Patents by Inventor Shuaiyi WANG

Shuaiyi WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240222522
    Abstract: The present application provides a display panel, the display panel includes an electrostatic protection circuit. The electrostatic protection circuit includes at least one thin film transistor. The thin film transistor includes an active layer. The active layer includes a channel portion. Disposing at least one auxiliary electrode on the channel portion and making the auxiliary electrode contact the channel portion can use the additional auxiliary electrode to increase plasma to affect uniformity of the channel portion such that a leakage current of the thin film transistor is reduced to improve display quality of the display panel.
    Type: Application
    Filed: March 30, 2023
    Publication date: July 4, 2024
    Applicant: Guangzhou China Star Optoelectronics Semiconductor Display Technology Co., LTd.
    Inventor: Shuaiyi WANG
  • Patent number: 11069723
    Abstract: The present disclosure provides a method for manufacturing a thin film transistor, a thin film transistor, and a display apparatus. The method for manufacturing a thin film transistor includes: forming a gate layer on a substrate; forming a gate insulating layer on the gate layer; forming an active layer on the gate insulating layer; forming a source/drain layer on the active layer; and performing a plasma bombardment treatment on a surface of the active layer on which the source/drain layer is formed, and controlling the plasma bombardment treatment to be performed at a gas flow rate of 4K sccm to 70K sccm, at a pressure of 600 mTorr to 1200 mTorr, at a power of 4 KW to 12 KW for a treatment time of 10 s to 60 s.
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: July 20, 2021
    Assignee: Chengdu CEC Panda Display Technology Co., Ltd.
    Inventors: Shuaiyi Wang, Hui Tang, Peng Gao, Ke Zeng, Xiangfeng Li
  • Publication number: 20210082965
    Abstract: The present disclosure provides a method for manufacturing a thin film transistor, a thin film transistor, and a display apparatus. The method for manufacturing a thin film transistor includes: forming a gate layer on a substrate; forming a gate insulating layer on the gate layer; forming an active layer on the gate insulating layer; forming a source/drain layer on the active layer; and performing a plasma bombardment treatment on a surface of the active layer on which the source/drain layer is formed, and controlling the plasma bombardment treatment to be performed at a gas flow rate of 4K sccm to 70K sccm, at a pressure of 600 mTorr to 1200 mTorr, at a power of 4 KW to 12 KW for a treatment time of 10 s to 60 s.
    Type: Application
    Filed: March 23, 2020
    Publication date: March 18, 2021
    Applicant: CHENGDU CEC PANDA DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Shuaiyi WANG, Hui TANG, Peng GAO, Ke ZENG, Xiangfeng LI