Patents by Inventor Shota KITAJIMA

Shota KITAJIMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11745303
    Abstract: In an abrasive body used for polishing by a CMP method, provided with a resin structure, a plurality of abrasive grains, and a plurality of longitudinal pores, and made in a form of disc, the longitudinal pore has a length in a thickness direction of the abrasive body longer than a length in a planar direction of the abrasive body, the resin structure includes communicating pores each of which communicating with the longitudinal pore and/or communicating with other communicating pore, the communicating pores include at least one of the abrasive grains in the pores respectively, and the average diameter of the communicating pores is not more than 18 times larger than the average diameter of the abrasive grains.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: September 5, 2023
    Assignee: NORITAKE CO., LIMITED
    Inventors: Wataru Omori, Takaya Yamaguchi, Shota Kitajima, Makoto Sato
  • Publication number: 20230265319
    Abstract: An aspect of the present invention relates to an adhesive composition or an adhesive sheet, and the adhesive composition contains a (meth)acrylic polymer (A) which is a polymer of monomer components including, in specific amounts, at least one (meth)acrylic acid ester selected from an alkoxyalkyl (meth)acrylate ester and a specific alkyl (meth)acrylate ester, a crosslinkable functional group-containing monomer (excluding an amino group-containing monomer), and an amino group-containing monomer, an acid-modified polyolefin (B), a specific tackifier resin (C), and a crosslinking agent (D), and satisfies specific requirements (I) to (III).
    Type: Application
    Filed: June 29, 2021
    Publication date: August 24, 2023
    Inventor: Shota Kitajima
  • Publication number: 20190247975
    Abstract: In an abrasive body used for polishing by a CMP method, provided with a resin structure, a plurality of abrasive grains, and a plurality of longitudinal pores, and made in a form of disc, the longitudinal pore has a length in a thickness direction of the abrasive body longer than a length in a planar direction of the abrasive body, the resin structure includes communicating pores each of which communicating with the longitudinal pore and/or communicating with other communicating pore, the communicating pores include at least one of the abrasive grains in the pores respectively, and the average diameter of the communicating pores is not more than 18 times larger than the average diameter of the abrasive grains.
    Type: Application
    Filed: July 10, 2017
    Publication date: August 15, 2019
    Applicant: NORITAKE CO., LIMITED
    Inventors: Wataru OMORI, Takaya YAMAGUCHI, Shota KITAJIMA, Makoto SATO