Abstract: Disclosed is a vehicle control device which comprises a traveling course control part 10a to update a target traveling course R, and an automatic anti-collision control part 10b to execute automatic anti-collision control processing (S14) for avoiding collision with an obstacle. The part 10a corrects the target traveling course R to calculate corrected traveling course candidates for avoiding the obstacle, and evaluates the corrected traveling course candidates by an evaluation function J to select one of the candidates as a corrected traveling course. The part 10a generates a first request signal for a brake control system 32 to allow the vehicle 1 to travel along the corrected traveling course. The part 10b generates a second request signal for the brake control system 32. The vehicle control device further comprises an output control part 10d to output the first or second request signal to the brake control system 32.

Abstract: A photosensitive resin composition; a photosensitive dry film which includes a photosensitive resin layer formed from the composition; a method of manufacturing the photosensitive dry film; a method of manufacturing a patterned resist film using the composition; a method of manufacturing a substrate with a template using the composition; and a method of manufacturing a plated article using the substrate with the template. In a photosensitive resin composition containing a resin which includes a (meth)acrylic polymer including a carboxy group, a specific amount of compound including a phenolic hydroxyl group and/or a mercapto group is contained together with a polyfunctional vinyl ether monomer.

Abstract: Disclosed is a vehicle control device which comprises a traveling course control part 10a to update a target traveling course R, and an automatic emergency avoidance control part (10b, 10e) to execute automatic emergency avoidance control processing for automatically operating a given control system to avoid collision with an obstacle. The part 10a corrects the target traveling course R to calculate plural corrected traveling course candidates for avoiding the obstacle, and evaluates the candidates by an evaluation function J to select one of the candidates as a corrected traveling course. The part 10a generates a first request signal for allowing the vehicle 1 to travel along the corrected traveling course. The emergency avoidance course control part (10b, 10e) generates a second request signal. The vehicle control device further comprises an output control part 10d to output the first or second request signal to the given control system.

Abstract: A chemically amplified positive-type photosensitive resin composition having excellent plating solution resistance, a photosensitive dry film having a photosensitive resin layer including the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The composition includes an acid generator which generates acid upon exposure, and a resin whose solubility in alkali increases under action of an acid, the acid generator including an acid generator having a specific naphthalimide skeleton, and the resin including an acrylic resin.

Abstract: Provided is a vehicle control device (ECU) 10 which comprises a target traveling course calculation part 10a to calculate a target traveling course R of a vehicle 1, wherein the target traveling course calculation part 10a is configured to, upon detection of an obstacle, correct the target traveling course R so as to avoid the obstacle (S14). The target traveling course calculation part 10a is configured to, in the traveling course correction processing, correct the target traveling course R to calculate corrected traveling course candidate for avoiding the obstacle; and evaluate the corrected traveling course candidates with respect to the target traveling course R by an evaluation function J including evaluation factors, to derive one corrected traveling course according to the evaluation. The target traveling course calculation part 10a is configured to revise the evaluation factors based on an external signal.

Abstract: A chemically amplified positive-type photosensitive resin composition, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The resin composition includes an acid generator (A) which generates acid upon exposure to an irradiated active ray or radiation, and a resin (B) whose solubility in alkali increases under an action of acid. The acid generator (A) includes an acid generator (A-1) having a naphthalimide skeleton, and an acid generator (A-2) whose molar absorbance coefficient at a wavelength of 365 nm is lower than that of the acid generator (A-1).

Abstract: A method for extracting differentiated cells from a cell population comprising undifferentiated cells after induction of the differentiation of pluripotent stem cells. A method for extracting differentiated cells from a cell population, comprising the following steps: (1) a step of introducing, into a cell population, mRNA comprising a marker gene operably linked to the target sequence of miRNA specifically expressed in pluripotent stem cells; and (2) a step of extracting cells in which the marker gene has been translated.

Abstract: A chemically amplified positive-type photosensitive resin composition containing a predetermined amount of organic solvent (S1) having a boiling point of 120 to 180° C., and satisfying the following requirements: a solvent residual rate measured by the following steps (1) and (2) is 3.5% by mass or less: (1) forming a coated film of 40 ?m by applying the photosensitive resin composition to a substrate; and (2) baking the coated film at a temperature that is higher by 10° C. than the boiling point of the organic solvent (S1) for 30 seconds, and calculating the rate of the organic solvent (S1) in a total mass of the coated film after baking by gas chromatography.

Abstract: A chemically amplified positive-type photosensitive resin composition which is highly sensitive and in which it is easy to form a resist pattern whose cross-sectional shape is rectangular, a photosensitive dry film which includes a photosensitive resin layer formed from the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition and a method of manufacturing a plated article using the substrate with the template. A Lewis acid compound is included in the composition that also includes an acid generator which generates an acid by application of an active ray or radiation, and a resin whose solubility in alkali is increased by action of an acid.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound with a specific structure is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid.

Abstract: A photosensitive resin composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The photosensitive resin composition may be used to form a plated article on a metal surface of a substrate The composition includes an acid generator that, when irradiated with an active ray or radiation, generates an acid, a resin that, under an action of an acid, undergoes an increase in solubility thereof in alkali, and a fluorene compound represented by the formula (1).

Abstract: A method for extracting differentiated cells from a cell population comprising undifferentiated cells after induction of the differentiation of pluripotent stem cells. A method for extracting differentiated cells from a cell population, comprising the following steps: (1) a step of introducing, into a cell population, mRNA comprising a marker gene operably linked to the target sequence of miRNA specifically expressed in pluripotent stem cells; and (2) a step of extracting cells in which the marker gene has been translated.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the phenomenon of footing in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the composition. A mercapto compound is contained in the composition which includes an acid generator capable of producing an acid when irradiated with an active ray or radiation and a resin whose solubility in alkali increases under the action of acid.

Abstract: A photosensitive resin composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The photosensitive resin composition may be used to form a plated article on a metal surface of a substrate The composition includes an acid generator that, when irradiated with an active ray or radiation, generates an acid, a resin that, under an action of an acid, undergoes an increase in solubility thereof in alkali, and a fluorene compound represented by the formula (1).

Abstract: A chemically amplified photosensitive resin composition including a compound represented by formula (1) and/or formula (4), a resin having an acid-dissociative dissolution-controlling group whose solubility in alkali increases under the action of an acid or an alkali-soluble resin, a photoacid generator, and an organic solvent, in which the solid concentration is 40% by mass to 65% by mass. R1, R2, and R3 independently represent a hydrogen atom or an alkyl group, R4 represents a group represented by formula (2) or (3), and R5 and R6 represent a monovalent hydrocarbon group which may have a substituent.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the phenomenon of footing in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the composition. A mercapto compound is contained in the composition which includes an acid generator capable of producing an acid when irradiated with an active ray or radiation and a resin whose solubility in alkali increases under the action of acid.

Abstract: A chemically amplified photosensitive resin composition including a compound represented by formula (1) and/or formula (4), a resin having an acid-dissociative dissolution-controlling group whose solubility in alkali increases under the action of an acid or an alkali-soluble resin, a photoacid generator, and an organic solvent, in which the solid concentration is 40% by mass to 65% by mass. R1, R2, and R3 independently represent a hydrogen atom or an alkyl group, R4 represents a group represented by formula (2) or (3), and R5 and R6 represent a monovalent hydrocarbon group which may have a substituent.

Abstract: A method of forming a film including forming a film on a substrate by coating a composition for forming a film containing a solvent and a resin by a spin coating method, in which a maximum radius among the radii from the center to the outer periphery of the substrate is 150 mm or more and a thickness of the film is 50 ?m or more, a vapor pressure of the solvent at 25° C. is 0.4 kPa or less, and a viscosity of the solvent measured by a Cannon-Fenske viscometer at 25° C. is 1.5 mPa·s or less.