Patents by Inventor Shuang Chang

Shuang Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240161891
    Abstract: A medium storing a program for causing a computer to execute processing including: obtaining pieces of combination data each including attribute information indicating attributes of a person and information indicating which choice is selected from choices; generating, for each choice, converted data obtained by converting the information into information indicating whether the choice is selected; identifying, for each choice, based on the converted data, an attribute, from the attributes, that has a correlation greater than a criterion with the selection of the choice and a condition; identifying a common condition among conditions of different choices based on the condition; and determining a plan for improving a selection result of the choice for a target who matches one of the different choices and who matches the common condition based on a result of an analysis between the attributes and the choice by using the converted data matching the common condition.
    Type: Application
    Filed: September 5, 2023
    Publication date: May 16, 2024
    Applicant: Fujitsu Limited
    Inventors: Shuang CHANG, Tatsuya ASAI, Koji MARUHASHI
  • Publication number: 20240121547
    Abstract: A venting device includes a first flap, which is configured to be actuated to swing upward during a rising time, and a second flap, which is disposed opposite to the first flap and configured to be actuated to swing downward during a falling time, a first actuating portion disposed on the first flap, and a second actuating portion disposed on the second flap. The venting device configured to form a vent is disposed within a wearable sound device or to be disposed within the wearable sound device. The vent is formed via applying a first voltage to the first actuating portion and applying a second voltage on the second actuating portion, such that the venting device gradually forms the vent.
    Type: Application
    Filed: December 6, 2023
    Publication date: April 11, 2024
    Applicant: xMEMS Labs, Inc.
    Inventors: Wen-Chien Chen, Kai-Chieh Chang, Chiung C. Lo, Yuan-Shuang Liu
  • Publication number: 20150174112
    Abstract: Methods of screening compounds, active compositions, pharmaceutical compositions, methods of treating disorders, methods of preventing disorders, and kits to screen a library of compounds, are disclosed.
    Type: Application
    Filed: March 9, 2015
    Publication date: June 25, 2015
    Inventors: Stephen T. Warren, Shuang Chang, Peng Jin
  • Patent number: 7677945
    Abstract: This invention relates to method(s) of fabricating electrodes of an external electrode fluorescence lamp (EEFL) for use in thin film transistor-liquid crystal display (TFT-LCD) applications. Also disclosed is a structure with electrodes for external electrode fluorescence lamps used in TFT-LCD backlight units.
    Type: Grant
    Filed: May 24, 2007
    Date of Patent: March 16, 2010
    Assignees: E.I. du Pont de Nemours and Company, Wellpower Optronics Co Ltd
    Inventors: Joel Skutsky, Brian D. Veeder, Andy Zao, Thomas Lin, Hsiu-Wei Wu, Tjong-Ren Chang, Shuang-Chang Yang, Wen-Chun Chiu, Jin-Yuh Lu
  • Publication number: 20080312279
    Abstract: Methods of screening compounds, active compositions, pharmaceutical compositions, methods of treating disorders, methods of preventing disorders, and kits to screen a library of compounds, are disclosed.
    Type: Application
    Filed: October 26, 2006
    Publication date: December 18, 2008
    Inventors: Stephen T. Warren, Shuang Chang, Peng Jin
  • Publication number: 20080030654
    Abstract: This invention relates to method(s) of fabricating electrodes of an external electrode fluorescence lamp (EEFL) for use in thin film transistor-liquid crystal display (TFT-LCD) applications. Also disclosed is a structure with electrodes for external electrode fluorescence lamps used in TFT-LCD backlight units.
    Type: Application
    Filed: May 24, 2007
    Publication date: February 7, 2008
    Applicant: E. I. DUPONT DE NEMOURS AND COMPANY
    Inventors: Joel Slutsky, Brian Veeder, Andy Kao, Thomas Lin, Hsiu-Wei Wu, Tjong-Ren Chang, Shuang-Chang Yang, Wen-Chun Chiu, Jin-Yuh Lu
  • Publication number: 20050090113
    Abstract: A method for removing photoresist after etching a metal layer is provided. A plasma etching process is added to a dry and wet strip process to remove sediment and metal residue on the sidewalls of the metal layer quickly, thereby reducing the required time of the next wet strip process and the preventing miro-masking phenomenon. Also, it can be applied in nano-processes so as to gain more margins in regards to small metal bridges.
    Type: Application
    Filed: October 20, 2004
    Publication date: April 28, 2005
    Inventor: Shuang Chang
  • Publication number: 20050090088
    Abstract: A method for forming a word line spacer with good square profile comprising providing a semiconductor substrate having a patterned oxide layer, a polysilicon layer, and an oxide layer in sequence formed thereon. The four step etch sequence comprises a Breakthrough Etch (BT), a Main Etch (ME), an Oxide Etch, and an Overall Etch (OE) in order to complete the fabrication of word line spacer. The present invention provides a method for forming a word line spacer with good square profile, which removes an undesireable fence profile in order to form a word line spacer with good square profile.
    Type: Application
    Filed: October 26, 2004
    Publication date: April 28, 2005
    Inventor: Shuang Chang