Patents by Inventor Shreyas Subhash Limaye

Shreyas Subhash Limaye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Implementing sequential segmented interleaving algorithm for enhanced process control
    Patent number: 8406911
    Abstract: A method and apparatus are provided for implementing Advanced Process Control (APC) for enhanced electrical, magnetic, or physical properties process output control using a sequential segmented interleaving algorithm. The sequential segmented interleaving algorithm includes two tuning equations running in parallel. A deposition time is calculated after a production run based upon the relationship between the electrical, magnetic, or physical properties process output and deposition time process input. A deposition rate offset value is calculated after a calibration run based upon the relationship between a calibration deposition thickness process output and an updated deposition time process input calculated after a last production run.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: March 26, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Shreyas Subhash Limaye, Andrew Crehan Walker, Yeheyis Workeneh
  • IMPLEMENTING SEQUENTIAL SEGMENTED INTERLEAVING ALGORITHM FOR ENHANCED PROCESS CONTROL
    Publication number: 20120016499
    Abstract: A method and apparatus are provided for implementing Advanced Process Control (APC) for enhanced electrical, magnetic, or physical properties process output control using a sequential segmented interleaving algorithm. The sequential segmented interleaving algorithm includes two tuning equations running in parallel. A deposition time is calculated after a production run based upon the relationship between the electrical, magnetic, or physical properties process output and deposition time process input. A deposition rate offset value is calculated after a calibration run based upon the relationship between a calibration deposition thickness process output and an updated deposition time process input calculated after a last production run.
    Type: Application
    Filed: July 16, 2010
    Publication date: January 19, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Shreyas Subhash Limaye, Andrew Crehan Walker, Yeheyis Workeneh