Patents by Inventor Shu-Yen LIU

Shu-Yen LIU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240093267
    Abstract: A high-throughput automated preprocessing method and a system are applied to a nucleic acid preprocessing apparatus including a control system, a sample transfer area, a nucleic acid extraction area, and a reagent setup area. The control system includes a user interface and guides a user to set up on the user interface. In the sample transfer area, the method includes steps of: a user selecting a sampling tube type, a test protocol and an extraction protocol on the user interface, and the control system performing a sample transfer task. In the nucleic acid extraction area, the method includes steps of: the control system performing a nucleic acid extraction task based on the selected extraction protocol. In the reagent setup area, the method includes steps of: the control system performing a reagent deployment task based on the selected test protocol, and the control system performing a nucleic acid transfer task.
    Type: Application
    Filed: September 19, 2023
    Publication date: March 21, 2024
    Inventors: Wei-Te Hsieh, Chia-Yen Lin, Kuang-An Wang, Keng-Ting Liu, Shu-Hui Huang
  • Patent number: 11934106
    Abstract: An optical proximity correction (OPC) device and method is provided. The OPC device includes an analysis unit, a reverse pattern addition unit, a first OPC unit, a second OPC unit and an output unit. The analysis unit is configured to analyze a defect pattern from a photomask layout. The reverse pattern addition unit is configured to provide a reverse pattern within the defect pattern. The first OPC unit is configured to perform a first OPC procedure on whole of the photomask layout. The second OPC unit is configured to perform a second OPC procedure on the defect pattern of the photomask layout to enhance an exposure tolerance window. The output unit is configured to output the photomask layout which is corrected.
    Type: Grant
    Filed: August 4, 2022
    Date of Patent: March 19, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Shu-Yen Liu, Hui-Fang Kuo, Chian-Ting Huang, Wei-Cyuan Lo, Yung-Feng Cheng, Chung-Yi Chiu
  • Publication number: 20240067746
    Abstract: Disclosed herein are humanized antibodies, antigen-binding fragments thereof, and antibody conjugates, that are capable of specifically binding to certain biantennary Lewis antigens, which antigens are expressed in a variety of cancers. The presently disclosed antibodies are useful to target antigen-expressing cells for treatment or detection of disease, including various cancers. Also provided are polynucleotides, vectors, and host cells for producing the disclosed antibodies and antigen-binding fragments thereof. Pharmaceutical compositions, methods of treatment and detection, and uses of the antibodies, antigen-binding fragments, antibody conjugates, and compositions are also provided.
    Type: Application
    Filed: February 28, 2023
    Publication date: February 29, 2024
    Inventors: Tong-Hsuan CHANG, Mei-Chun YANG, Liahng-Yirn LIU, Jerry TING, Shu-Yen CHANG, Yen-Ying CHEN, Yu-Yu LIN, Shu-Lun TANG
  • Publication number: 20230384689
    Abstract: An optical proximity correction (OPC) device and method is provided. The OPC device includes an analysis unit, a reverse pattern addition unit, a first OPC unit, a second OPC unit and an output unit. The analysis unit is configured to analyze a defect pattern from a photomask layout. The reverse pattern addition unit is configured to provide a reverse pattern within the defect pattern. The first OPC unit is configured to perform a first OPC procedure on whole of the photomask layout. The second OPC unit is configured to perform a second OPC procedure on the defect pattern of the photomask layout to enhance an exposure tolerance window. The output unit is configured to output the photomask layout which is corrected.
    Type: Application
    Filed: August 4, 2022
    Publication date: November 30, 2023
    Inventors: Shu-Yen LIU, Hui-Fang KUO, Chian-Ting HUANG, Wei-Cyuan LO, Yung-Feng CHENG, Chung-Yi CHIU
  • Patent number: 10747099
    Abstract: The present invention provides a photomask, comprising: a substrate, a first region, a second region and a third region are defined thereon, wherein the third region is disposed between the first region and the second region, a patterned layer disposed on the substrate, wherein the patterned layer comprises a first patterned layer disposed in the first region, a second patterned layer disposed in the second region, and a third patterned layer disposed in the third region, and wherein a thickness of the first patterned layer is equal to a thickness of the second patterned layer, the thickness of the first patterned layer is different from a thickness of the third patterned layer, and at least one recess disposed in the third region.
    Type: Grant
    Filed: May 22, 2018
    Date of Patent: August 18, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yen-Pu Chen, Shu-Yen Liu, Tang-Chun Weng, Tuan-Yen Yu
  • Publication number: 20190361339
    Abstract: The present invention provides a photomask, comprising: a substrate, a first region, a second region and a third region are defined thereon, wherein the third region is disposed between the first region and the second region, a patterned layer disposed on the substrate, wherein the patterned layer comprises a first patterned layer disposed in the first region, a second patterned layer disposed in the second region, and a third patterned layer disposed in the third region, and wherein a thickness of the first patterned layer is equal to a thickness of the second patterned layer, the thickness of the first patterned layer is different from a thickness of the third patterned layer, and at least one recess disposed in the third region.
    Type: Application
    Filed: May 22, 2018
    Publication date: November 28, 2019
    Inventors: Yen-Pu Chen, Shu-Yen Liu, Tang-Chun Weng, Tuan-Yen Yu
  • Publication number: 20160284897
    Abstract: A back-contact solar cell set includes a semiconductor substrate and a contact set. A back-surface of the semiconductor substrate includes a first cell region, a second cell region and a first outer-isolation region which separates said two cell regions. The first outer-isolation region has a first basin region and a first highland region which is higher than the first basin region. The contact set includes a first connecting electrode which covers the first basin region. The first cell region and the second cell region are electrically connected through the first connecting electrode.
    Type: Application
    Filed: March 18, 2016
    Publication date: September 29, 2016
    Inventors: Shu-Yen LIU, Chih-Ming WEI, Chia-Chih CHUANG