Patents by Inventor Shu-Hao KUO

Shu-Hao KUO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11121070
    Abstract: A device includes a package. The package includes a plurality of dies, an encapsulant encapsulating the plurality of dies, and a redistribution structure over the plurality of dies and the encapsulant. The device further includes first sockets bonded to a top surface of the redistribution structure and a rigid/flexible substrate bonded to the top surface of the redistribution structure. The rigid/flexible substrate includes a first rigid portion, a second rigid portion, and a flexible portion interposed between the first rigid portion and the second rigid portion. The device further includes second sockets bonded to the first rigid portion of the rigid/flexible substrate and connector modules bonded to the second rigid portion of the rigid/flexible substrate.
    Type: Grant
    Filed: November 1, 2019
    Date of Patent: September 14, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shu-Rong Chun, Tin-Hao Kuo, Chi-Hui Lai, Kuo Lung Pan, Hao-Yi Tsai, Chung-Shi Liu, Chen-Hua Yu
  • Patent number: 11107771
    Abstract: A method includes encapsulating a plurality of package components in an encapsulant, and forming a first plurality of redistribution layers over and electrically coupling to the plurality of package components. The first plurality of redistribution layers have a plurality of power/ground pad stacks, with each of the plurality of power/ground pad stacks having a pad in each of the first plurality of redistribution layers. The plurality of power/ground pad stacks include a plurality of power pad stacks, and a plurality of ground pad stacks. At least one second redistribution layer is formed over the first plurality of redistribution layers. The second redistribution layer(s) include power lines and electrical grounding lines electrically connecting to the plurality of power/ground pad stacks.
    Type: Grant
    Filed: December 26, 2019
    Date of Patent: August 31, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shu-Rong Chun, Tin-Hao Kuo, Chi-Hui Lai, Kuo Lung Pan, Yu-Chia Lai, Hao-Yi Tsai, Chung-Shi Liu, Chen-Hua Yu
  • Publication number: 20200287047
    Abstract: A device includes a semiconductor substrate, a first fin arranged over the semiconductor substrate, and an isolation structure. The first fin includes an upper portion, a bottom portion, and an insulator layer between the upper portion and the bottom portion. A top surface of the insulator layer is wider than a bottom surface of the upper portion of the first fin. The isolation structure surrounds the bottom portion of the first fin.
    Type: Application
    Filed: May 21, 2020
    Publication date: September 10, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shu-Hao KUO, Jung-Hao CHANG, Chao-Hsien HUANG, Li-Te LIN, Kuo-Cheng CHING
  • Patent number: 10680109
    Abstract: A device includes a semiconductor substrate, a first fin arranged over the semiconductor substrate, and an isolation structure. The first fin includes an upper portion, a bottom portion, and an insulator layer between the upper portion and the bottom portion. A top surface of the insulator layer is wider than a bottom surface of the upper portion of the first fin. The isolation structure surrounds the bottom portion of the first fin.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: June 9, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shu-Hao Kuo, Jung-Hao Chang, Chao-Hsien Huang, Li-Te Lin, Kuo-Cheng Ching
  • Publication number: 20190097056
    Abstract: A device includes a semiconductor substrate, a first fin arranged over the semiconductor substrate, and an isolation structure. The first fin includes an upper portion, a bottom portion, and an insulator layer between the upper portion and the bottom portion. A top surface of the insulator layer is wider than a bottom surface of the upper portion of the first fin. The isolation structure surrounds the bottom portion of the first fin.
    Type: Application
    Filed: September 25, 2018
    Publication date: March 28, 2019
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shu-Hao KUO, Jung-Hao CHANG, Chao-Hsien HUANG, Li-Te LIN, Kuo-Cheng CHING