Patents by Inventor Shuji Mochizuki
Shuji Mochizuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20060161695Abstract: A direct memory access system has a DMA setting decoding portion 17 and a DMA clock/reset control portion 18. The DMA setting decoding portion 17 acquires various pieces of DMA data transfer control information including a data transfer length and a data transfer target from information set in a DMA controller 2, and determines not-operative circuit portions uninvolved in the DMA data transfer based on the DMA data transfer control information. The DMA clock/reset control portion 18 controls suspension of clock supply to the not-operative circuit portions at the timing of start of the DMA data transfer and resumption of the clock supply at the timing of termination of the DMA data transfer. The DMA setting decoding portion 17 detects the start of the DMA data transfer and calculates the timing of resumption of clock supply during suspension of the clock supply based on the DMA data transfer control information. Thus, the clock supply timing is controlled.Type: ApplicationFiled: December 16, 2005Publication date: July 20, 2006Inventors: Shuji Mochizuki, Kazushi Hayashi
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Patent number: 6710260Abstract: In a manufacturing method of a printed circuit board comprising a process of forming a circuit pattern on the surface of the base substrate (13) of which surface is at least composed of an insulative material, a process of forming the insulative layer (15) composed of mixed composites of more than two kinds of organic resins having a different etching rate by a dry etching process on the surface of the base substrate (13) including the circuit pattern, a process of perforating the hole (17) on the insulative layer (15) by a laser beam, a process of roughing the surface of the insulative layer (15) by a dry etching process, a process of forming the conductive film (19) for a foundation of an electroplating process by a vacuum film forming method and a process of forming the conductive layer (20) on the conductive film (19) by an electroplating process so as to connect the conductive layer (20) with the circuit pattern (14) electrically.Type: GrantFiled: March 29, 2000Date of Patent: March 23, 2004Assignee: Victor Company of Japan, Ltd.Inventors: Yasuaki Seki, Takashi Ito, Shuji Mochizuki
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Patent number: 6613987Abstract: Herein is disclosed an insulating resin composition for a multilayer printed-wiring board, comprising two or more kinds of resins which are different in etching rate by plasma treatment and which are not compatible with each other, so that the surface of the resulting insulating layer can be made uneven by the plasma treatment, whereby the bonding strength of the conductor layer to the said resulting insulating layer can be ensured, and heat resistance and electrically insulating properties required can be satisfied.Type: GrantFiled: March 31, 2000Date of Patent: September 2, 2003Assignee: Ajinomoto Co., Inc.Inventors: Yasuaki Seki, Takashi Ito, Shuji Mochizuki, Kiyonori Furuta, Toshihiko Hatajima
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Publication number: 20030007332Abstract: Herein is disclosed an insulating resin composition for a multilayer printed-wiring board, comprising two or more kinds of resins which are different in etching rate by plasma treatment and which are not compatible with each other, so that the surface of the resulting insulating layer can be made uneven by the plasma treatment, whereby the bonding strength of the conductor layer to the said resulting insulating layer can be ensured, and heat resistance and electrically insulating properties required can be satisfied.Type: ApplicationFiled: March 31, 2000Publication date: January 9, 2003Inventors: Yasuaki Seki, Takashi Ito, Shuji Mochizuki, Kiyonori Furuta, Toshihiko Hatajima
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Patent number: 5716534Abstract: A plasma etching apparatus includes a process chamber that can be set at a reduced pressure. A lower electrode on which a semiconductor wafer is placed and an upper electrode opposing the lower electrode are disposed in the process chamber. The lower and upper electrodes are connected to RF power supplies, respectively. First and second RF powers, the phases and power ratio of which are separately controlled, can be applied to the upper and lower electrodes. Parameters including the frequencies, power values, and relative phases of the first and second RF powers are selected in order to set the etching characteristics, e.g., an etching rate, the planar uniformity of the etching rate, the etching selectivity ratio and the like to predetermined values. During etching, the first and second RF powers are monitored by separate detectors, and are maintained at initial preset values through a controller.Type: GrantFiled: November 29, 1995Date of Patent: February 10, 1998Assignee: Tokyo Electron LimitedInventors: Hiroshi Tsuchiya, Yoshio Fukasawa, Shuji Mochizuki, Yukio Naito, Kosuke Imafuku
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Patent number: 5539274Abstract: An electron beam excited plasma system is provided with a first auxiliary electrode for initial discharge, an anode having an opening, a cathode, having an opening and located between the anode and the first auxiliary electrode, for producing an initial discharge between the first auxiliary electrode and the cathode, and for producing a plasma-generating discharge between the anode and the cathode, a second auxiliary electrode, having an opening and located between the cathode and the anode, for facilitating the generation of the discharge plasma between the cathode and the anode, a gas supply device for supplying a discharge plasma-generating gas into the region between the cathode and the anode, and magnetic field generator for generating a magnetic field and for applying this magnetic field to the region between the cathode and the anode, such that a cusp magnetic field is generated in the vicinity of the cathode.Type: GrantFiled: September 7, 1994Date of Patent: July 23, 1996Assignees: Tokyo Electron Limited, Tokyo Electron Yamanashi LimitedInventors: Youichi Araki, Kazuya Nagaseki, Shuji Mochizuki
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Patent number: 5041508Abstract: An anaerobic composition comprising a polymerizable monomer having at least one ethylenic double bond, a free radical initiator and at least one azole compound.Type: GrantFiled: December 21, 1990Date of Patent: August 20, 1991Assignee: Three Bond Co., Ltd.Inventors: Katsunori Haruna, Shuji Mochizuki, Atsushi Okuma
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Patent number: 4985523Abstract: An anaerobically curing adhesive sealing composition comprising (A) a mono(meth)acrylate monomer represented by formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group; and R.sub.2 represents ##STR2## and (B) a (meth)acrylate prepolymer having a urethane structure in the main chain thereof and having an average molecular weight of 10,000 or more and further containing (C) a (meth)acrylate prepolymer having a urethane structure in the main chain thereof and an average molecular weight of at most 5,000. The sealing composition exhibits, upon curing, excellent elasticity and properties to follow an adherend while retaining excellent resistance to oil and heat as possessed by acrylate type reactive sealing compositions.Type: GrantFiled: August 28, 1989Date of Patent: January 15, 1991Assignee: Three Bond Co., Ltd.Inventors: Shuji Mochizuki, Atsushi Okuma, Katsunori Haruna
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Patent number: 4958169Abstract: A laser recorder applicable to computer output microfilm recording apparatus comprises: a housing, a film feed unit having a film cassette loaded with a rolled heat development film; a film take-up unit for taking up the heat development film on a reel or on a tray, including a film storing mechanism for storing cut films sequentially; a main driving unit for driving the heat development film for advancing at a fixed speed for auxiliary scanning for recording image information on the heat development film, including a slackened film relief mechanism for eliminating slackened film around the main driving unit and a stepping motor driving current control circuit for driving the main driving unit at a low and fixed speed; loop detectors for preventing film feed force and film delivery force from working on the main driving unit, an image information recording unit for main scanning, having a laser optical system for scanning the heat development film across the width thereof to record image information recordedType: GrantFiled: September 26, 1988Date of Patent: September 18, 1990Assignees: Minolta Camera Kabushiki Kaisha, Nisca CorporationInventors: Akiyoshi Hamada, Mitsutoshi Yagoto, Yutaka Watanabe, Shuji Mochizuki, Masayuki Mino, Yutaka Tanaka, Kyoji Tachikawa
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Patent number: 4814793Abstract: A laser recorder applicable to computer output microfilm recording apparatus comprises: a housing, a film feed unit having a film cassette loaded with a rolled heat development film; a film take-up unit for taking up the heat development film on a reel or on a tray, including a film storing mechanism for storing cut films sequentially; a main driving unit for driving the heat development film for advancing at a fixed speed for auxiliary scanning for recording image information on the heat development film, including a slackened film relief mechanism for eliminating slackened film around the main driving unit and a stepping motor driving current control circuit for driving the main driving unit at a low and fixed speed; loop detectors for preventing film feed force and film delivery force from working on the main driving unit, an image information recording unit for main scanning, having a laser optical system for scanning the heat development film across the width thereof to record image information recordedType: GrantFiled: April 21, 1987Date of Patent: March 21, 1989Assignees: Minolta Camera Kabushiki Kaisha, Nippon Seimitsu Kogyo Kabushiki KaishaInventors: Akiyoshi Hamada, Mitsutoshi Yagoto, Yutaka Watanabe, Shuji Mochizuki, Masayuki Mino, Yutaka Tanaka, Kyoji Tachikawa
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Patent number: 4812497Abstract: An anaerobically curable composition having a good stability and suitable for use primarily as an adhesive, which comprises a radically polymerizable acrylate and/or methacrylate monomer, and a naphthyl azoxine. The composition is satisfactorily stable even if a large amount of an inorganic filler is used therein.Type: GrantFiled: November 4, 1987Date of Patent: March 14, 1989Assignee: Three Bond Co. Ltd.Inventor: Shuji Mochizuki