Patents by Inventor Shouji Sakamoto

Shouji Sakamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8430990
    Abstract: The present invention relates to an inexpensive adhesive resin composition which is applicable even to a base material having a poor bonding property. The adhesive resin composition comprises (A) a polymer having no radical-polymerizable double bond and (B) a radical generating agent in which the radical generating agent (B) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). In the preferred embodiment of the present invention, the adhesive resin composition further comprises (C) a radical-polymerizable monomer wherein the monomer (C) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). The radical-polymerizable monomer (C) is a glycidyl group-containing monomer, and the glycidyl group-containing monomer is 4-hydroxybutyl acrylate glycidyl ether.
    Type: Grant
    Filed: October 6, 2011
    Date of Patent: April 30, 2013
    Assignee: Nippon Kasei Chemical Company Limited
    Inventors: Satoshi Yamauchi, Yoshiko Kaneko, Katsufumi Kujira, Shouji Sakamoto
  • Publication number: 20120027949
    Abstract: The present invention relates to an inexpensive adhesive resin composition which is applicable even to a base material having a poor bonding property. The adhesive resin composition comprises (A) a polymer having no radical-polymerizable double bond and (B) a radical generating agent in which the radical generating agent (B) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). In the preferred embodiment of the present invention, the adhesive resin composition further comprises (C) a radical-polymerizable monomer wherein the monomer (C) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). The radical-polymerizable monomer (C) is a glycidyl group-containing monomer, and the glycidyl group-containing monomer is 4-hydroxybutyl acrylate glycidyl ether.
    Type: Application
    Filed: October 6, 2011
    Publication date: February 2, 2012
    Applicant: NIPPON KASEI CHEMICAL COMPANY LIMITED
    Inventors: Satoshi YAMAUCHI, Yoshiko Kaneko, Katsufumi Kujira, Shouji Sakamoto
  • Patent number: 8062469
    Abstract: The present invention relates to an inexpensive adhesive resin composition which is applicable even to a base material having a poor bonding property. The adhesive resin composition comprises (A) a polymer having no radical-polymerizable double bond and (B) a radical generating agent in which the radical generating agent (B) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). In the preferred embodiment of the present invention, the adhesive resin composition further comprises (C) a radical-polymerizable monomer wherein the monomer (C) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). The radical-polymerizable monomer (C) is a glycidyl group-containing monomer, and the glycidyl group-containing monomer is 4-hydroxybutyl acrylate glycidyl ether.
    Type: Grant
    Filed: February 5, 2008
    Date of Patent: November 22, 2011
    Assignee: Nippon Kasei Chemical Company Limited
    Inventors: Satoshi Yamauchi, Yoshiko Kaneko, Katsufumi Kujira, Shouji Sakamoto
  • Publication number: 20100096082
    Abstract: The present invention relates to an inexpensive adhesive resin composition which is applicable even to a base material having a poor bonding property. The adhesive resin composition comprises (A) a polymer having no radical-polymerizable double bond and (B) a radical generating agent in which the radical generating agent (B) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). In the preferred embodiment of the present invention, the adhesive resin composition further comprises (C) a radical-polymerizable monomer wherein the monomer (C) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). The radical-polymerizable monomer (C) is a glycidyl group-containing monomer, and the glycidyl group-containing monomer is 4-hydroxybutyl acrylate glycidyl ether.
    Type: Application
    Filed: February 5, 2008
    Publication date: April 22, 2010
    Applicant: NIPPON KASEI CHEMICAL COMPANY LIMITED
    Inventors: Satoshi Yamauchi, Yoshiko Kaneko, Katsufumi Kujira, Shouji Sakamoto
  • Publication number: 20050253933
    Abstract: In an image pickup device, a crystal as an optical low pass filter is rotatable in a vertical plane that is vertical to an optical axis. In a normal mode and a shift mode, the crystal is rotated in order to change a separation direction of pixels. Thereby, moirés in a circular zone can be eliminated in the normal mode, and moirés in a high frequency side can be eliminated in the shift mode while a contrast zero line is not passed through the center section of the circular zone in order to prevent the decreasing of a resolution and to improve the characteristic of the shift mode. Because the rotary mechanism can be formed simply and smaller, the device can be manufactured with a low coast and a high realibility.
    Type: Application
    Filed: July 26, 2005
    Publication date: November 17, 2005
    Inventors: Yoshichi Otake, Fumio Nidaira, Hideki Tengeiji, Shouji Sakamoto
  • Publication number: 20010005220
    Abstract: In an image pickup device, a crystal as an optical low pass filter is rotatable in a vertical plane that is vertical to an optical axis. In a normal mode and a shift mode, the crystal is rotated in order to change a separation direction of pixels. Thereby, moirés in a circular zone can be eliminated in the normal mode, and moirés in a high frequency side can be eliminated in the shift mode while a contrast zero line is not passed through the center section of the circular zone in order to prevent the decreasing of a resolution and to improve the characteristic of the shift mode. Because the rotary mechanism can be formed simply and smaller, the device can be manufactured with a low coast and a high realibility.
    Type: Application
    Filed: December 19, 2000
    Publication date: June 28, 2001
    Inventors: Yoshichi Otake, Fumio Nidaira, Hideki Tengeiji, Shouji Sakamoto