Patents by Inventor Shotaro BEPPU

Shotaro BEPPU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230128396
    Abstract: A coating material of the present invention is a coating material containing: a fluorine-containing polymer having at least one of an iodine atom and a bromine atom; and a solvent, wherein a storage elastic modulus G? of the fluorine-containing polymer is less than 360 kPa, and a total light transmittance of a mixed liquid obtained by mixing and stirring the fluorine-containing polymer and the solvent contained in the coating material is 1.0% or more, the mixed liquid being left to stand for 3 days, stirred again, and left to stand for 30 minutes to measure the total light transmittance.
    Type: Application
    Filed: December 21, 2022
    Publication date: April 27, 2023
    Applicant: AGC Inc.
    Inventors: Masatoshi ABE, Mizuna TOYODA, Tsuyoshi KAWAI, Shotaro BEPPU
  • Publication number: 20220372186
    Abstract: A fluorinated polymer suitable for deposition is provided. A film containing such a fluorinated polymer as a material is provided. A method for producing a film, by which such a film can readily be produced, is provided. Further, an organic photoelectronic element having such a film in its structure is provided. A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is 200° C. or higher, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 100° C.
    Type: Application
    Filed: August 3, 2022
    Publication date: November 24, 2022
    Applicant: AGC Inc.
    Inventors: Takefumi ABE, Kaori TSURUOKA, Tetsuji SHIMOHIRA, Saki TAKEI, Shotaro BEPPU
  • Publication number: 20220372180
    Abstract: A fluorinated polymer suitable for deposition and capable of favorable metal patterning, is provided. A resin film containing such a fluorinated polymer as a material is provided. Further, a photoelectronic element having such a resin film in its structure is provided. A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is less than 200° C., or no melting point is observed, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 200° C.
    Type: Application
    Filed: August 3, 2022
    Publication date: November 24, 2022
    Applicant: AGC Inc.
    Inventors: Takefumi ABE, Kaori TSURUOKA, Tetsuji SHIMOHIRA, Saki TAKEI, Shotaro BEPPU