Patents by Inventor Shuhei NAKAJIMA

Shuhei NAKAJIMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240162086
    Abstract: A substrate with a thin film, including the thin film including a Si—R1 group of a compound represented by Formula (1), and the substrate including the thin film including the Si—R1 group, the thin film being disposed on a surface of the substrate, where in Formula (1), R1 represents a monovalent organic group that bonds to Si; R2 represents a monovalent organic group that bonds to Si; R3 represents an alkoxy group, an acyloxy group, or a halogen atom that bonds to Si; n represents an integer from 0 to 2; when n is 2, R2 may be the same or different; when n is 0 or 1, R3 may be the same or different; and when n is 1, R1 and R2 may bond together to form a ring structure. Si(R1)(R2)(R3)3-n??. . .
    Type: Application
    Filed: February 21, 2022
    Publication date: May 16, 2024
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Wataru SHIBAYAMA, Satoshi TAKEDA, Shuhei SHIGAKI, Ken ISHIBASHI, Kodai KATO, Makoto NAKAJIMA, Rikimaru SAKAMOTO
  • Publication number: 20240069441
    Abstract: A resist underlayer film-forming composition capable of reducing occurrence of defects caused by microparticles or the like that may be generated during formation of a coating film. A silicon-containing resist underlayer film-forming composition including: [A]a polysiloxane; [B] a glycol compound having a normal boiling point of 230.0° C. or higher and being of the following Formula (1): (wherein R1 and R2 are each independently a hydrogen atom, a C1-4 alkyl group, or a C3-4 acyl group; and n is an integer of 3 or more); and [C] a solvent (except for a compound corresponding to the compound [B]).
    Type: Application
    Filed: November 26, 2021
    Publication date: February 29, 2024
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Satoshi TAKEDA, Wataru SHIBAYAMA, Shuhei SHIGAKI, Ken ISHIBASHI, Kodai KATO, Makoto NAKAJIMA
  • Patent number: 11470844
    Abstract: The objective of the present invention is to provide a repellent which has a selectivity. Specifically, the repellent does not cause damage to an Apidae bee but suppresses the aggression of a Vespidae wasp and prevents a Vespidae wasp from coming close and building a nest. Also, the objective of the present invention is to provide a method for repelling a Vespidae wasp. The Vespidae wasp repellent according to the present invention is characterized in comprising a compound represented by the following formula (I) as an active component: wherein R1 is hydrogen atom or the like, X is a C1-4 alkylene group or the like, ? is a substituent, n is an integer of 0 or more and 5 or less.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: October 18, 2022
    Assignee: KINP CO., LTD
    Inventors: Chul Sa Kim, Toshihide Ichikawa, Shuhei Nakajima
  • Publication number: 20180325107
    Abstract: The objective of the present invention is to provide a repellent which has a selectivity. Specifically, the repellent does not cause damage to an Apidae bee but suppresses the aggression of a Vespidae wasp and prevents a Vespidae wasp from coming close and building a nest. Also, the objective of the present invention is to provide a method for repelling a Vespidae wasp. The Vespidae wasp repellent according to the present invention is characterized in comprising a compound represented by the following formula (I) as an active component: wherein R1 is hydrogen atom or the like, X is a C1-4 alkylene group or the like, ? is a substituent, n is an integer of 0 or more and 5 or less.
    Type: Application
    Filed: October 31, 2016
    Publication date: November 15, 2018
    Applicant: KINP CO., LTD
    Inventors: Chul Sa KIM, Toshihide ICHIKAWA, Shuhei NAKAJIMA