Abstract: An ESD protection device structure compatible with CMOS process is disclosed. In the ESD protection device structure, a power source I/O unit or a signal I/O unit of an I/O circuit is electrically connected to an electrostatic discharge clamp circuit including multiple low-voltage PMOS structure are formed in the P-type substrate and connected in series. Source and gate on low voltage N-type well of first low-voltage PMOS structure are electrically connected to a high-voltage power terminal pad through a first power line, or electrically connected to a signal transmission terminal pad through a signal transmission line, and drain of final low-voltage PMOS structure is electrically connected to a high voltage ground terminal pad through second power line. The ESD protection device structure using the serially-connected low-voltage PMOS structures only, can use the circuit layout area more efficiently and provide high ESD tolerance.

Abstract: An ESD protection circuit assembly for use in a CMOS manufacturing process is disclosed to include an I/O circuit including a power I/O unit and a signal I/O unit, and an electrostatic discharge clamp circuit connected to the power I/O unit and including a P-type substrate, a series of low voltage P-type structures arranged on the P-type substrate, a plurality of low voltage N-type wells formed on the P-type substrate corresponding to the low voltage P-type structures and a first P-type heavily doped area and a second P-type heavily doped area formed in each low voltage N-type well. By using a series of low voltage P-type structures to provide high ESD tolerance, the ESD protection circuit assembly can be more effectively utilized in the same circuit layout area.

Abstract: An ESD protection device structure compatible with CMOS process is disclosed. In the ESD protection device structure, a power source I/O unit or a signal I/O unit of an I/O circuit is electrically connected to an electrostatic discharge clamp circuit including multiple low-voltage PMOS structure are formed in the P-type substrate and connected in series. Source and gate on low voltage N-type well of first low-voltage PMOS structure are electrically connected to a high-voltage power terminal pad through a first power line, or electrically connected to a signal transmission terminal pad through a signal transmission line, and drain of final low-voltage PMOS structure is electrically connected to a high voltage ground terminal pad through second power line. The ESD protection device structure using the serially-connected low-voltage PMOS structures only, can use the circuit layout area more efficiently and provide high ESD tolerance.

Abstract: An ESD protection circuit assembly for use in a CMOS manufacturing process is disclosed to include an I/O circuit including a power I/O unit and a signal I/O unit, and an electrostatic discharge clamp circuit connected to the power I/O unit and including a P-type substrate, a series of low voltage P-type structures arranged on the P-type substrate, a plurality of low voltage N-type wells formed on the P-type substrate corresponding to the low voltage P-type structures and a first P-type heavily doped area and a second P-type heavily doped area formed in each low voltage N-type well. By using a series of low voltage P-type structures to provide high ESD tolerance, the ESD protection circuit assembly can be more effectively utilized in the same circuit layout area.