Patents by Inventor Shu-Huei Cheng

Shu-Huei Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6383694
    Abstract: A method of manufacturing a color filter for a reflective liquid crystal display is disclosed. The method comprises the following steps: 1) coating a layer of positive photoresist on a reflective layer or reflective substrate, and exposing the photoresist layer to a light via a mask having a fine pixel pattern so as to form at least three exposed regions of different exposed energy in the photoresist layer, 2) Removing one of the existing exposed regions having a largest exposed dose by the use of an alkaline developer solution so as to expose the surface of the electrically conductive reflective substrate corresponding to the removed region; and electrodepositing a color paint on the exposed surface of the reflective substrate to form a color filter layer of one selected color, 3) repeating step 2) to remove the other exposed regions in the photoresist layer and proceeding with an electrodeposition process with another color paint until a color filter layer of all desired colors is completed.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: May 7, 2002
    Assignee: Sumitomo Chemical Company Limited
    Inventors: Yaw-Ting Wu, Chun-Hsiang Wen, Shu-Huei Cheng, Ming-Hsiang Chan, Jun-Ichi Yasukawa, Hajime Kuwahara
  • Patent number: 6208401
    Abstract: The invention discloses a liquid crystal panel which is characterized in that each color filter is compartmentalized by the black matrix and the spacers are positioned on the region confined by the black matrix and the spacer bottom connects the first conductive film. The invention also discloses a process for producing liquid crystal panel, which is characterized in that the color filters and spacers are produced by coating a four-level photoresist and by a first exposure step which is masked by a four-level photoresist; the red region, green region and blue region are produced by development and electro-deposition; and the spacers are produced by a second exposure step which is masked by a spacer reticle, a development step which emerges the first conductive film within a region confined by the black matrix, and a step of electrodeposition coating compositions on the emerged region of the first conductive film.
    Type: Grant
    Filed: July 19, 1999
    Date of Patent: March 27, 2001
    Assignees: Industrial Technology Research Institute, Sumitomo Chemical Company, Limited
    Inventors: Chun-Hsiang Wen, Shu-Huei Cheng, Hua-Chi Cheng, Yaw-Ting Wu, Ming-Hsiang Chan, Jun-Ichi Yasukawa, Hajime Kuwahara
  • Patent number: 6110625
    Abstract: The invention relates to a method for manufacturing color filters utilizing a color electrodeposition coating which contains an anionic electrodeposition resin having a low acid value.
    Type: Grant
    Filed: February 10, 1999
    Date of Patent: August 29, 2000
    Assignees: Industrial Technology Research Institute, Sumitomo Chemical Company, Ltd.
    Inventors: Chun-Hsiang Wen, Shu-Huei Cheng, Hua-Chi Cheng, Yaw-Ting Wu, Ming-Shiang Jan, Pao-Ju Hsieh, Jun-Ichi Yasukawa, Hajime Kuwahara