Patents by Inventor Shuji Osono

Shuji Osono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10000850
    Abstract: A catalytic chemical vapor deposition apparatus comprising a catalyst wire including a tantalum wire and a boride layer formed on a surface of the tantalum wire is used. The boride of the metal tantalum (tantalum boride) is harder than the metal tantalum. Therefore, by using the tantalum wire having the boride layer formed on the surface thereof as a catalyst wire, it is possible to reduce thermal expansion of the catalyst wire, improve mechanical strength, and prolong the service life. Further, by performing energization heating of the catalyst wire by continuous energization, it is further possible to prolong the service life of the catalyst wire.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: June 19, 2018
    Assignee: Ulvac, Inc.
    Inventors: Shuji Osono, Masanori Hashimoto, Shin Asari
  • Patent number: 9851453
    Abstract: A radiological image conversion panel, having a phosphor layer containing therein a fluorescent substance which emits light through radiation exposure, is manufactured by forming the fluorescent substance into respective columnar structures on one of surfaces of a substrate to thereby obtain a phosphor layer made up of a group of columnar structures. The panel is subsequently manufactured by forming reflection films by respectively covering an outer surface of each of the columnar structures with a reflection film while leaving a gap between respective adjoining columnar structures, the reflection film being arranged to reflect light of a predetermined wavelength. In case a refractive index of the gap is lower than a refractive index of the columnar structures, the reflection films are formed of an inorganic material having a higher refractive index than the refractive index of the columnar structures.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: December 26, 2017
    Assignee: ULVAC, INC.
    Inventors: Kazuhiro Honda, Shuji Osono, Hideaki Zama
  • Publication number: 20160060764
    Abstract: A catalytic chemical vapor deposition apparatus comprising a catalyst wire including a tantalum wire and a boride layer formed on a surface of the tantalum wire is used. The boride of the metal tantalum (tantalum boride) is harder than the metal tantalum. Therefore, by using the tantalum wire having the boride layer formed on the surface thereof as a catalyst wire, it is possible to reduce thermal expansion of the catalyst wire, improve mechanical strength, and prolong the service life. Further, by performing energization heating of the catalyst wire by continuous energization, it is further possible to prolong the service life of the catalyst wire.
    Type: Application
    Filed: November 12, 2015
    Publication date: March 3, 2016
    Inventors: Shuji OSONO, Masanori HASHIMOTO, Shin ASARI
  • Publication number: 20150338528
    Abstract: A radiological image conversion panel, having a phosphor layer containing therein a fluorescent substance which emits light through radiation exposure, is manufactured by forming the fluorescent substance into respective columnar structures on one of surfaces of a substrate to thereby obtain a phosphor layer made up of a group of columnar structures. The panel is subsequently manufactured by forming reflection films by respectively covering an outer surface of each of the columnar structures with a reflection film while leaving a gap between respective adjoining columnar structures, the reflection film being arranged to reflect light of a predetermined wavelength. In case a refractive index of the gap is lower than a refractive index of the columnar structures, the reflection films are formed of an inorganic material having a higher refractive index than the refractive index of the columnar structures.
    Type: Application
    Filed: May 15, 2015
    Publication date: November 26, 2015
    Applicant: ULVAC, INC.
    Inventors: Kazuhiro Honda, Shuji Osono, Hideki Zama
  • Patent number: 8957351
    Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: February 17, 2015
    Assignees: SANYO Electric Co., Ltd., ULVAC, Inc.
    Inventors: Masaki Shima, Yoshinori Wakamiya, Shuji Osono, Satohiro Okayama, Hideyuki Ogata
  • Publication number: 20120190176
    Abstract: In a catalytic CVD equipment, the control unit controls a temperature of the catalytic wires to a standby temperature at predetermined time intervals before and after the film is formed. The standby time is a predetermined temperature which is lower than the temperature of the catalytic wires when the film is formed, and is higher than room temperature.
    Type: Application
    Filed: March 30, 2012
    Publication date: July 26, 2012
    Applicants: ULVAC, INC., SANYO ELECTRIC CO., LTD.
    Inventors: Motohide KAI, Shuji OSONO, Satohiro OKAYAMA, Hideyuki OGATA
  • Publication number: 20120190149
    Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.
    Type: Application
    Filed: March 30, 2012
    Publication date: July 26, 2012
    Applicants: ULVAC, INC., SANYO ELECTRIC CO., LTD.
    Inventors: Masaki SHIMA, Yoshinori WAKAMIYA, Shuji OSONO, Satohiro OKAYAMA, Hideyuki OGATA
  • Publication number: 20120145184
    Abstract: A self-cleaning catalytic chemical vapor deposition apparatus which suppresses the corrosion-induced degradation of a catalytic body by a cleaning gas without heating a catalytic body to not less than 2000° C. and permits practical cleaning rates and good cleaning at low cost. Conductors supply a constant current to a catalytic body within a reaction chamber from a heating power supply. Terminals of the heating power supply are electrically insulated from the reaction chamber. A cleaning gas containing halogen elements is introduced into the evacuated reaction chamber. The catalytic body is heated by the heating power supply. An active species generated by this heating reacts with an adhering film adhered to the interior of the reaction chamber, which is removed. During this removal, a DC bias voltage with appropriate polarity and appropriate value is applied from a constant-voltage power supply to the conductor of the heating power supply.
    Type: Application
    Filed: February 16, 2012
    Publication date: June 14, 2012
    Applicant: ULVAC, INC.
    Inventors: Makiko KITAZOE, Shuji Osono, Hiromi Itoh, Kazuya Saito, Shin Asari
  • Publication number: 20110232573
    Abstract: [Object] To provide a catalytic chemical vapor deposition apparatus capable of prolonging the service life of a catalyst wire. [Solving Means] In a catalytic chemical vapor deposition apparatus (1) according to the present invention, a catalyst wire (6) including a tantalum wire and a boride layer formed on a surface of the tantalum wire is used. The boride of the metal tantalum (tantalum boride) is harder than the metal tantalum. Therefore, by using the tantalum wire having the boride layer formed on the surface thereof as a catalyst wire, it is possible to reduce thermal expansion of the catalyst wire, improve mechanical strength, and prolong the service life. Further, by performing energization heating of the catalyst wire (6) by continuous energization, it is further possible to prolong the service life of the catalyst wire (6).
    Type: Application
    Filed: December 9, 2008
    Publication date: September 29, 2011
    Applicant: ULVAC, INC.
    Inventors: Shuji Osono, Masanori Hashimoto, Shin Asari
  • Publication number: 20070209677
    Abstract: Provided is a self-cleaning catalytic chemical vapor deposition apparatus which suppresses the corrosion-induced degradation of a catalytic body by a cleaning gas without heating a catalytic body to not less than 2000° C. and permits practical cleaning rates and good cleaning at low cost. With conductors 5a, 5b which supply a constant current to a catalytic body 4 within a reaction chamber 2 from a heating power supply 6 and terminals 6a, 6b of the heating power supply 6 kept electrically insulated from the reaction chamber 2, a cleaning gas containing halogen elements is introduced into the reaction chamber 2 which has been evacuated, and the catalytic body 4 is heated by the energization from the heating power supply 6. An active species generated by this heating is caused to react with an adhering film which adheres to the interior of the reaction chamber 2, whereby the adhering film is removed.
    Type: Application
    Filed: March 10, 2005
    Publication date: September 13, 2007
    Inventors: Makiko Kitazoe, Shuji Osono, Hiromi Itoh, Kazuya Saito, Shin Asari