Patents by Inventor Shuichi Nishikido

Shuichi Nishikido has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium
    Patent number: 9120120
    Abstract: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: September 1, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Taro Yamamoto, Naoto Yoshitaka, Shuichi Nishikido, Yoichi Tokunaga
  • CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM
    Publication number: 20140352736
    Abstract: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
    Type: Application
    Filed: August 14, 2014
    Publication date: December 4, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Taro YAMAMOTO, Naoto YOSHITAKA, Shuichi NISHIKIDO, Yoichi TOKUNAGA
  • Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium
    Patent number: 8851092
    Abstract: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: October 7, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Taro Yamamoto, Naoto Yoshitaka, Shuichi Nishikido, Yoichi Tokunaga
  • CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM
    Publication number: 20090202951
    Abstract: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
    Type: Application
    Filed: February 5, 2009
    Publication date: August 13, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Taro Yamamoto, Naoto Yoshitaka, Shuichi Nishikido, Yoichi Tokunaga