Patents by Inventor Shou-Lun Tu

Shou-Lun Tu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8519434
    Abstract: An electrostatic discharge (ESD) protected device may include a substrate, an N-type well region disposed corresponding to a first portion of the substrate and having two N+ segments disposed at a surface thereof, an a P-type well region disposed proximate to a second portion of the substrate and having a P+ segment and an N+ segment. The two N+ segments may be spaced apart from each other and each may each be associated with an anode of the device. The N+ segment may be associated with a cathode of the device. A contact may be positioned in a space between the two N+ segments and connected to the P+ segment. The contact may form a parasitic capacitance that, in connection with a parasitic resistance formed in association with the N+ segment, provides self detection for high voltage ESD protection.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: August 27, 2013
    Assignee: Macronix International Co., Ltd.
    Inventors: Hsin-Liang Chen, Shou-Lun Tu, Wing-Chor Chan, Shyi-Yuan Wu
  • Publication number: 20120241900
    Abstract: An electrostatic discharge (ESD) protected device may include a substrate, an N-type well region disposed corresponding to a first portion of the substrate and having two N+ segments disposed at a surface thereof, an a P-type well region disposed proximate to a second portion of the substrate and having a P+ segment and an N+ segment. The two N+ segments may be spaced apart from each other and each may each be associated with an anode of the device. The N+ segment may be associated with a cathode of the device. A contact may be positioned in a space between the two N+ segments and connected to the P+ segment. The contact may form a parasitic capacitance that, in connection with a parasitic resistance formed in association with the N+ segment, provides self detection for high voltage ESD protection.
    Type: Application
    Filed: March 22, 2011
    Publication date: September 27, 2012
    Inventors: Hsin-Liang Chen, Shou-Lun Tu, Wing-Chor Chan, Shyi-Yuan Wu