Patents by Inventor Shuichi Odagiri

Shuichi Odagiri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pigment-dispersed composition, curable composition, color filter and production method thereof
    Patent number: 8785087
    Abstract: The present invention provides a pigment-dispersed composition including at least a polymer compound (A-1) having at least one selected from the structural units represented by the following formulae (1) to (3), a pigment (B) and a solvent (C), and a pigment-dispersed composition including at least a resin (D) having an acid number of 100 mg KOH/g or more, a dispersion resin (A-2) having an acid number of less than 100 mg KOH/g and an unsaturation equivalent of less than 600, a pigment (B), and a solvent (C) [R1 to R20: a hydrogen atom, a monovalent organic group; A1 to A3: an oxygen atom, a sulfur atom, —N(R21)—; G1 to G3: a divalent organic group; X, Z: an oxygen atom, a sulfur atom, —N(R22)—; Y: an oxygen atom, a sulfur atom, a phenylene group, —N(R23)—; and R21 to R23: an alkyl group].
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: July 22, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Taeko Nakashima, Kazuto Shimada, Shuichi Odagiri
  • PIGMENT-DISPERSED COMPOSITION, CURABLE COMPOSITION, COLOR FILTER AND PRODUCTION METHOD THEREOF
    Publication number: 20100323284
    Abstract: The present invention provides a pigment-dispersed composition including at least a polymer compound (A-1) having at least one selected from the structural units represented by the following formulae (1) to (3), a pigment (B) and a solvent (C), and a pigment-dispersed composition including at least a resin (D) having an acid number of 100 mg KOH/g or more, a dispersion resin (A-2) having an acid number of less than 100 mg KOH/g and an unsaturation equivalent of less than 600, a pigment (B), and a solvent (C) [R1 to R20: a hydrogen atom, a monovalent organic group; A1 to A3: an oxygen atom, a sulfur atom, —N(R21)—; G1 to G3: a divalent organic group; X, Z: an oxygen atom, a sulfur atom, —N(R22)—; Y: an oxygen atom, a sulfur atom, a phenylene group, —N(R23)—; and R21 to R23: an alkyl group].
    Type: Application
    Filed: December 27, 2007
    Publication date: December 23, 2010
    Applicant: Fujifilm Corporation
    Inventors: Taeko Nakashima, Kazuto Shimada, Shuichi Odagiri