Abstract: The present disclosure provides a mask device and a manufacturing method thereof, and an evaporation system. The mask device includes a frame, strip alignment plates and a strip support plate, hollow portions are provided in the strip alignment plates, and the strip alignment plates are fixed on the frame; the strip support plate and the strip alignment plates cross each other, a plurality of welding spots are provided on the surface of the strip support plate proximal to the frame, and are welded and fixed to the frame, and the plurality of welding spots are provided in the region of the strip support plate corresponding to the hollow portions.

Abstract: A method for calculating equivalent mechanical parameters of a film layer etching region is provided, by which more accurate equivalent mechanical parameters, which will be used in a process of manufacturing a display substrate of a terminal, may be obtained, thereby obtaining a display substrate with less defects. The method includes: selecting at least a part of the film layer etching region as an analysis region; establishing a planar model corresponding to the analysis region; performing grid division on the planar model at a first density; analyzing, by means of a finite element method, first simulation stresses of the planar model in simulated boundary conditions according to the actual mechanical parameters of a film layer material and the grid division of the first density; and calculating equivalent mechanical parameters.

Abstract: The present disclosure provides a mask tension frame and a mask tension process, where the mask tension frame includes a frame body and a supporting rib. The frame body is provided with a first surface, a second surface, and an opening. The first surface and the second surface are oppositely disposed, and the opening is recessed in the direction from the first surface toward the second surface. The supporting rib spans the opening of the frame body. A surface of the supporting rib for supporting the mask is higher than the first surface with respect to the second surface. When the mask is being tensed by the mask tension frame, at least a portion of the mask is supported by the supporting rib and at least a portion of the mask adjacent to an edge of the mask is supported by the first surface.

Abstract: The present disclosure provides a mask plate frame. The mask plate frame includes two opposite rims, and a plurality of connectors detachably mounted to a first surface of each rim along a length direction of each rim. Each connector is used to mount a mask strip.

Abstract: A mask carrier and an evaporation system are provided. The mask carrier includes a base and at least two correction fixtures. The at least two correction fixtures are configured to clamp, on the base, a framework of a metal mask which is used for evaporation on the base, the base has a first opening through which organic material passes, and the at least two correction fixtures are around the first opening in a spaced manner. During organic evaporation coating, the at least two correction fixtures on the mask carrier press the framework of the metal mask to prevent the framework from deformation. Thus, a clearance between a substrate and the metal mask is reduced or even eliminated after the substrate is in press-fit with surface of the metal mask. Patterns obtained through evaporation are clear in shape and outline and normal in size. Hence, the product yield is increased.

Abstract: The present disclosure provides a mask device and a manufacturing method thereof, and an evaporation system. The mask device includes a frame, strip alignment plates and a strip support plate, hollow portions are provided in the strip alignment plates, and the strip alignment plates are fixed on the frame; the strip support plate and the strip alignment plates cross each other, a plurality of welding spots are provided on the surface of the strip support plate proximal to the frame, and are welded and fixed to the frame, and the plurality of welding spots are provided in the region of the strip support plate corresponding to the hollow portions.

Abstract: A metal mask plate and a method for manufacturing the same are disclosed. A metal mask plate for evaporation comprises: a frame including a first side bar and a second side bar which are opposite and parallel to each other, and a support for supporting the first side bar and the second side bar; and a plurality of metal masks disposed on a first side of the frame, each of the metal masks extending in a direction which is perpendicular to a direction in which the first side bar extends, and both ends of each of the metal masks being fixed to the first side bar and the second side bar respectively, so that the support is deformed by a surface tension of the plurality of metal masks to form a planar structure.

Abstract: A mask and a fabrication method thereof are provided. The mask includes: a frame, which includes a hollow portion and a border surrounding the hollow portion; an opening plate, which is provided on the frame and includes an opening and a body surrounding the opening, the opening corresponding to the hollow portion, and the body being connected with the border; and a pattern plate, which is provided on the opening plate and includes a pattern portion and a non-pattern portion positioned in a periphery of the pattern portion, the pattern portion corresponding to the opening, the non-pattern portion being connected with the body of the opening plate, and the non-pattern portion and the frame being separated from each other at a position of the border.

Abstract: The present disclosure provides a carrier plate for an evaporating device and an evaporating device thereof. The carrier plate includes a substrate including a groove on a surface of a side, for carrying a member to be evaporated, of the substrate, and a cooler disposed within the groove, wherein the cooler protrudes outward from the surface of the substrate.

Abstract: A method for calculating equivalent mechanical parameters of a film layer etching region is provided, by which more accurate equivalent mechanical parameters, which will be used in a process of manufacturing a display substrate of a terminal, may be obtained, thereby obtaining a display substrate with less defects. The method includes: selecting at least a part of the film layer etching region as an analysis region; establishing a planar model corresponding to the analysis region; performing grid division on the planar model at a first density; analyzing, by means of a finite element method, first simulation stresses of the planar model in simulated boundary conditions according to the actual mechanical parameters of a film layer material and the grid division of the first density; and calculating equivalent mechanical parameters.

Abstract: The present disclosure provides a mask plate frame. The mask plate frame includes two opposite rims, and a plurality of connectors detachably mounted to a first surface of each rim along a length direction of each rim. Each connector is used to mount a mask strip.

Abstract: The disclosure relates to the field of vapor-plating technologies, and discloses a mask strip, a mask, and a vapor-plating device to thereby improve the quality of vapor plating. The mask strip includes solder holes for soldering on a upper surface of a frame of a mask, and a first groove which is on the sides of the solder holes away from the upper surface of the frame, and communicates with the solder holes.

Abstract: A mask carrier and an evaporation system are provided. The mask carrier includes a base and at least two correction fixtures. The at least two correction fixtures are configured to clamp, on the base, a framework of a metal mask which is used for evaporation on the base, the base has a first opening through which organic material passes, and the at least two correction fixtures are around the first opening in a spaced manner. During organic evaporation coating, the at least two correction fixtures on the mask carrier press the framework of the metal mask to prevent the framework from deformation. Thus, a clearance between a substrate and the metal mask is reduced or even eliminated after the substrate is in press-fit with surface of the metal mask. Patterns obtained through evaporation are clear in shape and outline and normal in size. Hence, the product yield is increased.

Abstract: A mask and a fabrication method thereof are provided. The mask includes: a frame, which includes a hollow portion and a border surrounding the hollow portion; an opening plate, which is provided on the frame and includes an opening and a body surrounding the opening, the opening corresponding to the hollow portion, and the body being connected with the border; and a pattern plate, which is provided on the opening plate and includes a pattern portion and a non-pattern portion positioned in a periphery of the pattern portion, the pattern portion corresponding to the opening, the non-pattern portion being connected with the body of the opening plate, and the non-pattern portion and the frame being separated from each other at a position of the border.

Abstract: The present disclosure relates to a metal mask plate and a method for manufacturing the same. A frame is formed which includes a first side bar and a second side bar parallel to each other, and a support for supporting the first side bar and the second side bar. The frame protrudes toward a first side so that the support forms an arc structure protruding toward the first side of the frame. A plurality of metal masks are stretched and disposed on the first side of the frame, each metal mask extending in a direction which is perpendicular to the direction in which the first side bar extends; and fixing both ends of each of the metal masks to the first side bar and the second side bar respectively. The support is deformed by a surface tension of the plurality of metal masks to form a planar structure.

Abstract: A mask includes a plurality of mask strips and a mounting frame, the plurality of mask strips are mounted on a mounting frame after being stretched. Each mask strip includes a plurality of mask units. Each mask unit includes an effective opening region and two vacant regions. Mask openings are disposed in the effective opening region. The two vacant regions are respectively provided on both sides of the effective opening region perpendicular to a stretching direction and close to the effective opening region. Vacant openings are disposed in the vacant regions. Wherein the contour shape of each mask opening is different from that of each vacant opening and the stress generated by the mask openings and the stress generated by the vacant openings in a stretching process can be mutually compensated.