Patents by Inventor Shoko UETAKE

Shoko UETAKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12715960
    Abstract: The present invention provides a fluorine-containing ether compound represented by the following Formula. R1-[B]-[A]-CH2—R2—CH2-[C]-[D]-R3 (R2 is a perfluoropolyether chain; [A] is Formula (2-1); [B] is Formula (2-2); [C] is Formula (3-1); [D] is Formula (3-2); R3 is Formula (4); and R1 is a terminal group.
    Type: Grant
    Filed: December 13, 2021
    Date of Patent: August 25, 2026
    Assignee: Resonac Corporation
    Inventors: Daisuke Yagyu, Tsuyoshi Kato, Naoya Fukumoto, Ayano Asano, Masaki Nanko, Yutaka Tanji, Shoko Uetake
  • Publication number: 20260084264
    Abstract: A magnetic recording medium production method which includes forming a lubricating layer over a stack including a substrate, a magnetic recording layer over the substrate, and a protective layer over the magnetic recording layer includes applying a first lubricant and a second lubricant to the stack; burnishing a surface of the stack with an abrasive; and removing the second lubricant over the stack. The application of the second lubricant is performed through dipping or spin coating. A dissolution amount of the second lubricant in a solvent for the second lubricant used in the dipping or the spin coating is more than a dissolution amount of the first lubricant in the solvent. The burnishing includes abrading the surface of the stack by pressing a tape containing the abrasive against the surface of the stack. The removal of the second lubricant includes irradiating the stack with ultraviolet radiation, or heating the stack.
    Type: Application
    Filed: September 19, 2025
    Publication date: March 26, 2026
    Inventors: Shoko UETAKE, Naoya FUKUMOTO, Kazuki SHINDO, Ayumi YAMAKAWA, Koshiro YOSHIYAMA, Yoshihiko MARUYAMA, Tatsushi SAITO
  • Publication number: 20260084259
    Abstract: A magnetic recording medium production method which includes forming a lubricating layer over a stack includes applying a first lubricant and a second lubricant to the stack; burnishing, with an abrasive, a surface of the stack to which the first lubricant and the second lubricant are applied; and removing the second lubricant over the stack. A vapor pressure at 120° C. of the second lubricant is higher than a vapor pressure at 120° C. of the first lubricant. The burnishing includes abrading the surface of the stack by pressing a tape containing the abrasive against the surface of the stack. The removal of the second lubricant includes irradiating the stack, to which the first lubricant and the second lubricant are applied, with ultraviolet radiation, or heating the stack, to which the first lubricant and the second lubricant are applied.
    Type: Application
    Filed: September 19, 2025
    Publication date: March 26, 2026
    Inventors: Shoko UETAKE, Koshiro YOSHIYAMA, Yoshihiko MARUYAMA, Kazuki SHINDO, Ayumi YAMAKAWA, Naoya FUKUMOTO
  • Publication number: 20260065935
    Abstract: A magnetic recording medium production method which includes forming a lubricating layer over a stack including a substrate, a magnetic recording layer over the substrate, and a protective layer over the magnetic recording layer includes applying a first lubricant and a second lubricant to the stack; burnishing, with an abrasive, a surface of the stack to which the first lubricant and the second lubricant are applied; and removing the second lubricant over the stack. The application of the second lubricant is performed through spin coating. The burnishing includes abrading the surface of the stack by pressing a tape containing the abrasive against the surface of the stack. The removal of the second lubricant includes at least one of irradiating the stack, to which the first lubricant and the second lubricant are applied, with ultraviolet radiation, or heating the stack to which the first lubricant and the second lubricant are applied.
    Type: Application
    Filed: August 27, 2025
    Publication date: March 5, 2026
    Inventors: Shoko UETAKE, Koshiro YOSHIYAMA, Yoshihiko MARUYAMA, Ayumi YAMAKAWA, Kazuki SHINDO
  • Publication number: 20260065933
    Abstract: A magnetic recording medium production method, which includes forming a lubricating layer over a stack including a substrate, a magnetic recording layer over the substrate, and a protective layer over the magnetic recording layer, includes applying a first lubricant and a second lubricant to the stack; burnishing, with an abrasive, a surface of the stack to which the first lubricant and the second lubricant are applied; and removing the second lubricant over the stack. The burnishing includes abrading the surface of the stack by pressing a tape containing the abrasive against the surface of the stack. The removal of the second lubricant includes irradiating the stack, to which the first lubricant and the second lubricant are applied, with light emitted from an LED light source.
    Type: Application
    Filed: August 18, 2025
    Publication date: March 5, 2026
    Inventors: Shoko UETAKE, Gohei KUROKAWA, Kazuki SHINDO, Koshiro YOSHIYAMA, Yoshihiko MARUYAMA, Ayumi YAMAKAWA
  • Publication number: 20250191611
    Abstract: A method of producing a magnetic recording medium is provided, in which a lubricating layer is formed on a stack including a magnetic recording layer and a protective layer disposed on a substrate in this order. The method includes: coating the stack with first and second lubricants; burnishing a surface of the coated stack with an abrasive material; and removing the second lubricant present on the stack. The first lubricant has a mean molecular weight greater than that of the second lubricant, and molecules of the first lubricant are more polar than molecules of the second lubricant. The burnishing includes pressing a tape including the abrasive material against the surface of the stack to rub the surface of the stack. The removing of the second lubricant includes irradiating the coated stack with ultraviolet rays, or performing a heat treatment on the coated stack.
    Type: Application
    Filed: December 5, 2024
    Publication date: June 12, 2025
    Inventors: Shoko UETAKE, Koshiro YOSHIYAMA, Yoshihiko MARUYAMA, Naoya FUKUMOTO, Ayumi YAMAKAWA, Kazuki SHINDO
  • Publication number: 20240101759
    Abstract: The present invention provides a fluorine-containing ether compound represented by the following Formula. R1-[B]-[A]-CH2—R2—CH2-[C]-[D]-R3 (R2 is a perfluoropolyether chain; [A] is Formula (2-1); [B] is Formula (2-2); [C] is Formula (3-1); [D] is Formula (3-2); R3 is Formula (4); and R1 is a terminal group.
    Type: Application
    Filed: December 13, 2021
    Publication date: March 28, 2024
    Applicant: Resonac Corporation
    Inventors: Daisuke YAGYU, Tsuyoshi KATO, Naoya FUKUMOTO, Ayano ASANO, Masaki NANKO, Yutaka TANJI, Shoko UETAKE
  • Patent number: 11427779
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided. R1—R2—CH2—R3—CH2—R4—R5 ??(1) (In Formula (1), R1 and R5 each represents a group having a heterocyclic ring and may be the same as or different from each other, R2 and R4 each represents a divalent linking group having a polar group and play be the same as or different from each other, and R3 represents a perfluoropolyether chain.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: August 30, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Yuta Yamaguchi, Daisuke Yagyu, Naoya Fukumoto, Shoko Uetake, Tsuyoshi Kato, Hiroyuki Tomita, Ryuuta Miyasaka, Katsumi Murofushi
  • Patent number: 11279664
    Abstract: The present invention relates to a fluorine-containing ether compound represented by Formula (1), R1—R2—CH2—R3—CH2—R4??(1). (In Formula (1), R1 is an end group including an organic group having at least one double bond or triple bond, R2 is a divalent linking group bonded to R1 by etheric oxygen, R3 is a perfluoropolyether chain, R4 is an end group having two or three polar groups with each polar group being bonded to different carbon atoms, and the carbon atoms, to which the polar groups are bonded, being bonded to each other via a linking group including carbon atoms to which the polar groups are not bonded.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: March 22, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Daisuke Yagyu, Yuta Yamaguchi, Naoya Fukumoto, Tsuyoshi Kato, Shoko Uetake, Hiroyuki Tomita, Ryuuta Miyasaka, Naoko Ito, Ichiro Ota, Katsumi Murofushi
  • Patent number: 11220649
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided; R1—R2—CH2—R3—CH2—R4—R5??(1) (In Formula (1), R1 and R5 may be the same as or different from each other and each represents an alkenyl group having 2 to 8 carbon atoms or an alkynyl group having 3 to 8 carbon atoms, R2 and R4 may be the same as or different from each other and each represents a divalent linking group having a polar group, and R3 represents a perfluoropolyether chain, with a proviso that R1 and R2 are, and R4 and R5 are divided due to the presence of an atom other than the carbon atom such as an oxygen atom).
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: January 11, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Shoko Uetake, Tsuyoshi Kato, Hiroyuki Tomita, Ryuuta Miyasaka, Katsumi Murofushi
  • Patent number: 11011200
    Abstract: This fluorine-containing ether compound is represented by Formula (1). R1—R2—CH2—R3—CH2—R4—R5??(1) (in Formula (1), R1 is an aryl group or an aralkyl group, R2 is a divalent linking group having 0 or 1 polar group, R3 is a perfluoropolyether chain, R4 is a divalent linking group having 2 or 3 polar groups, and R5 is an aryl group or an aralkyl group.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: May 18, 2021
    Assignee: SHOWA DENKO K.K.
    Inventors: Shoko Uetake, Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Naoko Ito, Hiroyuki Tomita, Ryuta Miyasaka, Katsumi Murofushi
  • Patent number: 10803898
    Abstract: A fluorine-containing ether compound of the present invention is represented by Formula (1). R1—CH2—R2—CH2—R3??(1) (In Formula (1), R1 is an organic end group having 3 or more carbon atoms which includes two or more polar groups with each polar group being bonded to different carbon atoms and the carbon atoms to which the polar groups are bonded being bonded to each other via a linking group including the carbon atoms which are not bonded to the polar groups, R2 includes a perfluoropolyether chain represented by Formula (3), and R3 is a hydroxyl group or R1) —(CF2)y?1—O—((CF2)yO)z—(CF2)y?1—??(3) (In Formula (3), y represents an integer of 2 to 4, and z represents an integer of 1 to 30).
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: October 13, 2020
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Shoko Uetake, Tsuyoshi Kato, Hiroyuki Tomita, Ryuta Miyasaka, Katsumi Murofushi
  • Publication number: 20190382675
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided; R1—R2—CH2—R3—CH2—R4—R5??(1) (In Formula (1), R1 and R5 may be the same as or different from each other and each represents an alkenyl group having 2 to 8 carbon atoms or an alkynyl group having 3 to 8 carbon atoms, R2 and R4 may be the same as or different from each other and each represents a divalent linking group having a polar group, and R3 represents a perfluoropolyether chain, with a proviso that R1 and R2 are, and R4 and R5 are divided due to the presence of an atom other than the carbon atom such as an oxygen atom).
    Type: Application
    Filed: December 4, 2017
    Publication date: December 19, 2019
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Shoko UETAKE, Tsuyoshi KATO, Hiroyuki TOMITA, Ryuuta MIYASAKA, Katsumi MUROFUSHI
  • Publication number: 20190382676
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided. R1—R2—CH2—R3—CH2—R4—R5 ??(1) (In Formula (1), R1 and R5 each represents a group having a heterocyclic ring and may be the same as or different from each other, R2 and R4 each represents a divalent linking group having a polar group and play be the same as or different from each other, and R3 represents a perfluoropolyether chain.
    Type: Application
    Filed: January 5, 2018
    Publication date: December 19, 2019
    Applicant: SHOWA DENKO K.K.
    Inventors: Yuta YAMAGUCHI, Daisuke YAGYU, Naoya FUKUMOTO, Shoko UETAKE, Tsuyoshi KATO, Hiroyuki TOMITA, Ryuuta MIYASAKA, Katsumi MUROFUSHI
  • Publication number: 20190084911
    Abstract: The present invention relates to a fluorine-containing ether compound represented by Formula (1), R1—R2—CH2—R3—CH2—R4??(1). (In Formula (1), R1 is an end group including an organic group having at least one double bond or triple bond, R2 is a divalent linking group bonded to R1 by etheric oxygen, R3 is a perfluoropolyether chain, R4 is an end group having two or three polar groups with each polar group being bonded to different carbon atoms, and the carbon atoms, to which the polar groups are bonded, being bonded to each other via a linking group including carbon atoms to which the polar groups are not bonded.
    Type: Application
    Filed: January 30, 2017
    Publication date: March 21, 2019
    Applicant: SHOWA DENKO K.K.
    Inventors: Daisuke YAGYU, Yuta YAMAGUCHI, Naoya FUKUMOTO, Tsuyoshi KATO, Shoko UETAKE, Hiroyuki TOMITA, Ryuuta MIYASAKA, Naoko ITO, Ichiro OTA, Katsumi MUROFUSHI
  • Publication number: 20180047419
    Abstract: A fluorine-containing ether compound of the present invention is represented by Formula (1). R1—CH2—R2—CH2—R3??(1) (In Formula (1), R1 is an organic end group having 3 or more carbon atoms which includes two or more polar groups with each polar group being bonded to different carbon atoms and the carbon atoms to which the polar groups are bonded being bonded to each other via a linking group including the carbon atoms which are not bonded to the polar groups, R2 includes a perfluoropolyether chain represented by Formula (3), and R3 is a hydroxyl group or R1) —(CF2)y-1—O—((CF2)yO)z—(CF2)y-1—??(3) (In Formula (3), y represents an integer of 2 to 4, and z represents an integer of 1 to 30).
    Type: Application
    Filed: July 31, 2017
    Publication date: February 15, 2018
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Shoko UETAKE, Tsuyoshi KATO, Hiroyuki TOMITA, Ryuta MIYASAKA, Katsumi MUROFUSHI
  • Publication number: 20180009773
    Abstract: This fluorine-containing ether compound is represented by Formula (1). R1—R2—CH2—R3—CH2—R4—R5??(1) (in Formula (1), R1 is an aryl group or an aralkyl group, R2 is a divalent linking group having 0 or 1 polar group, R3 is a perfluoropolyether chain, R4 is a divalent linking group having 2 or 3 polar groups, and R5 is an aryl group or an aralkyl group.
    Type: Application
    Filed: July 3, 2017
    Publication date: January 11, 2018
    Applicant: SHOWA DENKO K.K.
    Inventors: Shoko UETAKE, Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Naoko ITO, Hiroyuki TOMITA, Ryuta MIYASAKA, Katsumi MUROFUSHI