Patents by Inventor Shuichi Miyata

Shuichi Miyata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6326309
    Abstract: The present invention relates to a semiconductor device manufacturing method containing the step of polishing an insulating oxide film having an uneven surface, to improve a throughput in burying the insulating film into trenches and also improve flatness of a polished surface.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: December 4, 2001
    Assignee: Fujitsu Limited
    Inventors: Masanobu Hatanaka, Naoyuki Takada, Motoshu Miyajima, Shuichi Miyata
  • Publication number: 20010036738
    Abstract: The present invention relates to a semiconductor device manufacturing method containing the step of polishing an insulating oxide film having an uneven surface, to improve a throughput in burying the insulating film into trenches and also improve flatness of a polished surface.
    Type: Application
    Filed: June 30, 1999
    Publication date: November 1, 2001
    Inventors: MASANOBU HATANAKA, NAOYUKI TAKADA, MOTOSHU MIYAJIMA, SHUICHI MIYATA
  • Patent number: 5688628
    Abstract: A resist composition comprising in admixture (A) a compound which forms an acid upon exposure to active rays, (B) a polymer which has at least one structural unit with a group unstable to an acid and cleaves at this group in the presence of the acid derived from the compound (A) to turn alkali-soluble, and (C) a phenolic compound, and a process for forming a resist pattern using this resist composition are provided.
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: November 18, 1997
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Masayuki Oie, Nobunori Abe, Hideyuki Tanaka, Akira Oikawa, Shuichi Miyata