Patents by Inventor Shuai ZOU

Shuai ZOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240140869
    Abstract: The present application relates to the technical field of road infrastructure, and provides a cement-based pervious pavement structure, a manufacturing method of the cement-based pervious pavement structure, and an application of the cement-based pervious pavement structure. The cement-based pervious pavement structure includes: a lower structural layer as the base; an upper surfacing layer overlaid on said lower structural layer and including: 1.0-2.0 parts by weight of upper layer (fine) aggregate; 0.40-0.70 part by weight of cement; 0.02-0.03 part by weight of titanium dioxide; 0.03-0.04 part by weight of water reducing agent; 0.001-0.002 part by weight of defoamer. The cement-based pervious pavement structure provided by the present application can provide air purification function taking into account the practical cost.
    Type: Application
    Filed: October 11, 2023
    Publication date: May 2, 2024
    Applicant: Hip Hing Construction Technology Ltd
    Inventors: Tat Chi CHU, Kwok Leung SO, Pui Lam NG, Chung Kong CHAU, Yong FAN, Shuai ZOU, Man Lung SHAM
  • Patent number: 11940717
    Abstract: A photography stand includes a central pipe and a supporting frame. The top of the central pipe is configured to mount photographic equipment. The supporting frame is connected to the central pipe, and provided adjacent to the bottom of the central pipe. The supporting frame moves relative to the central pipe along the axial direction of the central pipe. The supporting frame is unfolded when moving along the axial direction of the central pipe toward the bottom of the central pipe by a preset distance and then moving continuously toward the bottom of the central pipe. The supporting frame is folded when moving along the axial direction of the central pipe toward the top of the central pipe. According to the photography stand, the supporting frame is unfolded automatically after moving along the axial direction of the central pipe toward the bottom of the central pipe by the preset distance.
    Type: Grant
    Filed: February 23, 2023
    Date of Patent: March 26, 2024
    Assignee: Shenzhen Weijl Technology Co., Ltd.
    Inventors: Qingqing Zou, Ruoyu Pan, Jianxiong Xia, Shuai Qin, Xinzhi Wang
  • Publication number: 20240077791
    Abstract: A photography stand includes a central pipe and a supporting frame. The top of the central pipe is configured to mount photographic equipment. The supporting frame is connected to the central pipe, and provided adjacent to the bottom of the central pipe. The supporting frame moves relative to the central pipe along the axial direction of the central pipe. The supporting frame is unfolded when moving along the axial direction of the central pipe toward the bottom of the central pipe by a preset distance and then moving continuously toward the bottom of the central pipe. The supporting frame is folded when moving along the axial direction of the central pipe toward the top of the central pipe. According to the photography stand, the supporting frame is unfolded automatically after moving along the axial direction of the central pipe toward the bottom of the central pipe by the preset distance.
    Type: Application
    Filed: February 23, 2023
    Publication date: March 7, 2024
    Applicant: Shenzhen Weiji Technology Co.,Ltd.
    Inventors: Qingqing ZOU, Ruoyu PAN, Jianxiong XIA, Shuai QIN, Xinzhi WANG
  • Publication number: 20230295045
    Abstract: A reclamation fill stabilizing composition for accelerated soil stabilization of high water-content waste soils/marine mud. The fill stabilizing composition includes a hydrolysis polymerization agent for chemically reacting with water in waste soil/marine mud. A gelling geopolymerization agent chemically and physically locks the water in its formed 3-D aluminosilicate microstructure. A sol-gel immobilization agent chemically and physically traps the water by reacting and bonding with the water. A nano-modification agent provides additional crystal nuclei to increase the effects of hydrolysis polymerization, gelling geopolymerization, and sol-gel immobilization. The reclamation fill stabilizing composition is mixed with high water-content waste soil such as marine mud. The marine mud is rapidly transformed into a compactable fill material within a stabilization curing period as short as 3 hours. Following stabilization, the treated marine mud is compacted (e.g.
    Type: Application
    Filed: January 25, 2023
    Publication date: September 21, 2023
    Inventors: Chung Kong CHAU, Nok Hang WONG, Shuai ZOU, Yong FAN, Man Lung SHAM
  • Publication number: 20220321757
    Abstract: A control method applied to a photographing apparatus that includes a lens, an external device, and a body communicatively connected to the lens and the external device. The control method includes the body sending a shutter opening command to the lens; the lens sending a trigger signal to the body according to the shutter opening command, the trigger signal including a first pulse and a second pulse; and the body receiving the trigger signal sent from the lens, triggering a resetting operation of an image sensor inside the body according to the first pulse and triggering activation of the external device according to the second pulse.
    Type: Application
    Filed: June 17, 2022
    Publication date: October 6, 2022
    Inventors: Bjarne Hjörlund, Qingyu Lu, Shuai Zou
  • Patent number: 11094838
    Abstract: The present disclosure relates to a method for preparing nano-textured surface on single side of a silicon wafer, including the following steps: (1) superimposing two silicon wafers to obtain a first silicon wafer superimposition structure; the side on which the silicon wafers is superimposed is recorded as an attached surface, and the side exposed outside is recorded as an exposed surface; and (2) performing nano-textured surface etching on the first silicon wafer superimposition structure; and providing each silicon wafer with nano-textured surface on the exposed surface and a nano-textured surface etched strip on the edge of the attached surface. In the present disclosure, while the nano-textured surface etching is performed, the edge of the attached surface is etched with nano-textured surface by selecting a specific etching rate, which reduces the pulling force for detaching the wafers and reduces the fragmentation rate during the detaching process.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: August 17, 2021
    Assignees: CSI CELLS CO., LTD., CSI SOLAR POWER GROUP CO., LTD.
    Inventors: Shuai Zou, Xiaoya Ye, Fang Cao, Xusheng Wang, Guoqiang Xing
  • Publication number: 20190341509
    Abstract: The present disclosure relates to a method for preparing nano-textured surface on single side of a silicon wafer, including the following steps: (1) superimposing two silicon wafers to obtain a first silicon wafer superimposition structure; the side on which the silicon wafers is superimposed is recorded as an attached surface, and the side exposed outside is recorded as an exposed surface; and (2) performing nano-textured surface etching on the first silicon wafer superimposition structure; and providing each silicon wafer with nano-textured surface on the exposed surface and a nano-textured surface etched strip on the edge of the attached surface. In the present disclosure, while the nano-textured surface etching is performed, the edge of the attached surface is etched with nano-textured surface by selecting a specific etching rate, which reduces the pulling force for detaching the wafers and reduces the fragmentation rate during the detaching process.
    Type: Application
    Filed: May 1, 2019
    Publication date: November 7, 2019
    Inventors: Shuai Zou, Xiaoya Ye, Fang Cao, Xusheng Wang, Guoqiang Xing
  • Patent number: 10411145
    Abstract: A method for producing a textured structure of a crystalline silicon solar cell is provided, including the following steps: (1) forming a porous layer structure on a surface of a silicon wafer; (2) then cleaning with a first alkaline chemical solution; (3) removing residual metal particles with a cleaning solution; (4) and then etching the surface with a first chemical etching solution to obtain the textured structure of the crystalline silicon solar cell. The method greatly prolongs the lifetime of the mixed solution of hydrofluoric acid and nitric acid and ensures the stability and uniformity of the textured structure.
    Type: Grant
    Filed: June 27, 2017
    Date of Patent: September 10, 2019
    Assignee: CSI CELLS CO., LTD.
    Inventors: Shuai Zou, Xusheng Wang, Guoqiang Xing
  • Patent number: 9966484
    Abstract: A process for preparing a passivated emitter rear contact solar cell, which includes the steps as follows: removing the damaged layer on the surface of the silicon wafer and at the same time polishing both surfaces, texturing, forming PN junction, etching, removing the glass impurity, depositing a passivation film on the back surface, depositing a passivating antireflective layer on the front surface, making local openings on the back surface, screen printing of metal paste on both the front surface and the back surface and sintering, in which the texturing step employs a catalytic metal etching approach, and the textured structure is a nanometer-level textured structure. The present invention has combined removing the damaged layer on the surface of the silicon wafer and polishing both the front and back surfaces into one single step, and thus has simplified the production process and reduced the production cost.
    Type: Grant
    Filed: December 31, 2015
    Date of Patent: May 8, 2018
    Assignee: CSI CELLS CO., LTD
    Inventors: Shuai Zou, Weixu Long, Xusheng Wang, Guoqiang Xing
  • Publication number: 20170373202
    Abstract: A method for producing a textured structure of a crystalline silicon solar cell is provided, including the following steps: (1) forming a porous layer structure on a surface of a silicon wafer; (2) then cleaning with a first alkaline chemical solution; (3) removing residual metal particles with a cleaning solution; (4) and then etching the surface with a first chemical etching solution to obtain the textured structure of the crystalline silicon solar cell. The method greatly prolongs the lifetime of the mixed solution of hydrofluoric acid and nitric acid and ensures the stability and uniformity of the textured structure.
    Type: Application
    Filed: June 27, 2017
    Publication date: December 28, 2017
    Inventors: SHUAI ZOU, XUSHENG WANG, GUOQIANG XING
  • Publication number: 20170358695
    Abstract: A textured structure of a crystalline silicon solar cell that is mainly constructed by a plurality of micro-structures similar to inverted pyramids; the lower part of the micro-structure similar to the inverted pyramid is an inverted pyramidal structure, and the upper part thereof is an inverted circular truncated conical structure; and the top of the micro-structure similar to the inverted pyramid is selected from one or more of a circle, an oval, or a closed figure enclosed by multiple curves. Experiments prove that the conversion efficiency of a cell piece may be improved by 0.25-0.4%, thereby obtaining unexpected effects.
    Type: Application
    Filed: December 13, 2015
    Publication date: December 14, 2017
    Applicant: CSI Cells Co., Ltd
    Inventors: Shuai ZOU, Xusheng WANG, Guoqiang XING
  • Publication number: 20170294545
    Abstract: A process for preparing a passivated emitter rear contact solar cell, which includes the steps as follows: removing the damaged layer on the surface of the silicon wafer and at the same time polishing both surfaces, texturing, forming PN junction, etching, removing the glass impurity, depositing a passivation film on the back surface, depositing a passivating antireflective layer on the front surface, making local openings on the back surface, screen printing of metal paste on both the front surface and the back surface and sintering, in which the texturing step employs a catalytic metal etching approach, and the textured structure is a nanometer-level textured structure. The present invention has combined removing the damaged layer on the surface of the silicon wafer and polishing both the front and back surfaces into one single step, and thus has simplified the production process and reduced the production cost.
    Type: Application
    Filed: December 31, 2015
    Publication date: October 12, 2017
    Applicant: CSI CELLS CO., LTD
    Inventors: Shuai ZOU, Weixu LONG, Xusheng WANG, Guoqiang XING