Abstract: A wafer support structure disposed in a loading chamber of a semiconductor process device to support a wafer and drive the wafer to ascend or descend includes: a lifting component, a supporting component, a compressing component, and an adjusting component. The lifting component includes a lifting shaft. A mounting section is provided on the top surface of the lifting shaft. A first end of the supporting component is sleeved in a mounting hole of the mounting section. An inner peripheral wall of the mounting hole and an outer peripheral wall of the mounting section are separated by an adjustment space. A second end of the supporting component is arranged to extend along a radial direction of the lifting shaft. The compressing component is sleeved on an outer periphery of the mounting section and located in the adjustment space. The adjusting component is connected with the support component.

Abstract: A method for relieving vaulted expansion of a cement-stabilized base layer through precut seams. The method firstly establishes an RBFN model according to a large number of observation results of a vaulted expansion amount of the cement-stabilized base layer under different conditions (such as temperature and a stress release structure) in Xinjiang and similar regions; and on such a basis, the vaulted expansion amount of the cement-stabilized base layer to be designed is predicted. When the vaulted expansion amount is greater than a control requirement, the RBFN model is configured to design a reasonable width and a reasonable interval of the precut wide expansion seams to ensure that the vaulted expansion amount of the cement-stabilized base layer is less than a control value. Based on the design of the RBFN model, the present invention provides a corresponding construction method for the precut wide expansion seams.

Abstract: The present invention discloses a method for relieving vaulted expansion of a cement-stabilized base layer through precut seams. The method firstly establishes an RBFN model according to a large number of observation results of a vaulted expansion amount of the cement-stabilized base layer under different conditions (such as temperature and a stress release structure) in Xinjiang and similar regions; and on such a basis, the vaulted expansion amount of the cement-stabilized base layer to be designed is predicted. When the vaulted expansion amount is greater than a control requirement, the RBFN model is configured to design a reasonable width and a reasonable interval of the precut wide expansion seams to ensure that the vaulted expansion amount of the cement-stabilized base layer is less than a control value. Based on the design of the RBFN model, the present invention provides a corresponding construction method for the precut wide expansion seams.