Shu-Chen Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage. Each of the features of the first and second array includes an opening disposed in an area of attenuating material.
Abstract: An adjustable hanging-type earphone, comprising a main unit fixed with a speaker seat, a slide unit serving to mount on the user's ear, and a spring wire for better fastening purpose of the earphone. Inside the main unit is a fixing shaft and a positioning shaft, which are inserted in the fixing hole and positioning slot on the top of the slide unit. The spring wire is attached to the top of the main unit. Thereby using the fixing shaft and fixing hole on the main unit as a pivot, and the positioning shaft and positioning slot as a freely adjustable fastening device, the position of the slide unit can be adjusted in relation to the main unit, to form an appropriate circle of tightness around the user's ear. The freely bendable spring wire is used to wind around the user's head or neck to aid the positioning purpose of the earphone on different sizes of the user's ear, to effectively upgrade its applicability and enhance wearing comfort.