Abstract: An optical proximity correction (OPC) device and method is provided. The OPC device includes an analysis unit, a reverse pattern addition unit, a first OPC unit, a second OPC unit and an output unit. The analysis unit is configured to analyze a defect pattern from a photomask layout. The reverse pattern addition unit is configured to provide a reverse pattern within the defect pattern. The first OPC unit is configured to perform a first OPC procedure on whole of the photomask layout. The second OPC unit is configured to perform a second OPC procedure on the defect pattern of the photomask layout to enhance an exposure tolerance window. The output unit is configured to output the photomask layout which is corrected.

Abstract: A handcart includes a pair of wheels mounted on an axle, a pair of lower tubes mounted on the axle, a pair of upper tubes telescopically received in the pair of lower tubes, and a holding assembly mounted on the pair of lower tubes to hold a baggage container. The holding assembly includes a lower holding member mounted to a lower portion of the pair of lower tubes, a sleeve mounted to a mediate portion of the pair of lower tubes and slidable along the lower tubes, an upper holding member extending from the sleeve for holding the baggage container between the lower and upper holding members, a handle extending upward from the upper holding member and having an elongate hole extending vertically, a stop member mounted to an upper portion of the pair of lower tubes and having a pin extending outward into the elongate hole, and a spring mounted around each of the lower tubes between the stop member and the sleeve.