Patents by Inventor Shu Hua Wu
Shu Hua Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20220113199Abstract: The present disclosure provides embodiments of semiconductor devices. In one embodiment, the semiconductor device includes a dielectric layer and a fin-shaped structure disposed over the dielectric layer. The fin-shaped structure includes a first p-type doped region, a second p-type doped region, and a third p-type doped region, and a first n-type doped region, a second n-type doped region, and a third n-type doped region interleaving the first p-type doped region, the second p-type doped region, and the third p-type doped region. The first p-type doped region, the third p-type doped region and the third n-type doped region are electrically coupled to a first potential. The second p-type doped region, the first p-type doped region and the second p-type doped region are electrically coupled to a second potential different from the first potential.Type: ApplicationFiled: October 13, 2020Publication date: April 14, 2022Inventors: Zi-Ang Su, Ming-Shuan Li, Shu-Hua Wu, Chih Chieh Yeh, Chih-Hung Wang, Wen-Hsing Hsieh
-
Publication number: 20210255383Abstract: The disclosure provides an optical device including a diffusion layer, a light-emitting device, and a first photoluminescent film. The diffusion layer is disposed opposite to the light-emitting device, and the light-emitting device includes a plurality of light-emitting units. The first photoluminescent film is between the diffusion layer and the light-emitting device. A first distance between the first photoluminescent film and the diffusion layer is greater than a second distance between the first photoluminescent film and one of the plurality of light-emitting units. The optical device of the disclosure may improve brightness efficiency.Type: ApplicationFiled: January 27, 2021Publication date: August 19, 2021Applicant: Innolux CorporationInventors: Chieh Ying Chen, Ming Yen Lin, Chun Hsu Lin, Hsin-Yi Huang, Shu Hua Wu
-
Patent number: 7025820Abstract: A method for forming an aqueous carbon black dispersion including providing a reaction mixture including carbon black having a DBP uptake of greater than 90 cc/100 g of the carbon black, a monovalent ion persulfate, an aqueous medium, and, in some embodiments, a strong acid; subjecting the reaction mixture to a first temperature of from 40° C. to 90° C. for from 2 hours to 24 hours; neutralizing the reaction mixture to a pH greater than 7.0, and, in certain embodiments, subjecting the neutralized reaction mixture to a second temperature of from 20° C. to 40° C. higher than the first temperature for from 2 hours to 12 hours is provided. In an alternative aspect carbon black having a particle diameter less than 18 nanometers in diameter and a DBP uptake of less than 70 cc/100 g carbon black is provided. The aqueous carbon black dispersion so formed and an aqueous inkjet ink containing the aqueous carbon black dispersion are also provided.Type: GrantFiled: November 3, 2003Date of Patent: April 11, 2006Assignee: Rohm and Haas CompanyInventors: Tabb Robertson Champlin, Stephen Andrew Crescimanno, Eric Jon Langenmayr, Richard Shu-Hua Wu
-
Patent number: 6991763Abstract: Disclosed is a process for controlling the level of in-process monomer in an emulsion polymerization reaction. Also disclosed is a method of controlling particle size by controlling the level of in-process monomer.Type: GrantFiled: April 4, 2001Date of Patent: January 31, 2006Assignee: Rohm and Haas CompanyInventors: Michael Raymond Connelly, Dennis Patrick Stack, Richard Shu-Hua Wu, Ronald Ray Zimmer
-
Patent number: 6896212Abstract: A method of using polymeric grinding media to produce fine solid particles or fine solid dispersions in liquid, such as pigment dispersions for inks, is provided. The method of the present invention limits packing and plugging problems associated with polymeric media to allow efficient milling operation.Type: GrantFiled: September 4, 2003Date of Patent: May 24, 2005Assignee: Rohm and Haas CompanyInventors: Vere Orland Archibald, Richard Shu-Hua Wu
-
Publication number: 20040255980Abstract: This invention relates to a process for cleaning reactors. The process utilizes a solvent fed from multiple pressure sources to clean reactors of residual polymers. The reactors are equipped with agitators and stationary nozzles aimed at the agitator blades. The agitator is rotated during cleaning. The process may also utilize heated aqueous base to clean heat exchangers in external loops. In one aspect, a mixture of at least one organic solvent and aqueous base are utilized to clean certain reactors.Type: ApplicationFiled: March 3, 2004Publication date: December 23, 2004Inventors: Spencer Wayne Bruce, James Kent Carpenter, Jeanine Lee Hurry, Joseph Richard Povernick, Frank Randolph Robertson, Robert Hugh Schwartz, Richard Shu-Hua Wu
-
Publication number: 20040251331Abstract: A method of using polymeric grinding media to produce fine solid particles or fine solid dispersions in liquid, such as pigment dispersions for inks, is provided. The method of the present invention limits packing and plugging problems associated with polymeric media to allow efficient milling operation.Type: ApplicationFiled: September 4, 2003Publication date: December 16, 2004Inventors: Vere Orland Archibald, Richard Shu-Hua Wu
-
Publication number: 20040143053Abstract: A method of preparing an emulsion polymer having a low residual monomer content, wherein the method includes the simultaneous addition of an oxidizing agent and a reducing agent to different locations on the process side of a heat exchanger is provided.Type: ApplicationFiled: January 7, 2004Publication date: July 22, 2004Inventors: Richard Shu-Hua Wu, David Arthur Pierce, Owen Clifford Hallerud
-
Publication number: 20040103822Abstract: A method for forming an aqueous carbon black dispersion including providing a reaction mixture including carbon black having a DBP uptake of greater than 90 cc/100 g of the carbon black, a monovalent ion persulfate, an aqueous medium, and, in some embodiments, a strong acid; subjecting the reaction mixture to a first temperature of from 40° C. to 90° C. for from 2 hours to 24 hours; neutralizing the reaction mixture to a pH greater than 7.0, and, in certain embodiments, subjecting the neutralized reaction mixture to a second temperature of from 20° C. to 40° C. higher than the first temperature for from 2 hours to 12 hours is provided. In an alternative aspect carbon black having a particle diameter less than 18 nanometers in diameter and a DBP uptake of less than 70 cc/100 g carbon black is provided. The aqueous carbon black dispersion so formed and an aqueous inkjet ink containing the aqueous carbon black dispersion are also provided.Type: ApplicationFiled: November 3, 2003Publication date: June 3, 2004Inventors: Tabb Robertson Champlin, Stephen Andrew Crescimanno, Eric Jon Langenmayr, Richard Shu-Hua Wu
-
Patent number: 6723161Abstract: A method for oxidizing an organic pigment including dispersing the pigment in an aqueous medium and exposing the dispersed pigment to ultrasonic radiation, whereby the exposed pigment exhibits from 3 to 10 microequivalents of carboxylic acid, or salts thereof, per square meter of pigment surface.Type: GrantFiled: November 18, 2002Date of Patent: April 20, 2004Assignee: Rohm and Haas CompanyInventors: Eric Jon Langenmayr, Richard Shu-Hua Wu
-
Patent number: 6722377Abstract: This invention relates to a process for cleaning reactors. The process utilizes a solvent fed from multiple pressure sources to clean reactors of residual polymers. The reactors are equipped with agitators and stationary nozzles aimed at the agitator blades. The agitator is rotated during cleaning. The process may also utilize heated aqueous base to clean heat exchangers in external loops. In one aspect, a mixture of at least one organic solvent and aqueous base are utilized to clean certain reactors.Type: GrantFiled: August 17, 2000Date of Patent: April 20, 2004Assignee: Rohm and Haas CompanyInventors: Spencer Wayne Bruce, James Kent Carpenter, Jeanine Lee Hurry, Joseph Richard Povernick, Frank Randolph Robertson, III, Robert Hugh Schwartz, Richard Shu-Hua Wu
-
Publication number: 20030101909Abstract: A method for oxidizing an organic pigment including dispersing the pigment in an aqueous medium and exposing the dispersed pigment to ultrasonic radiation, whereby the exposed pigment exhibits from 3 to 10 microequivalents of carboxylic acid, or salts thereof, per square meter of pigment surface.Type: ApplicationFiled: November 18, 2002Publication date: June 5, 2003Inventors: Eric Jon Langenmayr, Richard Shu-Hua Wu
-
Patent number: 6515082Abstract: This invention relates to a process for preparing polymers which contain as polymerized units hydrophobic monomers wherein a stable emulsion is formed and the formation of suspension particles is minimized. The process includes making a concentrated monomer emulsion, diluting the concentrated monomer emulsion with water, feeding the diluted monomer emulsion to a reactor, and polymerizing the monomer.Type: GrantFiled: May 3, 2000Date of Patent: February 4, 2003Assignee: Rohm And Haas CompanyInventors: Jeffrey Lewis Brown, Dennis Patrick Stack, Richard Shu-Hua Wu
-
Patent number: 6380324Abstract: A continuous process for preparing polymers in a non-cylindrical heat exchanger is disclosed. The amount of monomer fed and polymer in the reactor is controlled to minimize fouling of the reactor. The use of steam to control the temperature of the reaction mixture is also disclosed.Type: GrantFiled: January 7, 2000Date of Patent: April 30, 2002Assignee: Rohm and Haas CompanyInventors: Dawn Marie McFadden, Richard Shu-Hua Wu
-
Patent number: 6353087Abstract: This invention relates to a process for stripping polymer reaction compositions. The process reduces gel in the polymer reaction composition by adjusting the pH of the polymer to from 7 to 11 prior to stripping and maintaining the adjusted pH during stripping, maintaining the temperature of the polymer at from 30° C. to 70° C. during stripping, utilizing a continuous stripping operation, or combinations thereof.Type: GrantFiled: August 17, 2000Date of Patent: March 5, 2002Assignee: Rohm and Haas CompanyInventors: I-Hwa Midey Chang-Mateu, James Michael Lipovsky, Dawn Marie McFadden, Richard Shu-Hua Wu
-
Publication number: 20020001547Abstract: Disclosed is a process for controlling the level of in-process monomer in an emulsion polymerization reaction. Also disclosed is a method of controlling particle size by controlling the level of in-process monomer.Type: ApplicationFiled: April 4, 2001Publication date: January 3, 2002Inventors: Michael Raymond Connelly, Dennis Patrick Stack, Richard Shu-Hua Wu, Ronald Ray Zimmer
-
Patent number: 6320000Abstract: A process for preparing polymers is disclosed. The process utilizes displacement of air in a polymerization reactor with water vapor, a closed system, and a pump at high operating pressure to pump the polymer through a heat exchanger in an external loop, resulting in reduced volatile organic compound emissions.Type: GrantFiled: April 5, 2000Date of Patent: November 20, 2001Inventors: Jeanine Lee Hurry, Robert Hugh Schwartz, Richard Shu-Hua Wu
-
Patent number: 6252016Abstract: A continuous process for preparing polymers is disclosed. The continuous process includes the steps of continuously feeding a reaction mixture containing a monomer into a non-cylindrical channel, continuously controlling the temperature of the non-cylindrical channel by exposing the surface of the non-cylindrical channel not exposed to the monomer to a temperature control medium, polymerizing the monomer in the non-cylindrical channel, and continuously removing the polymer from the non-cylindrical channel. The continuous process is suitable for the preparation of polymers containing ethylenically unsaturated monomers as polymerized units by emulsion polymerization, solution polymerization, and suspension polymerization.Type: GrantFiled: September 8, 1999Date of Patent: June 26, 2001Assignee: Rohm and Haas CompanyInventors: Richard Shu-Hua Wu, Jill Ann Wudarski, James Szkolnick Kempner