Abstract: A substrate lift pin assembly, a system including the assembly, and methods of using the same are disclosed. The assembly can include one or more lift pins and a sensor to determine one or more of presence and condition information of the one or more lift pins. The system can be configured to provide an alarm and/or to cease operations based on the presence and/or condition information.

Abstract: Apparatus for providing gas to a reaction chamber, reactor systems including the apparatus, and methods of using the apparatus and systems are disclosed. The systems and methods as described herein can be used to, for example, provide a mixture of two or more precursors to a reaction chamber with desired flow distribution.

Abstract: Various embodiments of the present technology may provide a substrate support apparatus with a surface having a first region with a first temperature profile, a second region having a second temperature profile; and a third region having a third temperature profile. The substrate support apparatus may also have a first channel embedded within the body and disposed between the first region and the second region, and a second channel disposed between the second region and the third region.

Abstract: A substrate processing apparatus includes an upper chamber space, a lower chamber space, a susceptor, and a flow control ring assembly comprising a seal ring and a flow control ring having a shape to surround the susceptor, the flow control ring assembly sealing or substantially sealing the upper chamber space from the lower chamber space while the susceptor in a first position.

Abstract: Various embodiments of the present technology may provide a susceptor assembly. The susceptor assembly may include a susceptor plate and a cap disposed on a surface of the susceptor plate. The cap may have electrodes embedded within it. The susceptor plate may have heating elements embedded within it. The cap may be separated from the susceptor plate by an air gap formed by a plurality of dielectric spacers. The plurality of dielectric spacers may be sized for minimal contact on the cap.

Abstract: A payload suspension system is described herein. A payload suspension system may comprise a suspended payload container within an internal cavity defined by the payload suspension system. The suspended payload container may be suspended by one or more tensile members. The one or more tensile members may be coupled with respective tension adjustment mechanisms configured to adjust a tension of the tensile members. The tension may be adjusted based on a transition to and from a low- or micro-gravity state, in order to provide an increased or decreased movement/rotational ability for the payload container. The low- or micro-gravity state may be produced due to an aircraft performing a parabolic maneuver.

Abstract: Various embodiments of the present technology may provide in-situ metrology. A system may include a first sensor embedded within a susceptor and flush with a top surface of the susceptor. The system may also include lift pin pads having a second sensor arranged to contact a lift pin. The system may also include a third sensor arranged outside of a reaction chamber and adjacent to a view port. The system may also include a processor to receive output signals from one or more of the sensors and use the output signals to determine a film thickness on a wafer.

Abstract: Various embodiments of the present technology may provide a showerhead assembly that includes a showerhead plate having a plurality of through-holes. Each through-hole has a conical-shaped inlet and a conical-shaped outlet. The showerhead plate may include through-holes in a center region having first dimensions and through-holes in an outer region having second dimensions that are different from the first dimensions.

Abstract: Various examples of the present disclosure relate to methods, systems, and apparatus for coupling a delivery vessel disposed at a first location on a substrate processing platform to a remote refill vessel disposed in a second location remote from the substrate processing platform, storing a chemical in the remote refill vessel in a first phase, changing the chemical in the remote refill vessel to a second phase, transporting the chemical in the second phase, to the delivery vessel, maintaining a temperature gradient within an inner volume of the delivery vessel, and returning the chemical to the first phase within the inner volume.

Abstract: The current disclosure relates to example method, system and apparatus for coupling a delivery vessel disposed at a first location on a substrate processing platform to a remote refill vessel disposed in a second location remote from the substrate processing platform via a first chemical delivery line, storing a chemical in the remote refill vessel in a first phase, changing the chemical in the remote refill vessel to a second phase, transporting the chemical in the second phase, to the delivery vessel via the first chemical delivery line, heating the first chemical delivery line to a first temperature equal to or above a phase change temperature of the chemical, and coupling the delivery vessel to an accumulator via a second chemical delivery line.

Abstract: A susceptor assembly includes a heater pedestal and a cap coupled to the heater pedestal. The cap can include one or mor through holes to facilitate purging and/or reduce dead volumes associated with the susceptor assemblies. Reactor systems including such assemblies are also disclosed.

Abstract: The substrate processing system includes a delivery vessel having a first inner volume, disposed in a first location on a substrate processing platform, a remote refill vessel in fluid communication with the delivery vessel via a chemical delivery line, the remote refill vessel comprising a second inner volume greater than the first inner volume and disposed in a second location remote from the substrate processing platform, and a first heating device or a first pressurizing device, or a combination thereof, proximate the remote refill vessel, operable to heat or pressurize, or a combination thereof, a chemical disposed in the remote refill vessel sufficient to change a phase of the chemical from a first phase to a second phase.

Abstract: Various embodiments of the present technology may provide a first vessel to contain a slurry of a solid precursor powder and an inert liquid, a second vessel to receive the slurry, evaporate the inert liquid, and sublimate the solid precursor powder a first time to form a vapor, a third vessel to recondense the vapor back into a solid state and sublimate the solid precursor a second time to form a vapor, and a reaction chamber to receive the vapor from the third vessel.

Abstract: Various embodiments of the present technology may provide methods and apparatus for cleaning a source vessel. The source vessel may be filled or partially filled with a solvent to form a solution. The solution is removed from the source vessel and contained in a waste vessel that is connected to the source vessel. The waste vessel may have a bellow or other mechanism inside of it to create a negative pressure in the waste vessel to pull the solution out of the source vessel and into the waste vessel. Alternatively, a liquid pump may be used to pull the solution from the source vessel to the waste vessel.

Abstract: Various embodiments of the present technology may provide a feature to isolate an upper chamber of a reaction chamber from a lower chamber of a reaction chamber. In one case, a susceptor has a groove along an outer edge that is configured to mate with a spacer plate. A seal is disposed in the groove. In another case, a flow control ring, which rests on the susceptor, has a groove along an outer edge that is configured to mate with the spacer plate.

Abstract: Various embodiments of the present technology may provide an apparatus for use within a reaction chamber. The apparatus includes a susceptor plate having through-holes for which lift pins may be disposed therein. In addition, the susceptor may include an electrostatic chucking function. The susceptor may also include a metal interconnect that is electrically connected to other metal interconnects with a brazing material.

Abstract: Herein disclosed are systems and methods related to delivery systems using solid source chemical fill vessels. The delivery system can include a vapor deposition reactor, two or more fill vessels, of which one of more can be remote from the vapor deposition reactor. Each fill vessel is configured to hold solid source chemical reactant therein. An interconnect line or conduit can fluidly connect the vapor deposition reactor with one or more of the fill vessels. A line heater can heat at least a portion of the interconnect line to at least a minimum line temperature.

Abstract: Disclosed are a method and a Universal Flash Storage (UFS) system for performing save state switching using selective lanes between a first electronic device and a second electronic device. The method includes: determining, by the first electronic device, whether a data request is received from an application layer of the first electronic device; and performing, by the first electronic device, at least one of: setting a first lane from among a plurality of lanes between the first electronic device and the second electronic device to an active state and the other lanes from among the plurality of lanes to a power save state based on determining that the data request is not received from the application layer of the first electronic device; and setting the plurality of lanes between the first electronic device and the second electronic device to the active state based on determining that the data request is received from the application layer of the first electronic device.

Abstract: An electrostatic chuck (ESC) pedestal heater that includes a pedestal body and a surface on the pedestal body for receiving a substrate such as a high bow wafer. An electrode is embedded in the pedestal body to selectively generate an electrostatic force. The ESC pedestal heater includes a substrate contact surface that is raised to a height above the surface on the pedestal body and includes an inner seal band, an intermediate seal band, and an outer seal band extending. In the substrate contact surface, main spokes are provided that extend outward from the inner seal band to the outer seal band, and ancillary spokes may be provided between the main spokes in the region between the intermediate and outer seal bands. Additionally, contact areas or dots are provided in the substrate contact surface in the spaces between the bands and spokes.

Abstract: A heater assembly having a laminate heater plate and a shaft. The laminate heater plate is formed from a plurality of layers, wherein one or more layers may comprise one or more of a heating element, an RF electrode, a cooling channel, and an RTD sensor.