one second ejection port is arranged to be directed to position deviated from central axis of the at least one lead-out path in a plan view.
    Type: Application
    Filed: December 8, 2022
    Publication date: June 15, 2023
    Inventors: Hiroki SAKURAI, Nobuhiro OGATA, Daisuke GOTO, Kanta MORI, Kenji YADA, Yusuke HASHIMOTO, Shoki MIZUGUCHI, Yenrui HSU
  • Publication number: 20220112603
    Abstract: A substrate processing method includes discharging a processing liquid to a substrate, and discharging a mixed fluid that is produced by mixing a processing liquid and a purified water in a vapor state or a mist state thereof to a substrate where a processing liquid is discharged.
    Type: Application
    Filed: October 7, 2021
    Publication date: April 14, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Hiroki SAKURAI, Daisuke GOTO, Nobuhiro OGATA, Yusuke HASHIMOTO, Shoki MIZUGUCHI, Yenrui HSU