Patents by Inventor Shou-Yi Tseng

Shou-Yi Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching method with less waste gases
    Publication number: 20030168430
    Abstract: An etching method with less waste gases. Firstly, provide a substrate covered by a dielectric layer, and put both the substrate and the dielectric layer into a chamber that is coupled with a power source and a C3F8 reactive gases source. Next, provide a plasma inside the chamber under an environment with a low RF power, and a low pressure. Finally, terminate the existence of the plasma and move both the substrate and the etched dielectric later out the chamber.
    Type: Application
    Filed: March 11, 2002
    Publication date: September 11, 2003
    Applicant: Macronix International Co., Ltd.
    Inventors: Kuo-Wei Shyu, Shou-Yi Tseng, Tian-Jue Hong, Jung-Yi Wu, Yen-Wen Chen