Abstract: Systems, apparatuses, and methods for reducing the load on the bitlines of a ROM bitcell array are described. The connections between nets of a ROM bitcell array may be assigned based on their programmed values using a traditional approach. Then, a plurality of optimizations may be performed on the assignment of nets to reduce the load on the bitlines of the array. A first optimization may swap the connections between ground and bitline for the nets of a given column responsive to detecting that the number of connections to the corresponding bitline is greater than the number of connections to ground for the given column. A second optimization may remove the connection of a net to a bitline if three consecutive nets of a given column are connected to the bitline.

Abstract: Systems, apparatuses, and methods for reducing the area of a semiconductor structure. A spacing violation may be detected for a gap width used to separate first and second regions of a layer of semiconductor material. In response to detecting the violation, the first and second regions are merged into a combined region, and then a cut mask layer is formed above the combined region. Next, an etch process is performed through the cut mask layer to remove an exposed third region within the combined region, wherein the exposed third region is interposed between first and second region portions of the combined region.

Abstract: Systems, apparatuses, and methods for reducing the load on the bitlines of a ROM bitcell array are described. The connections between nets of a ROM bitcell array may be assigned based on their programmed values using a traditional approach. Then, a plurality of optimizations may be performed on the assignment of nets to reduce the load on the bitlines of the array. A first optimization may swap the connections between ground and bitline for the nets of a given column responsive to detecting that the number of connections to the corresponding bitline is greater than the number of connections to ground for the given column. A second optimization may remove the connection of a net to a bitline if three consecutive nets of a given column are connected to the bitline.

Abstract: Systems, apparatuses, and methods for reducing the area of a semiconductor structure. A spacing violation may be detected for a gap width used to separate first and second regions of a layer of semiconductor material. In response to detecting the violation, the first and second regions are merged into a combined region, and then a cut mask layer is formed above the combined region. Next, an etch process is performed through the cut mask layer to remove an exposed third region within the combined region, wherein the exposed third region is interposed between first and second region portions of the combined region.