Abstract: A method of ion implantation is provided by utilizing an ion implantation apparatus comprising a disc having a slit, an ion source, and a scanning mechanism for scanning the ion beam by moving the disc two-dimensionally which includes a motor, a stepping motor etc. The quantity of ions in the ion beam is first measured at a plurality of positions along the longitudinal direction of the slit and a plurality of data sets representing the position in the slit and the quantity of ions in the ion beam is provided. The quantity of ions in the ion beam for the ion implantation is adjusted according to the data sets in order to obtain the uniform dose of ions introduced in the wafer surface.

Abstract: A plurality of photo-detectors are provided wherein each photodetector includes a photosensitive semiconductor having a light-receiving face, a pair of leads electrically connected to the photosensitive semiconductor, and an individually selected light-transmitting member disposed in front of the light-receiving face of the photosensitive semiconductor. The light-transmitting member has a selected light transmittance which is individually selected from a plurality of different light-transmitting members to compensate for variations in the photosensitive semiconductor such that the photosensitive semiconductor provides an output current within a selected range upon a predetermined quantity of light incident upon the photo-detector. The light transmissive compensating member may be formed by selecting at least one of a mixture of materials, color, thickness, and surface finishing.

Abstract: An ion-implantation system is provided, which is capable of successive ion-implantation processes into a same target under different ion-implantation conditions. This system has an ion generator for generating an initial ion beam of charged ions, an ion-beam splitter for splitting the initial ion beam into first to n-th ion beams where n is an integer greater than unity, an acceleration-energy controller for independently controlling the acceleration energies of the first to n-th ion beams, an ion-beam selector for selecting one of the first to n-th ion beams, and a target holder for holding a target thereon. The selected one of the first to n-th ion beams is irradiated to the target on the target holder, thereby implanting the charged ions contained in the initial ion beam into the target. The acceleration-energy controller may include an acceleration and/or deceleration tube for accelerating and/or decelerating the first to n-th ion beams.

Abstract: An ion implantation method is provided, which is able to suppress unwanted positive charges built-up on the surface of an ion-implanted semiconductor wafer. First, a wafer holder kept at a first electric potential and an electrode kept at a second electric potential higher than the first electric potential are prepared. A semiconductor wafer is then placed on the holder to be kept at the first electric potential. The holder is moved so that the wafer held on the holder is located at a first position. A beam of dopant ions is irradiated to the wafer at the first position to thereby implant the dopant ions into the wafer. The holder is then moved so that the wafer thus ion-implanted is located at a second position where the wafer is in the vicinity of the electrode. An electric field is generated between the wafer and the electrode due to the difference between the first and second electric potentials.

Abstract: In a photo-detector, a window pane member for covering a photosensitive semiconductor is selected from among plural samples having light transmittances different from each other in compliance with an intensity of output of the photosensitive semiconductor detected under a constant quantity of light incident on the photosensitive semiconductor, thereby compressing dispersion of outputs in the plural photo-detectors into a small range as a whole.

Abstract: An automobile air conditioner which has a generally elongated casing having air intake and outlet grilles defined at opposite sides thereof, a generally elongated evaporator accommodated within the casing so as to extend generally parallel to the direction of elongation of the casing and positioned adjacent the air intake grille, at least one cross-flow fan accommodated within the casing so as to extend generally parallel to the direction of elongation of the casing and positioned between the evaporator and the air outlet grille, and a drive unit for driving the cross-flow fan in one direction for blowing air from the inlet grille to the air outlet grille. The evaporator is supported in position within the casing in a tilted fashion with its upper edge towards the cross-flow fan.