Patents by Inventor Shouma KOUNO

Shouma KOUNO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10844251
    Abstract: Provided is a method of producing a pressure-sensitive adhesive containing a cured product of a curable composition containing a crosslinkable silicon group-containing organic polymer and an adhesion-imparting resin as a pressure-sensitive adhesive layer; curing of the curable composition does not proceed when heated during production, i.e., the curable composition has excellent stability when heated, and the crosslinking reaction of the curable composition proceeds by some sort of trigger. The pressure-sensitive adhesive contains, as a pressure-sensitive adhesive layer, a cured product of a curable composition containing (A) a crosslinkable silicon group-containing organic polymer, (B) an adhesion-imparting resin, (C) a Si—F bond-containing silicon compound, and (D) a photobase generator.
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: November 24, 2020
    Assignee: CEMEDINE CO., LTD.
    Inventors: Shouma Kouno, Tomohiro Midorikawa, Naomi Okamura, Hiroshi Yamaga
  • Publication number: 20180298239
    Abstract: Provided is a method of producing a pressure-sensitive adhesive containing a cured product of a curable composition containing a crosslinkable silicon group-containing organic polymer and an adhesion-imparting resin as a pressure-sensitive adhesive layer; curing of the curable composition does not proceed when heated during production, i.e., the curable composition has excellent stability when heated, and the crosslinking reaction of the curable composition proceeds by some sort of trigger. The pressure-sensitive adhesive contains, as a pressure-sensitive adhesive layer, a cured product of a curable composition containing (A) a crosslinkable silicon group-containing organic polymer, (B) an adhesion-imparting resin, (C) a Si—F bond-containing silicon compound, and (D) a photobase generator.
    Type: Application
    Filed: April 22, 2016
    Publication date: October 18, 2018
    Applicant: CEMEDINE CO., LTD.
    Inventors: Shouma KOUNO, Tomohiro MIDORIKAWA, Naomi OKAMURA, Hiroshi YAMAGA
  • Patent number: 9718999
    Abstract: The present invention provides a curable composition containing an organic polymer having a crosslinkable silicon group, the composition having sufficient usable life and having adhesive properties with respect to an adherend (substrate) that are equivalent to those of the case where aminosilane is included. The composition comprises: (A) a crosslinkable silicon group-containing organic polymer; and (B) a crosslinkable silicon group-containing compound that forms, by means of light, at least one type of amino group selected from the group consisting of primary amino groups and secondary amino groups. The crosslinkable silicon group-containing organic polymer (A) is preferably at least one type selected from the group consisting of crosslinkable silicon group-containing polyoxyalkylene polymers and crosslinkable silicon group-containing (meth)acrylic-based polymers.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: August 1, 2017
    Assignee: CEMEDINE CO., LTD
    Inventors: Shouma Kouno, Hiroshi Yamaga, Naomi Okamura, Atsushi Saito
  • Publication number: 20160312089
    Abstract: The present invention provides a curable composition containing an organic polymer having a crosslinkable silicon group, the composition having sufficient usable life and having adhesive properties with respect to an adherend (substrate) that are equivalent to those of the case where aminosilane is included. The composition comprises: (A) a crosslinkable silicon group-containing organic polymer; and (B) a crosslinkable silicon group-containing compound that forms, by means of light, at least one type of amino group selected from the group consisting of primary amino groups and secondary amino groups. The crosslinkable silicon group-containing organic polymer (A) is preferably at least one type selected from the group consisting of crosslinkable silicon group-containing polyoxyalkylene polymers and crosslinkable silicon group-containing (meth)acrylic-based polymers.
    Type: Application
    Filed: December 12, 2014
    Publication date: October 27, 2016
    Applicant: CEMEDINE CO., LTD.
    Inventors: Shouma KOUNO, Hiroshi YAMAGA, Naomi OKAMURA, Atsushi SAITO
  • Publication number: 20160152783
    Abstract: A rapid-curing photocurable composition exerting excellent adhesion performance even with a low cumulative light quantity and being curable in a short time, thus ensuring excellent workability, is provided. A photocurable composition is made to includes: (A) a crosslinkable silicon group-containing organic polymer; (B) a photobase generator; and (C1) a silicon compound having an Si—F bond and/or (C2) one or more fluorine-based compounds selected from the group consisting of boron trifluoride, a boron trifluoride complex, a fluorinating agent, and an alkali metal salt of a polyfluoro compound. The (B) photobase generator is preferably a photolatent tertiary amine.
    Type: Application
    Filed: July 11, 2014
    Publication date: June 2, 2016
    Inventors: Hiroshi YAMAGA, Naomi OKAMURA, Yutaka WATANABE, Ryosuke ASAI, Shouma KOUNO, Atsushi SAITO