Abstract: In a substrate processing apparatus according to the present invention, a heating mechanism for heating a substrate includes a gas discharge nozzle arranged in an internal space, a heater attached to an outer wall of a chamber, and a pipe feeding to the discharge nozzle. An observing mechanism includes a light source part and an image pickup part which are arranged at a separation position away from an attachment portion in the outer wall of the chamber. Thus, the light source part and the image pickup part become less susceptible to an effect of heat generated by the heater. In other words, it is possible to prevent the reduction in the observation accuracy due to an effect of temperature change.

Abstract: An information processing device according to the present application includes an obtaining unit, a reception unit, and a provision unit. The obtaining unit obtains a base image, the base image being an image that includes a transaction target specified by a user. The reception unit receives editing performed by the user on an illustration image that includes an illustration-prepared transaction target obtained by preparing an illustration of a transaction target included in the base image. The provision unit provides an edited illustration image to a search server that conducts an image search, the edited illustration image being the illustration image that has been edited by the user.