Patents by Inventor Shuhei Oya
Shuhei Oya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240109320Abstract: A liquid ejection head includes an element substrate, an electric wiring board, a cover member, and a support member having a first through hole, a second through hole, and a support surface. The element substrate includes an ejection port and a pressure chamber to supply liquid to the ejection port. The cover member is joined to the support surface with a first adhesive. The support member supports the element substrate and the electric wiring board on the support surface. The first through hole serves as a flow passage through which the liquid is supplied to the pressure chamber and the second through hole opens in the support surface. The first adhesive is disposed in an outer peripheral region of the support surface of the support member. A space surrounded by the cover member, the support member, and the first adhesive communicates with the second through hole.Type: ApplicationFiled: October 2, 2023Publication date: April 4, 2024Inventors: SHUHEI OYA, TOMOAKI KAMAGATA, TAKASHI HAYASAKA, SATOSHI IDETA
-
Patent number: 11179934Abstract: A liquid ejection head includes a substrate provided with an energy-generating element, an ejection orifice forming member that is formed on the substrate and includes an ejection orifice from which liquid is ejected, a reinforcing rib provided in the ejection orifice forming member, and a recess that is formed in the substrate and forms a part of a flow path of liquid, wherein the reinforcing rib is disposed in the inside of the recess.Type: GrantFiled: February 11, 2020Date of Patent: November 23, 2021Assignee: Canon Kabushiki KaishaInventors: Shuhei Oya, Makoto Watanabe, Takanobu Manabe
-
Patent number: 10861703Abstract: To provide dummy openings having at least one of arrangement and shape determined depending on the shape of a non-effective region.Type: GrantFiled: August 2, 2018Date of Patent: December 8, 2020Assignee: CANON KABUSHIKI KAISHAInventors: Hirohisa Fujita, Kenji Fujii, Satoshi Ibe, Makoto Watanabe, Shuhei Oya, Yusuke Hashimoto
-
Publication number: 20200254757Abstract: A liquid ejection head 4 includes a substrate 1 provided with an energy-generating element 5, an ejection orifice forming member 2 that is formed on the substrate 1 and includes an ejection orifice 3 from which liquid is ejected, a reinforcing rib 10 provided in the ejection orifice forming member 2, and a recess 6 that is formed in the substrate 1 and forms a part of a flow path of liquid, wherein the reinforcing rib 10 is disposed in the inside of the recess 6.Type: ApplicationFiled: February 11, 2020Publication date: August 13, 2020Inventors: Shuhei Oya, Makoto Watanabe, Takanobu Manabe
-
Patent number: 10442201Abstract: A method for manufacturing a liquid ejection head includes: a step of preparing a substrate having a first surface on which energy generation elements and a first layer are provided; and a step of forming a supply port by etching the substrate with an etching liquid or an etching gas from a second surface which is a surface opposite to the first surface so as to enable the etching liquid or the etching gas to reach the first layer, and the first layer is divided by a region which is located between a portion of the first layer covering the energy generation elements and a portion of the first layer to which the etching liquid or the etching gas is reached.Type: GrantFiled: April 27, 2018Date of Patent: October 15, 2019Assignee: Canon Kabushiki KaishaInventors: Satoshi Ibe, Kenji Fujii, Yusuke Hashimoto, Shuhei Oya, Hirohisa Fujita
-
Patent number: 10274826Abstract: A method for imparting water repellency to a surface of a member includes a step in which a material including a compound containing a fluorine atom is deposited on a surface of a photosensitive resin layer in order to form a member including a material layer; a first exposure step in which the member is exposed to an amount of light with an exposure apparatus in order to form a latent image in the member; a development step in which the member including the latent image is developed; and a second exposure step in which the member is exposed to an amount of light with an exposure apparatus subsequent to the development step.Type: GrantFiled: June 2, 2016Date of Patent: April 30, 2019Assignee: Canon Kabushiki KaishaInventors: Masataka Nagai, Yoshinori Tagawa, Shingo Nagata, Hiroyuki Murayama, Shuhei Oya, Makoto Watanabe
-
Patent number: 10241410Abstract: A method for imparting water repellency to a surface of a member includes a step in which a material including a compound containing a fluorine atom is deposited on a surface of a photosensitive resin layer in order to form a member including a material layer; a first exposure step in which the member is exposed to an amount of light with an exposure apparatus in order to form a latent image in the member; a development step in which the member including the latent image is developed; and a second exposure step in which the member is exposed to an amount of light with an exposure apparatus subsequent to the development step.Type: GrantFiled: June 2, 2016Date of Patent: March 26, 2019Assignee: Canon Kabushiki KaishaInventors: Masataka Nagai, Yoshinori Tagawa, Shingo Nagata, Hiroyuki Murayama, Shuhei Oya, Makoto Watanabe
-
Publication number: 20190051533Abstract: To provide dummy openings having at least one of arrangement and shape determined depending on the shape of a non-effective region.Type: ApplicationFiled: August 2, 2018Publication date: February 14, 2019Inventors: Hirohisa Fujita, Kenji Fujii, Satoshi Ibe, Makoto Watanabe, Shuhei Oya, Yusuke Hashimoto
-
Publication number: 20180319165Abstract: A method for manufacturing a liquid ejection head includes: a step of preparing a substrate having a first surface on which energy generation elements and a first layer are provided; and a step of forming a supply port by etching the substrate with an etching liquid or an etching gas from a second surface which is a surface opposite to the first surface so as to enable the etching liquid or the etching gas to reach the first layer, and the first layer is divided by a region which is located between a portion of the first layer covering the energy generation elements and a portion of the first layer to which the etching liquid or the etching gas is reached.Type: ApplicationFiled: April 27, 2018Publication date: November 8, 2018Inventors: Satoshi Ibe, Kenji Fujii, Yusuke Hashimoto, Shuhei Oya, Hirohisa Fujita
-
Patent number: 9555632Abstract: Performed are a non-through hole forming step of partitioning a supply path forming region of a second surface into a first region corresponding to a forming position of a beam, a second region located adjacent to the first region on both sides thereof, and a third region that is none of the first region and the second region, and forming a plurality of non-through holes in the second region and the third region, and an etching step of subjecting a silicon substrate to anisotropic etching from the second surface, to thereby form the supply path and the beam in the supply path. In the non-through hole forming step, at least one of an interval or a depth of the non-through holes is caused to differ in the second region and the third region, to thereby control the shape and dimension of the beam to be formed in the etching step.Type: GrantFiled: May 20, 2016Date of Patent: January 31, 2017Assignee: CANON KABUSHIKI KAISHAInventors: Makoto Watanabe, Yoshinori Tagawa, Hiroyuki Murayama, Shuhei Oya, Takanobu Manabe
-
Publication number: 20160375687Abstract: Performed are a non-through hole forming step of partitioning a supply path forming region of a second surface into a first region corresponding to a forming position of a beam, a second region located adjacent to the first region on both sides thereof, and a third region that is none of the first region and the second region, and forming a plurality of non-through holes in the second region and the third region, and an etching step of subjecting a silicon substrate to anisotropic etching from the second surface, to thereby form the supply path and the beam in the supply path. In the non-through hole forming step, at least one of an interval or a depth of the non-through holes is caused to differ in the second region and the third region, to thereby control the shape and dimension of the beam to be formed in the etching step.Type: ApplicationFiled: May 20, 2016Publication date: December 29, 2016Inventors: Makoto Watanabe, Yoshinori Tagawa, Hiroyuki Murayama, Shuhei Oya, Takanobu Manabe
-
Publication number: 20160357106Abstract: A method for imparting water repellency to a surface of a member includes a step in which a material including a compound containing a fluorine atom is deposited on a surface of a photosensitive resin layer in order to form a member including a material layer; a first exposure step in which the member is exposed to an amount of light with an exposure apparatus in order to form a latent image in the member; a development step in which the member including the latent image is developed; and a second exposure step in which the member is exposed to an amount of light with an exposure apparatus subsequent to the development step.Type: ApplicationFiled: June 2, 2016Publication date: December 8, 2016Inventors: Masataka Nagai, Yoshinori Tagawa, Shingo Nagata, Hiroyuki Murayama, Shuhei Oya, Makoto Watanabe
-
Patent number: 9387675Abstract: A liquid discharge head includes a substrate, a heat resistor layer, and a side wall member that forms a side wall of a pressure chamber. The heat resistor layer has a heat effect portion configured to foam liquid in an interior of the pressure chamber to discharge liquid from a discharge port. The heat effect portion is apart from the substrate, at least part of a surface of the heat resistor layer is covered with a covering layer in the interior of the pressure chamber, and the covering layer extends from the interior of the pressure chamber to a position coming into contact with the side wall of the side wall member.Type: GrantFiled: May 26, 2015Date of Patent: July 12, 2016Assignee: Canon Kabushiki KaishaInventors: Makoto Watanabe, Keiji Watanabe, Shuhei Oya, Shingo Nagata
-
Patent number: 9315026Abstract: A method for manufacturing a liquid discharge head. The method includes a first step of forming a telecentric measurement pattern A by exposure, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in a projection exposing device, and a second step of forming a telecentric measurement pattern B by exposure under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device. The off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement patterns A and B and an amount of defocusing.Type: GrantFiled: August 12, 2015Date of Patent: April 19, 2016Assignee: Canon Kabushiki KaishaInventors: Takanobu Manabe, Yoshinori Tagawa, Hiroyuki Murayama, Shuhei Oya
-
Publication number: 20160052273Abstract: A method for manufacturing a liquid discharge head. The method includes a first step of forming a telecentric measurement pattern A by exposure, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in a projection exposing device, and a second step of forming a telecentric measurement pattern B by exposure under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device. The off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement patterns A and B and an amount of defocusing.Type: ApplicationFiled: August 12, 2015Publication date: February 25, 2016Inventors: Takanobu Manabe, Yoshinori Tagawa, Hiroyuki Murayama, Shuhei Oya
-
Publication number: 20150343780Abstract: A liquid discharge head includes a substrate, a heat resistor layer, and a side wall member that forms a side wall of a pressure chamber. The heat resistor layer has a heat effect portion configured to foam liquid in an interior of the pressure chamber to discharge liquid from a discharge port. The heat effect portion is apart from the substrate, at least part of a surface of the heat resistor layer is covered with a covering layer in the interior of the pressure chamber, and the covering layer extends from the interior of the pressure chamber to a position coming into contact with the side wall of the side wall member.Type: ApplicationFiled: May 26, 2015Publication date: December 3, 2015Inventors: Makoto Watanabe, Keiji Watanabe, Shuhei Oya, Shingo Nagata
-
Patent number: 9108406Abstract: A device substrate includes a substrate body having an energy generating device provided thereon, where the energy generating device generates energy for ejecting liquid, an ejection port forming member disposed on the substrate body, where the ejection port forming member has a pressure chamber that surrounds the energy generating device and an ejection port that communicates with the pressure chamber, and a supply port configured to supply the liquid to the pressure chamber. The ejection port forming member has a first surface that is in contact with the substrate body and a second surface other than the first surface, and the supply port is formed in the second surface.Type: GrantFiled: May 13, 2014Date of Patent: August 18, 2015Assignee: Canon Kabushiki KaishaInventors: Kouji Hasegawa, Satoshi Ibe, Jun Yamamuro, Shuhei Oya, Shiro Sujaku, Junya Hayasaka
-
Patent number: 9085141Abstract: A liquid ejection head and a printing apparatus can perform high-quality printing by suppressing the shrinkage stress of an adhesive joining a substrate and a flow path forming member and the deformation and peeling of the flow path forming member. A stress dispersing section is formed on the side surface of the substrate.Type: GrantFiled: August 21, 2014Date of Patent: July 21, 2015Assignee: Canon Kabushiki KaishaInventors: Shuhei Oya, Satoshi Ibe, Jun Yamamuro, Kouji Hasegawa, Shiro Sujaku, Junya Hayasaka
-
Publication number: 20150062260Abstract: There are provided a liquid ejection head and a printing apparatus capable of performing high-quality printing by suppressing the shrinkage stress of an adhesive joining a substrate and a flow path forming member and the deformation and peeling of the flow path forming member. A stress dispersing section 11 is formed on the side surface of the substrate 1.Type: ApplicationFiled: August 21, 2014Publication date: March 5, 2015Inventors: Shuhei OYA, Satoshi Ibe, Jun Yamamuro, Kouji Hasegawa, Shiro Sujaku, Junya Hayasaka
-
Publication number: 20140340451Abstract: A device substrate includes a substrate body having an energy generating device provided thereon, where the energy generating device generates energy for ejecting liquid, an ejection port forming member disposed on the substrate body, where the ejection port forming member has a pressure chamber that surrounds the energy generating device and an ejection port that communicates with the pressure chamber, and a supply port configured to supply the liquid to the pressure chamber. The ejection port forming member has a first surface that is in contact with the substrate body and a second surface other than the first surface, and the supply port is formed in the second surface.Type: ApplicationFiled: May 13, 2014Publication date: November 20, 2014Applicant: CANON KABUSHIKI KAISHAInventors: Kouji Hasegawa, Satoshi Ibe, Jun Yamamuro, Shuhei Oya, Shiro Sujaku, Junya Hayasaka