Abstract: A diagnostic device separates sensor waveform data obtained in each plasma process into components of individuals of a plurality of predefined sensor waveform change types, calculates a deterioration degree indicating a deterioration state of the part for each separated sensor waveform component based on sensor waveform components at a normal time and a diagnosis time or sensor waveform components at a deterioration time and the diagnosis time, diagnoses necessity for the maintenance of a part using the deterioration degree, executes a filtering process on time-series data of the deterioration degree calculated for each plasma process, and sets a threshold used for deterioration diagnosis for each plasma processing apparatus based on a distribution calculated using a plurality of deterioration degrees after the filter processing is performed during a learning interval from time of component maintenance to time after the process is executed a predetermined number of times.

Abstract: In a diagnosis apparatus for diagnosing a state of a plasma processing apparatus, prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first sensors is estimated based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus different from the first plasma processing apparatus, and a state of the second plasma processing apparatus is diagnosed by using the estimated probability distribution.

Abstract: A diagnosis device that uses information from state sensors provided in a plasma processing apparatus for plasma processing a specimen to diagnose deterioration states of components configuring the plasma processing apparatus includes an execution unit that computes and calculates deterioration degree of each of the components configuring the plasma processing apparatus on the basis of the information from the state sensors, and an analysis unit that sets a computation condition for computing and calculating the deterioration degree by the execution unit on the basis of the information from the state sensors and calculates a maintenance period of the plasma processing apparatus on the basis of the information of the deterioration degree of each of the components configuring the plasma processing apparatus computed and calculated by the execution unit, and makes it possible to decide deterioration degree computation condition having high robustness for each of the components.

Abstract: The plasma processing apparatus includes a plasma processing unit that performs plasma processing of a sample and a control unit that controls the plasma processing. The control unit selects one of a plurality of the prediction models for predicting a result of the plasma processing based on a state of the plasma processing unit, and predicts the result of the plasma processing by using a selected prediction model.

Abstract: In a plasma processing apparatus, occurrence of unplanned maintenance is predicted in advance so that a time when the work should be incorporated into planned maintenance can be determined. An apparatus diagnostic apparatus including a degradation score estimation unit that receives an output of a sensor mounted on a plasma processing apparatus and estimates a degradation score of the plasma processing device; a maintenance work occurrence probability estimation unit that calculates a probability of occurrence of an unplanned maintenance work that is not included in an original maintenance plan based on the degradation score; an actual maintenance cost calculation unit that calculates an actual maintenance cost; and a plan incorporated maintenance cost calculation unit that outputs a correction plan of maintenance plan in which the original maintenance plan is corrected by incorporating the unplanned maintenance work based on the probability of occurrence of the unplanned maintenance work.

Abstract: A character input device according to one or more embodiments may include a candidate retrieval unit configured to retrieve conversion candidates for an input character string that is input, and a sequence determination unit configured to determine a sequence of the conversion candidates. The sequence determination unit dynamically changes a parameter used to determine the sequence of the conversion candidates.

Abstract: In a diagnosis apparatus for diagnosing a state of a plasma processing apparatus, prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first sensors is estimated based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus different from the first plasma processing apparatus, and a state of the second plasma processing apparatus is diagnosed by using the estimated probability distribution.

Abstract: A production information management system includes: a storage device that stores 4M (man, machine, material, and method) data information including time series data in which a state of each element of 4M per unit time is associated with acquisition accuracy of 4M data defined for each target and acquisition method of 4M, and analysis model information defining a criterion for determining a production loss from a combination of the 4M data information; a processor that analyzes the 4M data information by the analysis model information to estimate a production loss, and calculates estimation accuracy for the each production loss to generate production loss information; and a production loss display unit that displays the production loss information.

Abstract: Provided is a plasma processing apparatus including a processing unit in which a sample is plasma processed and which includes a monitor (optical emission spectroscopy) that monitors light emission of plasma, wherein the processing unit includes a prediction model storage unit that stores a prediction model predicting a plasma processing result, and a control device in which the plasma processing result is predicted by using a prediction model selected based on light emission data and device data as an indicator of state change of the processing unit.

Abstract: The plasma processing apparatus includes a plasma processing unit that performs plasma processing of a sample and a control unit that controls the plasma processing. The control unit selects one of a plurality of the prediction models for predicting a result of the plasma processing based on a state of the plasma processing unit, and predicts the result of the plasma processing by using a selected prediction model.

Abstract: The plasma processing apparatus includes a plasma processing unit that performs plasma processing of a sample and a control unit that controls the plasma processing. The control unit selects one of a plurality of the prediction models for predicting a result of the plasma processing based on a state of the plasma processing unit, and predicts the result of the plasma processing by using a selected prediction model.

Abstract: An electronic sphygmomanometer includes a cuff including an air bladder, a pressure sensor, an artery volume sensor, and a computation device. The computation device includes an inner pressure control section, a volume sensor signal receive section for receiving a pulse wave signal detected by the artery volume sensor, a pressure sensor signal receive section for receiving a pressure pulse wave signal superimposed on the inner pressure of the air bladder and detected by the pressure sensor, a judgment section for choosing either the pulse wave signal or the pressure pulse wave signal as a signal for calculating pulse rate of the patient during a period when the inner pressure of the air bladder is increased and/or decreased by the inner pressure control section, and a pulse rate calculation section for calculating pulse rate of the patient based on the pulse wave signal and the signal chosen by the judgment section.

Abstract: Provided is a plasma processing apparatus including a processing unit in which a sample is plasma processed and which includes a monitor (optical emission spectroscopy) that monitors light emission of plasma, wherein the processing unit includes a prediction model storage unit that stores a prediction model predicting a plasma processing result, and a control device in which the plasma processing result is predicted by using a prediction model selected based on light emission data and device data as an indicator of state change of the processing unit.

Abstract: The plasma processing apparatus includes a plasma processing unit that performs plasma processing of a sample and a control unit that controls the plasma processing. The control unit selects one of a plurality of the prediction models for predicting a result of the plasma processing based on a state of the plasma processing unit, and predicts the result of the plasma processing by using a selected prediction model.

Abstract: A blood pressure and pulse measurement device includes a cuff including a first air bladder, a pressure sensor, a pressing member, a pulse wave sensor, and an operation unit. When measurement of the blood pressure is instructed by the operation unit, the first air bladder of the cuff is inflated to increase inner pressure to a sufficient level such that the blood pressure of the patient can be measured by the pressure sensor and then deflated. When measurement of the blood pressure is not instructed by the operation unit, air of the first air bladder of the cuff is released such that the measurement location of the patient is not substantially pressed by the first air bladder, and the measurement location of the patient is pressed by the pressing member with sufficient pressure such that pulse of the patient can be detected by the pulse wave sensor.

Abstract: A blood pressure and pulse measurement device includes a cuff including a first air bladder, a pressure sensor, a pressing member, a pulse wave sensor, and an operation unit. When measurement of the blood pressure is instructed by the operation unit, the first air bladder of the cuff is inflated to increase inner pressure to a sufficient level such that the blood pressure of the patient can be measured by the pressure sensor and then deflated. When measurement of the blood pressure is not instructed by the operation unit, air of the first air bladder of the cuff is released such that the measurement location of the patient is not substantially pressed by the first air bladder, and the measurement location of the patient is pressed by the pressing member with sufficient pressure such that pulse of the patient can be detected by the pulse wave sensor.

Abstract: An electronic sphygmomanometer includes a cuff including an air bladder, a pressure sensor, an artery volume sensor, and a computation device. The computation device includes an inner pressure control section, a volume sensor signal receive section for receiving a pulse wave signal detected by the artery volume sensor, a pressure sensor signal receive section for receiving a pressure pulse wave signal superimposed on the inner pressure of the air bladder and detected by the pressure sensor, a judgment section for choosing either the pulse wave signal or the pressure pulse wave signal as a signal for calculating pulse rate of the patient during a period when the inner pressure of the air bladder is increased and/or decreased by the inner pressure control section, and a pulse rate calculation section for calculating pulse rate of the patient based on the pulse wave signal and the signal chosen by the judgment section.