Patents by Inventor Shouji Yagi

Shouji Yagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Micromachine and manufacturing method
    Patent number: 7189625
    Abstract: In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: March 13, 2007
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Hiromu Ishii, Yasuyuki Tanabe, Katsuyuki Machida, Masami Urano, Shouji Yagi, Tomomi Sakata
  • Micromachine and manufacturing method
    Publication number: 20060027839
    Abstract: In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.
    Type: Application
    Filed: October 4, 2005
    Publication date: February 9, 2006
    Inventors: Hiromu Ishii, Yasuyuki Tanabe, Katsuyuki Machida, Masami Urano, Shouji Yagi, Tomomi Sakata
  • Surface shape recognition sensor and method of manufacturing the same
    Patent number: 6844744
    Abstract: A surface shape recognition sensor of this invention has a surface protective film having a hydrophobic property on an insulating protective film which is made of an insulator and formed to cover a sensor electrode, and includes at least a ground electrode which is formed on the substrate such that the ground electrode is partly exposed on the surfaces of the insulating protective film and surface protective film so as to be insulated/isolated from the sensor electrode and come into contact with the surface of a detection target. This sensor prevents fingerprint residues from easily remaining and improves tamper resistance.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: January 18, 2005
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Hiromu Ishii, Shouji Yagi, Katsuyuki Machida, Hakaru Kyuragi
  • Micromachine manufacturing method
    Patent number: 6743653
    Abstract: A micromachine manufacturing method according to this invention includes at least the movable portion formation step of selectively etching a single-crystal silicon layer by using a movable portion formation mask pattern as a mask, thereby forming on the single-crystal silicon layer a movable portion which is coupled to the surrounding single-crystal silicon layer via a coupling portion on a buried oxide, the movable portion protective film formation step of forming a movable portion protective film on the single-crystal silicon layer so as to cover the movable portion while the movable portion is formed on the buried oxide, and the step of forming a buried protective film which covers the movable portion exposed in the substrate opening and movable portion opening, and the single-crystal silicon layer around the movable portion while the movable portion protective film is formed.
    Type: Grant
    Filed: May 8, 2003
    Date of Patent: June 1, 2004
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Yasuyuki Tanabe, Katsuyuki Machida, Hiromu Ishii, Shouji Yagi
  • Micromachine manufacturing method
    Publication number: 20040072386
    Abstract: A micromachine manufacturing method according to this invention includes at least the movable portion formation step of selectively etching a single-crystal silicon layer by using a movable portion formation mask pattern as a mask, thereby forming on the single-crystal silicon layer a movable portion which is coupled to the surrounding single-crystal silicon layer via a coupling portion on a buried oxide, the movable portion protective film formation step of forming a movable portion protective film on the single-crystal silicon layer so as to cover the movable portion while the movable portion is formed on the buried oxide, and the step of forming a buried protective film which covers the movable portion exposed in the substrate opening and movable portion opening, and the single-crystal silicon layer around the movable portion while the movable portion protective film is formed.
    Type: Application
    Filed: May 8, 2003
    Publication date: April 15, 2004
    Inventors: Yasuyuki Tanabe, Katsuyuki Machida, Hiromu Ishii, Shouji Yagi
  • Micromachine and manufacturing method therefor
    Publication number: 20030227035
    Abstract: In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.
    Type: Application
    Filed: May 28, 2003
    Publication date: December 11, 2003
    Inventors: Hiromu Ishii, Yasuyuki Tanabe, Katsuyuki Machida, Masami Urano, Shouji Yagi, Tomomi Sakata
  • Surface shape recognition sensor and method of manufacturing the same
    Publication number: 20030173982
    Abstract: A surface shape recognition sensor of this invention has a surface protective film having a hydrophobic property on an insulating protective film which is made of an insulator and formed to cover a sensor electrode, and includes at least a ground electrode which is formed on the substrate such that the ground electrode is partly exposed on the surfaces of the insulating protective film and surface protective film so as to be insulated/isolated from the sensor electrode and come into contact with the surface of a detection target. This sensor prevents fingerprint residues from easily remaining and improves tamper resistance.
    Type: Application
    Filed: February 5, 2003
    Publication date: September 18, 2003
    Inventors: Hiromu Ishii, Shouji Yagi, Katsuyuki Machida, Hakaru Kyuragi
  • Pattern forming method
    Patent number: 6468895
    Abstract: In a pattern forming method, a trench is formed on a flat base. A pattern material is arranged only in and around the trench so as to project upward from the surface of the base and to be larger than the opening of the trench. The pattern material projecting from the surface of the base is removed by chemical mechanical polishing (CMP) so as to be flush with the upper surface of the base.
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: October 22, 2002
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Hiromu Ishii, Shouji Yagi, Katsuyuki Machida, Kunio Saito, Tadao Nagatsuma, Hakaru Kyuragi
  • Pattern forming method
    Publication number: 20010027019
    Abstract: In a pattern forming method, a trench is formed on a flat base. A pattern material is arranged only in and around the trench so as to project upward from the surface of the base and to be larger than the opening of the trench. The pattern material projecting from the surface of the base is removed by chemical mechanical polishing (CMP) so as to be flush with the upper surface of the base.
    Type: Application
    Filed: April 3, 2001
    Publication date: October 4, 2001
    Inventors: Hiromu Ishii, Shouji Yagi, Katsuyuki Machida, Kunio Saito, Tadao Nagatsuma, Hakaru Kyuragi