Patents by Inventor Shuji Miyazaki

Shuji Miyazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12051826
    Abstract: A nonaqueous electrolyte secondary battery includes an exterior package, an electrode assembly, and an electrolyte solution. The exterior package stores the electrode assembly and the electrolyte solution. The electrode assembly is shaped to have a flat shape. The electrode assembly includes a layered body. The layered body includes a first separator, a positive electrode plate, a second separator, and a negative electrode plate. The first separator, the positive electrode plate, the second separator, and the negative electrode plate are layered in this order. The electrode assembly is formed by spirally winding the layered body. Each of the first separator and the second separator has a proportional limit of less than or equal to 10.2 MPa. The proportional limit is measured in a compression test in a thickness direction of each of the first separator and the second separator.
    Type: Grant
    Filed: September 3, 2021
    Date of Patent: July 30, 2024
    Assignee: PRIME PLANET ENERGY & SOLUTIONS, INC.
    Inventors: Atsushi Miyazaki, Tetsuya Okado, Masashi Muraoka, Kazutaka Mita, Shuji Ogawa, Takafumi Tsukagoshi
  • Patent number: 11703553
    Abstract: A magnetic field analysis device includes a magnetization application unit that divides a virtual space into a plurality of volume elements and applies magnetization to each of the volume elements, and a magnetic field calculation unit that calculates, on each of a plurality of observation points in the virtual space, based on the magnetization applied to a plurality of the volume elements around the observation point, a magnetic field generated at the observation point for each volume element and obtains a magnetic field generated at each of the plurality of the observation points based on a calculation result of each of the plurality of the volume elements.
    Type: Grant
    Filed: September 4, 2020
    Date of Patent: July 18, 2023
    Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventor: Shuji Miyazaki
  • Publication number: 20220229955
    Abstract: A magnetic field analysis method includes: dividing each analysis object of a system including at least one analysis object into a plurality of beads; applying a magnetic moment to each bead; and obtaining an induced magnetic field at a position of each bead when an external magnetic field changes over time, in which each bead is divided into a plurality of triangular pyramid or triangular elements, a vector potential at an observation point included in a virtual space is described as a function of an electromagnetic physical quantity in a minute region in the analysis object and a distance from the minute region to the observation point, and the induced magnetic field at the observation point is obtained by numerically volume-integrating or surface-integrating the function of the vector potential for each of the elements obtained by division.
    Type: Application
    Filed: January 20, 2022
    Publication date: July 21, 2022
    Inventor: Shuji Miyazaki
  • Patent number: 10967414
    Abstract: A forming device that expands a metal pipe material to form a metal pipe includes a die that has an upper die and a lower die, at least one of which is movable, and that form the metal pipe, an electrode that energizes the metal pipe material to heat the metal pipe material, a gas supply part that supplies a gas into the heated metal pipe material to expand the metal pipe material, and a die movement suppressing part that suppresses the movement of the die by an electromagnetic force at least when the energization to the metal pipe material is performed by the electrode.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: April 6, 2021
    Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Masayuki Saika, Masayuki Ishizuka, Norieda Ueno, Shuji Miyazaki, Koji Moritani, Taizo Yamamoto
  • Patent number: 10922378
    Abstract: A change in a current flowing through a current path when a voltage applied to the path is changed is simulated in a system including the path and a member that is acted upon by the current flowing through the path and affects the current flowing through the path. First, the path and the member are represented by aggregates of a plurality of particles. Electromagnetic action from the other particles to each of the plurality of particles configuring the path is calculated based on a current value at a present time of the current flowing through the path and a voltage value of an external voltage applied to the path. The current flowing through the path is calculated based on a calculation result of the electromagnetic action to update the current value flowing through the path from the value at the present time to a value obtained by a calculation.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: February 16, 2021
    Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventor: Shuji Miyazaki
  • Publication number: 20200400757
    Abstract: A magnetic field analysis device includes a magnetization application unit that divides a virtual space into a plurality of volume elements and applies magnetization to each of the volume elements, and a magnetic field calculation unit that calculates, on each of a plurality of observation points in the virtual space, based on the magnetization applied to a plurality of the volume elements around the observation point, a magnetic field generated at the observation point for each volume element and obtains a magnetic field generated at each of the plurality of the observation points based on a calculation result of each of the plurality of the volume elements.
    Type: Application
    Filed: September 4, 2020
    Publication date: December 24, 2020
    Inventor: Shuji Miyazaki
  • Publication number: 20200134111
    Abstract: A value of a parameter defining a linear term and a value of a parameter defining a nonlinear term of an interaction potential between particles determined according to a material to be simulated and an initial condition of a particle disposition are input to an input unit. A processing unit analyzes behavior of the particles by a molecular dynamics method using the interaction potential defined by the values of the parameters input to the input unit and based on the initial condition input to the input unit.
    Type: Application
    Filed: September 10, 2019
    Publication date: April 30, 2020
    Inventors: Yoshitaka Ohnishi, Shuji Miyazaki
  • Patent number: 10379081
    Abstract: An analyzer includes a magnetic moment application unit configured to apply a magnetic moment to a particle system defined in a virtual space, a magnetic field calculation unit configured to calculate a magnetic physical quantity related to the particle system including particles, to which the magnetic moment is applied by the magnetic moment application unit, and a particle state calculation unit configured to numerically calculate a governing equation, which governs the movement of each particle, using the calculation result in the magnetic field calculation unit. The magnetic field calculation unit numerically calculates an induction magnetic field using induced magnetization induced in each particle due to a time variation in an external magnetic field and a magnetic field obtained by interaction between magnetic moments based on the induced magnetization.
    Type: Grant
    Filed: October 27, 2014
    Date of Patent: August 13, 2019
    Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Shuji Miyazaki, Daiji Ichishima
  • Publication number: 20190197081
    Abstract: A change in a current flowing through a current path when a voltage applied to the path is changed is simulated in a system including the path and a member that is acted upon by the current flowing through the path and affects the current flowing through the path. First, the path and the member are represented by aggregates of a plurality of particles. Electromagnetic action from the other particles to each of the plurality of particles configuring the path is calculated based on a current value at a present time of the current flowing through the path and a voltage value of an external voltage applied to the path. The current flowing through the path is calculated based on a calculation result of the electromagnetic action to update the current value flowing through the path from the value at the present time to a value obtained by a calculation.
    Type: Application
    Filed: December 18, 2018
    Publication date: June 27, 2019
    Inventor: Shuji Miyazaki
  • Patent number: 10311176
    Abstract: A coupled simulation of a structural-elastic phenomenon and a heat conduction phenomenon of a simulation target including plural particles is performed. Here, numerical calculation of a motion equation capable of being transformed into an equation of the same form as that of a heat conduction equation is performed with respect to a term of a spatial temperature distribution and a term of a derivative of temperature with respect to time, to perform a simulation of the heat conduction phenomenon of the simulation target.
    Type: Grant
    Filed: August 23, 2016
    Date of Patent: June 4, 2019
    Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Yoshitaka Ohnishi, Daiji Ichishima, Shuji Miyazaki
  • Publication number: 20180221933
    Abstract: A forming device that expands a metal pipe material to form a metal pipe includes a die that has an upper die and a lower die, at least one of which is movable, and that form the metal pipe, an electrode that energizes the metal pipe material to heat the metal pipe material, a gas supply part that supplies a gas into the heated metal pipe material to expand the metal pipe material, and a die movement suppressing part that suppresses the movement of the die by an electromagnetic force at least when the energization to the metal pipe material is performed by the electrode.
    Type: Application
    Filed: February 2, 2018
    Publication date: August 9, 2018
    Inventors: Masayuki Saika, Masayuki Ishizuka, Norieda Ueno, Shuji Miyazaki, Koji Moritani, Taizo Yamamoto
  • Publication number: 20170068759
    Abstract: A coupled simulation of a structural-elastic phenomenon and a heat conduction phenomenon of a simulation target including plural particles is performed. Here, numerical calculation of a motion equation capable of being transformed into an equation of the same form as that of a heat conduction equation is performed with respect to a term of a spatial temperature distribution and a term of a derivative of temperature with respect to time, to perform a simulation of the heat conduction phenomenon of the simulation target.
    Type: Application
    Filed: August 23, 2016
    Publication date: March 9, 2017
    Inventors: Yoshitaka Ohnishi, Daiji Ichishima, Shuji Miyazaki
  • Patent number: 9322886
    Abstract: An analyzer comprises a particle system acquisition unit operative to acquire information on a particle system defined in a virtual space; a magnetic moment association unit operative to associate a particle in the particle system with a magnetic moment; a numerical operation unit operative to perform numerical operation according to a governing equation that governs a motion of each particle in the particle system, the particle system including the particle which is associated with the magnetic moment by the magnetic moment association unit; and a magnetic field calculation unit operative to calculate a magnetic field created by the particle system using the results of the numerical operation performed by the numerical operation unit.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: April 26, 2016
    Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Daiji Ichishima, Shuji Miyazaki
  • Publication number: 20150127283
    Abstract: An analyzer includes a magnetic moment application unit configured to apply a magnetic moment to a particle system defined in a virtual space, a magnetic field calculation unit configured to calculate a magnetic physical quantity related to the particle system including particles, to which the magnetic moment is applied by the magnetic moment application unit, and a particle state calculation unit configured to numerically calculate a governing equation, which governs the movement of each particle, using the calculation result in the magnetic field calculation unit. The magnetic field calculation unit numerically calculates an induction magnetic field using induced magnetization induced in each particle due to a time variation in an external magnetic field and a magnetic field obtained by interaction between magnetic moments based on the induced magnetization.
    Type: Application
    Filed: October 27, 2014
    Publication date: May 7, 2015
    Inventors: Shuji Miyazaki, Daiji Ichishima
  • Publication number: 20130231879
    Abstract: An analyzer comprises a particle system acquisition unit operative to acquire information on a particle system defined in a virtual space; a magnetic moment association unit operative to associate a particle in the particle system with a magnetic moment; a numerical operation unit operative to perform numerical operation according to a governing equation that governs a motion of each particle in the particle system, the particle system including the particle which is associated with the magnetic moment by the magnetic moment association unit; and a magnetic field calculation unit operative to calculate a magnetic field created by the particle system using the results of the numerical operation performed by the numerical operation unit.
    Type: Application
    Filed: March 1, 2013
    Publication date: September 5, 2013
    Applicant: SUMITOMO HEAVY INDUSTRIES, LTD.
    Inventors: Daiji Ichishima, Shuji Miyazaki
  • Patent number: 7043391
    Abstract: The present invention is a user interface of the semiconductor evaluation device, which evaluates the characteristics of the semiconductor elements on a wafer. This user interface provides means on which a setting window is displayed in order to conduct the setting of the measurement conditions to each setting object having a hierarchical relation, means on which a main setting window is displayed to manage the setting window, means to save in a file the measurement conditions set in the setting window, and means to load the measurement conditions that are set in the first setting window for the first setting object and saved in a file for the second setting window to the second setting object, which is located at higher level than the first setting window and is able to set up selectively to the user the measurement conditions loaded in the second setting window.
    Type: Grant
    Filed: February 8, 2002
    Date of Patent: May 9, 2006
    Inventor: Shuji Miyazaki
  • Publication number: 20040122605
    Abstract: The present invention is a user interface of the semiconductor evaluation device, which evaluates the characteristics of the semiconductor elements on a wafer. This user interface provides means on which a setting window is displayed in order to conduct the setting of the measurement conditions to each setting object having a hierarchical relation, means on which a main setting window is displayed to manage the setting window, means to save in a file the measurement conditions set in the setting window, and means to load the measurement conditions that are set in the first setting window for the first setting object and saved in a file for the second setting window to the second setting object, which is located at higher level than the first setting window and is able to set up selectively to the user the measurement conditions loaded in the second setting window.
    Type: Application
    Filed: October 29, 2003
    Publication date: June 24, 2004
    Inventor: Shuji Miyazaki
  • Patent number: 6335278
    Abstract: The present invention provides a method of carrying out a hydrogen anneal to a substrate having an interface between different materials provided that an annealing temperature is maintained higher than a hydrogen-eliminating initiation temperature, wherein a temperature of a furnace is controlled to be not higher than the hydrogen-eliminating initiation temperature until the substrate is taken out from the furnace after the hydrogen anneal is carried out.
    Type: Grant
    Filed: December 7, 1999
    Date of Patent: January 1, 2002
    Assignee: NEC Corporation
    Inventor: Shuji Miyazaki
  • Publication number: 20010046750
    Abstract: A method includes the step of forming a silicon oxide film and a silicon nitride film having an opening for exposing a portion of a silicon substrate, etching the portion of the silicon substrate to form a device isolation trench, widening the opening only at the silicon nitride film, thermally oxidizing the inner surface of the device isolation trench to form a thermal oxide film, depositing another silicon oxide film for filling the opening and the device isolation trench, etching the top portion of the another silicon oxide film and then the silicon nitride film, and polishing the another silicon oxide film and the silicon oxide film to obtain flat surfaces of the another silicon oxide film, the thermal oxide film and the silicon substrate.
    Type: Application
    Filed: May 23, 2001
    Publication date: November 29, 2001
    Inventors: Shuji Miyazaki, Kensuke Okonogi
  • Patent number: 6258640
    Abstract: A well region is formed in a semiconductor substrate, the surface of the semiconductor substrate is thermally oxidized to thereby form a device isolation insulating film, impurities are injected into the semiconductor substrate to form a guard ring immediately below the device isolation insulating film and then the RTA is conducted to rapidly heat the semiconductor substrate at a temperature higher than that for thermal oxidation. Thereafter, a MOS transistor and a capacitor are formed by, for example, injecting impurities into the semiconductor substrate and then hydrogen sintering as an interface trapped state lowering treatment is conducted. Since the crystal defects are repaired by the RTA without affecting the impurity profile and the interface trapped state is reduced by the interface trapped state lowering treatment, leak current on the device isolation insulating film is reduced.
    Type: Grant
    Filed: July 14, 1999
    Date of Patent: July 10, 2001
    Assignee: NEC Corporation
    Inventor: Shuji Miyazaki