Abstract: A substrate processing method includes providing a substrate processing apparatus including a processing container that accommodates a substrate, and a heater that heats an inside of the processing container; setting a specific section with an in-plane temperature distribution of a substrate that results in a desired outcome of substrate processing based on a first prediction model that predicts a time-dependent change of the in-plane temperature distribution of the substrate after temperature increase or decrease caused by the heater; and performing the substrate processing in the specific section.

Abstract: An engine malfunction determination system includes a vehicle engine, an engine sensor system, an engine control module and an electronic display device. The engine sensor system has at least one sensor configured to detect an operation condition of the vehicle engine. The engine control module is in electrical communication with the sensor system to receive a detection signal from the engine sensor system regarding the operation condition of the vehicle engine. The engine control module is programmed to determine an anomaly in the detection signal. The electronic display device is programmed to display an indication of engine malfunction when the engine control module determines that the anomaly in the detection signal exceeds a predetermined threshold.

Abstract: A warning system includes an information acquisition unit, a risk degree calculation unit and an alarm. The information acquisition unit acquires a heart rate and an acceleration, which are items of biological information pertaining to a monitored person, as well as temperature and humidity, which are items of environment information pertaining to surroundings of the monitored person. The risk degree calculation unit calculates a degree of risk relating to heatstroke in the monitored person based on the heart rate, acceleration, temperature, and humidity. The alarm issues a warning based on an extent of the calculated degree of risk. The alarm modifies a scope of the warning according to the extent of the degree of risk.

Abstract: A substrate processing system includes a substrate processing apparatus including a processing container and a boat for transferring a plurality of substrates into the processing container; a measuring device that measures a substrate processing result of a substrate in the substrate processing apparatus; and an information processing device that estimates substrate processing results at a plurality of points on the substrate, based on the substrate processing result. The information processing device of the substrate processing system includes an input unit that inputs summary data extracted from the substrate processing result measured by the measuring device, a calculation unit that calculates a plurality of estimated values indicating the substrate processing results at the plurality of points on the substrate based on the summary data; and a display control unit that displays the plurality of estimated values on a display device.

Abstract: In a coating evaluation device and a coating evaluation method, information on a coating is acquired. The information on a coating includes material information representing a material of a coating surface, and at least one of shape information representing a curved shape of the coating surface, and surface roughness information representing a surface roughness of the coating surface. An evaluation value that corresponds to a combination of the material information, the shape information, and the surface roughness information is estimated by using an evaluation model that outputs a brilliance evaluation value pertaining to the coating surface in response to an input including the material information, the shape information, and the surface roughness information.

Abstract: An information processing apparatus includes an input unit that inputs positional information regarding a plurality of measurement points on a substrate and a plurality of measured values indicating a substrate processing result at each of the plurality of measurement points, a calculation unit that calculates a plurality of estimated values for the substrate processing result at each of the plurality of measurement points selected from the input positional information regarding the plurality of measurement points using a local linear regression method, a determination unit that determines, as an outlier, the measured value at the measurement point where an absolute value of a difference between the measured value and the estimated value at each of the plurality of selected measurement points deviates from a preset threshold, and a correction unit that corrects the measured value at the measurement point determined as the outlier.

Abstract: In a coating evaluation device and a coating evaluation method, a coating surface is irradiated with incident light having a first intensity distribution, and a second intensity distribution of light reflected from the coating surface is acquired. Additionally, a third intensity distribution associated with the second intensity distribution is calculated based on shape information representing a curved shape of the coating surface, and an evaluation value that corresponds to the third intensity distribution is estimated by using an evaluation model that outputs a brilliance evaluation value pertaining to the coating surface in response to an input including the third intensity distribution. The curved shape of the coating surface is acquired based on measuring a coating surface or based on design data pertaining to the coating surface.

Abstract: In a coating evaluation device and a coating evaluation method, information on a coating is acquired. The information on a coating includes shape information representing a curved shape of a coating surface and surface roughness information representing a surface roughness of the coating surface. An evaluation value that corresponds to a combination of the shape information and the surface roughness information is estimated by using an evaluation model that outputs a brilliance evaluation value pertaining to the coating surface in response to an input including the shape information and the surface roughness information.

Abstract: An information processing device includes a storage configured to store a first film thickness model or a first refractive index model defining an amount of change in a film thickness or a refractive index at each position of a first wafer when a film forming processing is performed by changing an output of each of a plurality of plasma sources provided in a film forming device by a predetermined amount and a calculator configured to calculate, based on the first film thickness model or the first refractive index model, a correction value of the output of each of the plurality of plasma sources to achieve a target value of a film thickness or a target value of a refractive index at each position of a second wafer.

Abstract: An engine malfunction determination system includes a vehicle engine, an engine sensor system, an engine control module and an electronic display device. The engine sensor system has at least one sensor configured to detect an operation condition of the vehicle engine. The engine control module is in electrical communication with the sensor system to receive a detection signal from the engine sensor system regarding the operation condition of the vehicle engine. The engine control module is programmed to determine an anomaly in the detection signal. The electronic display device is programmed to display an indication of engine malfunction when the engine control module determines that the anomaly in the detection signal exceeds a predetermined threshold.

Abstract: An information processing apparatus includes: a registration reception unit that receives a registration of registration information for identifying log information of a desired process step from log information of a substrate processing apparatus that has performed a process including a plurality of steps according to a process condition; an identification unit that identifies the log information of the desired process step from the log information of the substrate processing apparatus, based on the registration information; a process condition acquisition unit that acquires a process condition of the desired process step from the identified log information of the desired process step; an optimization unit that optimizes the process condition of the desired process step, using the acquired process condition of the desired process step, and process result information of the process; and an output unit that outputs the optimized process condition of the desired process step.

Abstract: An information processing device includes: a machine learning model selection part configured to select a machine learning model appropriate for a data set used for learning of the machine learning model; a calculation part configured to perform an optimization calculation by using the selected machine learning model to calculate process conditions that can achieve a target process result, predicted values of a process result corresponding to each of the process conditions, and reliability of the predicted values; a process condition selection part configured to select, among the process conditions that can achieve the target process result, one or more process conditions according to the predicted values of the process result and the reliability of the predicted values; and a display controller configured to display the selected process conditions, the predicted values of the process result corresponding to each of the selected process conditions, and the reliability of the predicted values.

Abstract: An information processing device includes a storage configured to store a first film thickness model or a first refractive index model defining an amount of change in a film thickness or a refractive index at each position of a first wafer when a film forming processing is performed by changing an output of each of a plurality of plasma sources provided in a film forming device by a predetermined amount and a calculator configured to calculate, based on the first film thickness model or the first refractive index model, a correction value of the output of each of the plurality of plasma sources to achieve a target value of a film thickness or a target value of a refractive index at each position of a second wafer.

Abstract: A trajectory planning method according to the present invention is one for obtaining a trajectory for controlling a state of an object toward a goal state by a trajectory planning system. The method includes the steps of dividing, by a cell generating section for dividing a state space of the object into cells, the state space into cells in such a way that approximation error due to discretization is minimized for a predetermined number of cells; generating, by a search tree generating section, a search tree which corresponds to state transition of the object in such a way that each cell does not contain more than one of nodes of branches of the search tree; and determining, by a trajectory generating section, a path from the current state to the goal state of the object using the search tree.

Abstract: A trajectory planning method according to the present invention is one for obtaining a trajectory for controlling a state of an object toward a goal state by a trajectory planning system. The method includes the steps of dividing, by a cell generating section for dividing a state space of the object into cells, the state space into cells in such a way that approximation error due to discretization is minimized for a predetermined number of cells; generating, by a search tree generating section, a search tree which corresponds to state transition of the object in such a way that each cell does not contain more than one of nodes of branches of the search tree; and determining, by a trajectory generating section, a path from the current state to the goal state of the object using the search tree.