Patents by Inventor Shozo Satoyama

Shozo Satoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Magnetron sputtering apparatus
    Patent number: 4441974
    Abstract: There is disclosed a magnetron sputtering apparatus including a sputtering chamber, a substrate and target disposed within the sputtering chamber to form a desired space therebetween, device for applying a voltage between the substrate and target, and device for producing a magnetic field; and the apparatus comprises the magnetic field-producing device adapted to excite a magnetic field so that the direction of the magnetic field may be inverted on the magnetic symmetry axis within the space.The magnetron sputtering apparatus of the present invention can form metal films having no crack without heating of the substrate and also form a magnetic recording film layer having an increased coercive force perpendicular to the surface of the film.
    Type: Grant
    Filed: April 28, 1983
    Date of Patent: April 10, 1984
    Assignees: Tokyo Shibaura Denki Kabushiki Kaisha, Tokuda Seisakusho, Ltd.
    Inventors: Reiji Nishikawa, Shozo Satoyama, Yoshinori Ito, Hidetaka Jyo