Abstract: The application provides a mask disposed above a panel; the panel includes a planarization layer, and the planarization layer includes a plurality of trenches, the planarization layer is coated with a layer of TITO; the mask is provided with transparent regions, semi-transparent regions and opaque regions; the transparent regions are respectively arranged on the periphery of the display area and the semi-transparent regions are respectively arranged on the area directly above the trenches on the periphery of the display area; the opaque regions are respectively disposed directly above on each place other than the trenches of the panel, the transparent regions guide the light to expose and remove the TITO in the trenches on the periphery of the display area, the semi-transparent regions weaken the light and exposes and removes the TITO in trenches of the display area, the opaque regions block the light to avoid the exposure of TITO.

Abstract: A touch panel is provided. The display panel includes a glass substrate, a buffer layer, a gate insulating layer and a second metal layer. The display panel further comprises a flat organic layer, a first dielectric layer, a third metal layer, a second dielectric layer and a bottom ITO (indium tin oxide) layer. In this invention, which is not restrict design and could satisfy requirement of original process windows, decrease rework rate and enhance productivity.

Abstract: An integrated circuit pin is provided. The integrated circuit pin includes a glass substrate, a buffer layer above the glass substrate, a gate insulating layer above the buffer layer, a first metal layer above the gate insulating layer, a second metal layer above the first metal layer, a first insulating layer above the second metal layer, a second insulating layer above the first insulating layer, a bottom indium tin oxide (BITO) above the second insulating layer, and a top indium tin oxide covering the BITO. The BITO further extends downwardly along the inner wall of a through-hole penetrating through the first and second insulating layers such that the BITO is connected to the second metal layer. An in-cell touch panel is also provided. According to the disclosure, the thickness of the conductive layer can be increased. The anti-external interference and the drop reliability of ITP products can be enhanced.

Abstract: A display panel includes a plurality of scan lines and connection lines. The plurality of scan lines are spaced from each other. The connection lines are connected to end portions of the plurality of scan lines. The connection lines are formed of intrinsic silicon. By having the connection lines that are formed of intrinsic silicon connected with the end portions of all the scan lines, due to intrinsic silicon being almost electrically non-conductive, this does not affect stage by stage activation of the scan lines and provides a way of power consumption by large resistivity of intrinsic silicon for preventing static electricity on end portions of the scan lines thereby overcoming the issue of static electricity being easily caused on the end portions of the scan lines and thus enhancing product quality.

Abstract: A touch panel is provided. The display panel includes a glass substrate, a buffer layer, a gate insulating layer and a second metal layer. The display panel further comprises a flat organic layer, a first dielectric layer, a third metal layer, a second dielectric layer and a bottom ITO (indium tin oxide) layer. In this invention, which is not restrict design and could satisfy requirement of original process windows, decrease rework rate and enhance productivity.

Abstract: An integrated circuit pin is provided. The integrated circuit pin includes a glass substrate, a buffer layer above the glass substrate, a gate insulating layer above the buffer layer, a first metal layer above the gate insulating layer, a second metal layer above the first metal layer, a first insulating layer above the second metal layer, a second insulating layer above the first insulating layer, a bottom indium tin oxide (BITO) above the second insulating layer, and a top indium tin oxide covering the BITO. The BITO further extends downwardly along the inner wall of a through-hole penetrating through the first and second insulating layers such that the BITO is connected to the second metal layer. An in-cell touch panel is also provided. According to the disclosure, the thickness of the conductive layer can be increased. The anti-external interference and the drop reliability of ITP products can be enhanced.

Abstract: The application provides a mask disposed above a panel; the panel includes a planarization layer, and the planarization layer includes a plurality of trenches, the planarization layer is coated with a layer of TITO; the mask is provided with transparent regions, semi-transparent regions and opaque regions; the transparent regions are respectively arranged on the periphery of the display area and the semi-transparent regions are respectively arranged on the area directly above the trenches on the periphery of the display area; the opaque regions are respectively disposed directly above on each place other than the trenches of the panel, the transparent regions guide the light to expose and remove the TITO in the trenches on the periphery of the display area, the semi-transparent regions weaken the light and exposes and removes the TITO in trenches of the display area, the opaque regions block the light to avoid the exposure of TITO.

Abstract: A mask includes a plurality of completely-transmitting sections and a plurality of light-blocking sections. The completely-transmitting sections and the light-blocking sections are arranged alternate with each other. The light-blocking sections each include a non-light-transmitting sub-section and N light-transmitting sub-sections arranged between the non-light-transmitting sub-section and an adjacent one of the completely-transmitting sections. The N light-transmitting sub-sections have light transmission rates that are increased, step by step, in a direction from the non-light-transmitting sub-section to the completely-transmitting section, where N?22 and N is an inter. Through modification of the structure of mask, grooves formed in a planarization layer of a non-display section with such a modified mask would have sidewalk that are smooth and the sidewalls having gentle slopes so that no residue of photoresist remains in a subsequent process.

Abstract: A display panel includes a plurality of scan lines and connection lines. The plurality of scan lines are spaced from each other. The connection lines are connected to end portions of the plurality of scan lines. The connection lines are formed of intrinsic silicon. By having the connection lines that are formed of intrinsic silicon connected with the end portions of all the scan lines, due to intrinsic silicon being almost electrically non-conductive, this does not affect stage by stage activation of the scan lines and provides a way of power consumption by large resistivity of intrinsic silicon for preventing static electricity on end portions of the scan lines thereby overcoming the issue of static electricity being easily caused on the end portions of the scan lines and thus enhancing product quality.

Abstract: A mask includes a plurality of completely-transmitting sections and a plurality of light-blocking sections. The completely-transmitting sections and the light-blocking sections are arranged alternate with each other. The light-blocking sections each include a non-light-transmitting sub-section and N light-transmitting sub-sections arranged between the non-light-transmitting sub-section and an adjacent one of the completely-transmitting sections. The N light-transmitting sub-sections have light transmission rates that are increased, step by step, in a direction from the non-light-transmitting sub-section to the completely-transmitting section, where N?22 and N is an inter. Through modification of the structure of mask, grooves formed in a planarization layer of a non-display section with such a modified mask would have sidewalk that are smooth and the sidewalls having gentle slopes so that no residue of photoresist remains in a subsequent process.