Patents by Inventor Shu-Luan Chan

Shu-Luan Chan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7795722
    Abstract: A substrate structure is disclosed. The substrate structure includes a core substrate, an interconnection portion and a solder mask. The core substrate includes a top surface and a bottom surface opposite the top surface. A circuit pattern is disposed on the top surface. The interconnection portion is disposed on the top surface; herein the interconnection portion includes a surface dielectric layer and a surface circuit layer disposed on the surface dielectric layer. The surface circuit layer is electrically connected to the circuit pattern. The solder mask is disposed on the interconnection portion; herein the solder mask includes a hole to identify the substrate structure. Besides, a method for manufacturing the substrate structure is disclosed.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: September 14, 2010
    Assignee: Advanced Semiconductor Engineering Inc.
    Inventors: Shu-Luan Chan, Chi-Chih Huang, Shuo-Hsun Chang
  • Patent number: 7560650
    Abstract: A substrate structure is disclosed. The substrate structure includes a core substrate, an interconnection portion and a solder mask; herein the core substrate includes a top surface and a bottom surface opposite the top surface. A circuit pattern is disposed on the top surface. The interconnection portion is disposed on the top surface; herein the interconnection portion includes a surface dielectric layer and a surface circuit layer disposed thereon. The surface circuit layer is electrically connected to the circuit pattern, and the surface dielectric layer includes at least a hole that is not covered with the surface circuit layer. The solder mask is disposed on the interconnection portion; herein the solder mask includes an indentation disposed above the hole. In addition, a method for manufacturing the substrate structure is disclosed.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: July 14, 2009
    Assignee: Advanced Semiconductor Enginieering Inc.
    Inventors: Shu-Luan Chan, Chi-Chih Huang, Shuo-Hsun Chang
  • Publication number: 20070295531
    Abstract: A substrate structure is disclosed. The substrate structure includes a core substrate, an interconnection portion and a solder mask; herein the core substrate includes a top surface and a bottom surface opposite the top surface. A circuit pattern is disposed on the top surface. The interconnection portion is disposed on the top surface; herein the interconnection portion includes a surface dielectric layer and a surface circuit layer disposed thereon. The surface circuit layer is electrically connected to the circuit pattern, and the surface dielectric layer includes at least a hole that is not covered with the surface circuit layer. The solder mask is disposed on the interconnection portion; herein the solder mask includes an indentation disposed above the hole. Besides, a method for manufacturing the substrate structure is disclosed.
    Type: Application
    Filed: December 21, 2006
    Publication date: December 27, 2007
    Applicant: ADVANCED SEMICONDUCTOR ENGINEERING INC.
    Inventors: Shu-Luan Chan, Chi-Chih Huang, Shuo-Hsun Chang
  • Publication number: 20070296062
    Abstract: A substrate structure is disclosed. The substrate structure includes a core substrate, an interconnection portion and a solder mask. The core substrate includes a top surface and a bottom surface opposite the top surface. A circuit pattern is disposed on the top surface. The interconnection portion is disposed on the top surface; herein the interconnection portion includes a surface dielectric layer and a surface circuit layer disposed on the surface dielectric layer. The surface circuit layer is electrically connected to the circuit pattern. The solder mask is disposed on the interconnection portion; herein the solder mask includes a hole to identify the substrate structure. Besides, a method for manufacturing the substrate structure is disclosed.
    Type: Application
    Filed: December 28, 2006
    Publication date: December 27, 2007
    Applicant: ADVANCED SEMICONDUCTOR ENGINEERING INC.
    Inventors: Shu-Luan Chan, Chi-Chih Huang, Shuo-Hsun Chang