Patents by Inventor Shuiyuan Haung

Shuiyuan Haung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating a magnetic stack design with decreased substrate stress
    Patent number: 7998758
    Abstract: A magnetic element and a method for making a magnetic element. The method includes patterning a first electrode material to form a first electrode on a substrate and depositing filler material on the substrate around the first electrode. The method further includes polishing to form a planar surface of filler and the first electrode. A magnetic cell is formed on the planar surface and a second electrode is formed on the magnetic cell. In some embodiments, the first electrode has an area that is at least 2:1 to the area of the magnetic cell.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: August 16, 2011
    Assignee: Seagate Technology LLC
    Inventors: Yongchul Ahn, Shuiyuan Haung, Antoine Khoueir, Paul Anderson, Lili Jia, Christina Laura Hutchinson, Ivan Ivanov, Dimitar Dimitrov