Abstract: There is disclosed a magnetic recording medium comprising a support; a conductive layer, containing a conductive carbon, formed on either surface or both the surfaces of the support; and a magnetic layer formed on the conductive layer and containing at least a magnetic powder, a lubricant, a binder resin and 0.3 to 3 parts by weight of a conductive carbon based on 100 parts by weight of the magnetic powder.The magnetic recording medium according to this invention can maintain magnetic properties and has the excellent durability and runnabilities. In particular, the magnetic recording media of this invention can be usefully utilized for the magnetic recording as the media for floppy disks, computer tapes, highly accurate magnetic recording tapes and for high definition VTR the like which will be used very often repeatedly and will be exposed to severe circumstances.

Abstract: Disclosed is a magnetic recording medium which comprises; a substrate; a first magnetic layer applied on the surface of the substrate and having an easy axis of magnetization in the in-plane direction of the substrate; and a second magnetic layer applied on the surface of the first magnetic layer, formed of ferrite series powder represented by the formula;AO.n(Fe.sub.1-m M.sub.m).sub.2 O.sub.3(wherein A is at least one metallic element selected from the group consisting of Ba, Sr, Pb and Ca; M is at least one substituent component selected from the group consisting of Co, Ti, Ni, Mn, Cu, Zn, In, Ge and Nb; m is 0.08 to 0.2; and n is 5.4 to 6.0), and having an easy axis of magnetization in a direction perpendicular to the plane of the substrate; said first magnetic layer having a surface resistivity of 1.times.10.sup.2 to 1.times.10.sup.8 .OMEGA.. In another embodiment, a conductive layer having a surface resistivity of 1.times.10.sup.7 .OMEGA.

Abstract: A method of preparing a fine and highly precise resist pattern comprising a step of forming a positive resist layer consisting of poly-(methacrylic anhydride) on a substrate, a step of irradiating the resist layer thus formed with a predetermined pattern of ionizing radiation and a step of developing the irradiated resist pattern with a developer comprising a solvent mixture composed of a polar organic solvent (A) capable of dissolving poly-(methyacrylic anhydride) and a non-solvent (B) incapable of dissolving poly-(methacrylic anhydride).