Patents by Inventor Shuji Takahashi

Shuji Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200066494
    Abstract: A film forming device includes an adhesion preventing mechanism in a film formation chamber, in which the adhesion preventing mechanism is configured with a plurality of adhesion preventing plates including at least a substrate edge adhesion preventing plate that is provided on an edge of a region on the substrate holding portion where the substrate is provided and a substrate outer peripheral region adhesion preventing plate that is disposed on an outer periphery of the substrate edge adhesion preventing plate to be spaced from the substrate edge adhesion preventing plate, a potential adjusting mechanism that is electrically connected to any one of the substrate edge adhesion preventing plate or the substrate outer peripheral region adhesion preventing plate is provided, and the adhesion preventing plate connected to the potential adjusting mechanism and an adhesion preventing plate disposed adjacent thereto are disposed at an interval of 0.5 mm to 3.0 mm.
    Type: Application
    Filed: October 31, 2019
    Publication date: February 27, 2020
    Inventors: Naoki MURAKAMI, Shuji TAKAHASHI
  • Publication number: 20190353227
    Abstract: A tensioner includes a power spring, and a backup member being in contact with the power spring and supporting the power spring by acting an urging force in a direction opposite to a radial shift of the power spring in a direction in which the power spring is wound. The power spring is unwound in a condition in which an inter-plate frictional force of the power spring is small in a case where an urging force acting from a power spring to a tension member is greater than a load acting from the tensioner arm to the power spring and the power spring is wound in a condition in which the inter-plate frictional force of the power spring is large in a case where the urging force acting from the power spring to the tension member is smaller than the load acting from the tension member to the power spring.
    Type: Application
    Filed: August 1, 2019
    Publication date: November 21, 2019
    Inventors: Hideaki SEKI, Yoshio YAMADA, Takao KOBAYASHI, Kazuhito HIRAOKA, Shuji TAKAHASHI
  • Patent number: 10464327
    Abstract: There are provided an inkjet recording device that can stably secure liquid-repellent performance on a surface of a liquid-repellent film formed on a nozzle surface for a long term, and a maintenance method thereof. The inkjet recording device includes: an inkjet head that has a nozzle surface in which a nozzle opening of a nozzle to eject a liquid is formed and on which a liquid-repellent film is formed with an amorphous fluorine resin material; a cleaning portion that wipes off and cleans a surface of the liquid-repellent film by a wiping member; and a liquid-repellent performance recovery processing portion that performs liquid-repellent performance recovery processing to recover liquid-repellent performance on the surface of the liquid-repellent film by heating the liquid-repellent film.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: November 5, 2019
    Assignee: FUJIFILM Corporation
    Inventor: Shuji Takahashi
  • Patent number: 9933008
    Abstract: A rack-and-pinion type steering device includes a ball joint for connecting a rack shaft and a tie rod. The ball joint includes a socket and a ball. The socket is provided with a regulated surface allowed to contact a regulating surface of a rack housing, and a screw projecting from the regulated surface to be connected to the rack shaft. The regulated surface includes an intermediate portion having a curved surface shape that recedes from a regulating surface in a longitudinal direction of the rack shaft toward the outer circumference, and the regulated surface has such a shape that a pointed portion toward the regulating surface is less likely to be formed on the regulated surface even if a processing error occurs in the processing for forming the regulated surface of the socket.
    Type: Grant
    Filed: April 22, 2015
    Date of Patent: April 3, 2018
    Assignee: JTEKT CORPORATION
    Inventors: Shuji Takahashi, Akihiro Toshima
  • Publication number: 20170300908
    Abstract: A commodity sales data processing apparatus comprises a commodity sales module configured to execute a commodity sales processing relating to payment of a validation commodity of which a PIN (Personal Identification Number) code is validated at the time the payment is confirmed; a sending module configured to send identification information capable of identifying the validation commodity after the payment is confirmed in the commodity sales module; a receiving module configured to receive validation commodity information read by an information processing apparatus that sends the PIN code to a server of a company that provides a sales item in order to receive the sales item indicated by the validation commodity identified by the identification information sent from the sending module; and a writing module configured to write the validation commodity information received by the receiving module in an IC (Integrated Circuit) tag on the validation commodity.
    Type: Application
    Filed: April 14, 2016
    Publication date: October 19, 2017
    Inventors: Seiji Ishikawa, Shinya Namura, Masato Oishi, Shuji Takahashi
  • Publication number: 20170253995
    Abstract: A method for heat-treating a silicon single crystal wafer by an RTA treatment, including: putting a silicon single crystal wafer having an Nv region for the entire plane of the silicon single crystal wafer or an Nv region containing an OSF region for the silicon single crystal wafer entire plane into an RTA furnace, performing pre-heating at temperature lower than temperature at which silicon reacts with NH3 while supplying gas that contains NH3 into the RTA furnace, subsequently stopping the supply of the gas containing NH3 and starting supply of Ar gas to start an RTA treatment under Ar gas atmosphere in which the NH3 gas remains. This provide a method for heat-treating a silicon single crystal wafer that give gettering capability without degrading TDDB properties even to a silicon single crystal wafer in which the entire plane is an Nv region or an Nv region containing an OSF region.
    Type: Application
    Filed: September 17, 2015
    Publication date: September 7, 2017
    Applicant: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Wei Feng QU, Fumio TAHARA, Masahiro SAKURADA, Shuji TAKAHASHI
  • Patent number: 9600224
    Abstract: According to one embodiment, a commodity information browsing system includes a shelf label apparatus including a first storing section and a first transmitting section, a portable terminal including a first receiving section, a notifying section, a second receiving section, and a display section, and a server apparatus including a second storing section and a second transmitting section. The first transmitting section transmits, by radio, one shelf label code among a plurality of shelf label codes. The notifying section notifies the server apparatus of the shelf label code. The second storing section stores association information representing a relation between the shelf label codes and commodity information. The second transmitting section determines, on the basis of the association information, the commodity information associated with the notified shelf label code and transmits the relevant commodity information to the portable terminal.
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: March 21, 2017
    Assignee: TOSHIBA TEC KABUSHIKI KAISHA
    Inventors: Seiji Ishikawa, Shuji Takahashi, Kenya Suzuki, Ryu Morita, Hiroki Mochizuki, Yoshihiko Ikeda, Kazuya Nambu, Kazunari Kogure
  • Patent number: 9390905
    Abstract: A method for manufacturing a silicon substrate, including: performing a rapid heat treatment to a silicon substrate with a rapid-heating and rapid-cooling apparatus by maintaining the silicon substrate at a temperature that is higher than 1300° C. and not greater than a silicon melting point for 1 to 60 seconds, the silicon substrate being sliced from a silicon single crystal ingot grown by the Czochralski method; performing a first temperature decrease process down to a temperature in the range of 600 to 800° C. at a temperature decrease rate of 5 to 150° C./sec; and performing a second temperature decrease process in such a manner that a cooling time of X seconds and a temperature decrease rate of Y° C./sec meet Y?0.15X-4.5 when X<100 and meet Y?10 when X?100.
    Type: Grant
    Filed: February 2, 2012
    Date of Patent: July 12, 2016
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Tetsuya Oka, Koji Ebara, Shuji Takahashi
  • Publication number: 20150330440
    Abstract: A rack-and-pinion type steering device includes a ball joint for connecting a rack shaft and a tie rod. The ball joint includes a socket and a ball. The socket is provided with a regulated surface allowed to contact a regulating surface of a rack housing, and a screw projecting from the regulated surface to be connected to the rack shaft. The regulated surface includes an intermediate portion having a curved surface shape that recedes from a regulating surface in a longitudinal direction of the rack shaft toward the outer circumference, and the regulated surface has such a shape that a pointed portion toward the regulating surface is less likely to be formed on the regulated surface even if a processing error occurs in the processing for forming the regulated surface of the socket.
    Type: Application
    Filed: April 22, 2015
    Publication date: November 19, 2015
    Inventors: Shuji TAKAHASHI, Akihiro TOSHIMA
  • Publication number: 20150248863
    Abstract: According to one embodiment, a commodity information browsing system includes a shelf label apparatus including a first storing section and a first transmitting section, a portable terminal including a first receiving section, a notifying section, a second receiving section, and a display section, and a server apparatus including a second storing section and a second transmitting section. The first transmitting section transmits, by radio, one shelf label code among a plurality of shelf label codes. The notifying section notifies the server apparatus of the shelf label code. The second storing section stores association information representing a relation between the shelf label codes and commodity information. The second transmitting section determines, on the basis of the association information, the commodity information associated with the notified shelf label code and transmits the relevant commodity information to the portable terminal.
    Type: Application
    Filed: February 25, 2015
    Publication date: September 3, 2015
    Inventors: Seiji Ishikawa, Shuji Takahashi, Kenya Suzuki, Ryu Morita, Hiroki Mochizuki, Yoshihiko Ikeda, Kazuya Nambu, Kazunari Kogure
  • Patent number: 9024987
    Abstract: A receipt issuing apparatus includes a conveying unit conveys a receipt paper which consists of a strip-shaped thermal recording paper and on which pieces of promotion-related information are pre-printed at predetermined positions which are arranged at regular intervals in the longitudinal direction of the receipt paper, a thermal printing unit prints the detail data of a commodity transaction on the receipt paper conveyed by the conveying unit by thermal printing, a mask printing control unit overprints a mask data for hiding the information over the information printed on the receipt paper by the thermal printing unit and an issuing control unit issues a receipt by cutting off the receipt paper on which mask data is printed by the mask printing control unit at a position more upstream than the printing position of the mask data in the conveying direction of the conveying unit.
    Type: Grant
    Filed: June 27, 2013
    Date of Patent: May 5, 2015
    Assignee: Toshiba Tec Kabushiki Kaisha
    Inventor: Shuji Takahashi
  • Publication number: 20140224427
    Abstract: A dry etching apparatus according to an aspect of the present invention is provided with a stage on which a substrate including a resist mask on an outermost layer thereof is mounted; a clamp for holding down the substrate from above the resist mask to fix the substrate on the stage; a chamber within which the stage and the clamp are housed; an exhaust device which evacuates the chamber; a process gas supply device which supplies a process gas into the chamber; and a power supply for supplying electrical power used to generate plasma within the chamber, wherein the clamp has an annular structure for covering an entire outer circumference and side surface of the substrate, and an antiadhesion layer composed of an inorganic film for preventing an adhesion of a resist material is formed on the contact surface side of the clamp in contact with the substrate.
    Type: Application
    Filed: February 14, 2014
    Publication date: August 14, 2014
    Applicant: FUJIFILM CORPORATION
    Inventor: Shuji TAKAHASHI
  • Patent number: 8705936
    Abstract: A video data recording device for sufficiently protecting privacy even before a mask target enters into a screen. The video data recording device includes a reference information storage unit in which reference information including predetermined features is recorded; a video data acquisition unit which acquires video data and sequentially outputs the video data to a video buffer; a similarity determining unit which compares newest video data and the reference information, and extracts partial information determined to be similar to the reference information from the newest video data; a relation determining unit which compares video data output to the video buffer before the newest video data, and the partial information determined to be similar, and extracts partial information determined to be related to the partial information determined to be similar; and an imaging recording I/F unit which records the video data and the related information related to the partial information in a recording medium.
    Type: Grant
    Filed: March 18, 2010
    Date of Patent: April 22, 2014
    Assignee: JVC Kenwood Corporation
    Inventors: Shuji Takahashi, Yasuhiro Ueki
  • Patent number: 8685763
    Abstract: A method of manufacturing a nozzle plate includes: a mask pattern layer forming step of, with respect to a laminated substrate constituted of a first silicon substrate having a (111) surface orientation and a second silicon substrate having a (100) surface orientation, forming a frame-shaped mask pattern layer on the second silicon substrate; a non-through hole forming step of forming a straight section of the nozzle in the first silicon substrate; a protective film forming step of forming a protective film over a first portion on the second silicon substrate that is not covered with the mask pattern layer, and over inner surfaces of the first and second silicon substrates defining the non-through hole; and an anisotropic etching step of anisotropically etching the second silicon substrate so as to form a tapered section of the nozzle defined with {111} surfaces exposed in the second silicon substrate by the anisotropic etching.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: April 1, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Shuji Takahashi
  • Publication number: 20140085377
    Abstract: There are provided an inkjet recording device that can stably secure liquid-repellent performance on a surface of a liquid-repellent film formed on a nozzle surface for a long term, and a maintenance method thereof. The inkjet recording device includes: an inkjet head that has a nozzle surface in which a nozzle opening of a nozzle to eject a liquid is formed and on which a liquid-repellent film is formed with an amorphous fluorine resin material; a cleaning portion that wipes off and cleans a surface of the liquid-repellent film by a wiping member; and a liquid-repellent performance recovery processing portion that performs liquid-repellent performance recovery processing to recover liquid-repellent performance on the surface of the liquid-repellent film by heating the liquid-repellent film.
    Type: Application
    Filed: November 27, 2013
    Publication date: March 27, 2014
    Applicant: FUJIFILM Corporation
    Inventor: Shuji TAKAHASHI
  • Publication number: 20140076842
    Abstract: A dry etching method of etching a conductive material layered on a dielectric material, comprising: using a mixed gas including a halogen gas and an oxygen gas as an etching gas, a mixing ratio of the oxygen gas in the mixed gas being equal to or greater than 30% and equal to or less than 60%; setting a gas pressure in a chamber at a time of supplying the mixed gas into the chamber and generating plasma, within a range equal to or greater than 1 Pa and less than 5 Pa; and applying a bias voltage of frequency equal to or greater than 800 kHz and less than 4 MHz as a bias voltage to an etched material in which the conductive material is layered on the dielectric material, and performing etching, wherein the dielectric material is a ferroelectric material and the conductive material is a noble metal material.
    Type: Application
    Filed: November 18, 2013
    Publication date: March 20, 2014
    Applicant: FUJIFILM Corporation
    Inventor: Shuji TAKAHASHI
  • Patent number: 8628174
    Abstract: A piezoelectric element 10 includes a supporting body 12, a lower electrode 16 that is formed over the supporting body, a piezoelectric layer 20 that is formed over the lower electrode, and an upper electrode 24 that is formed over the piezoelectric layer so as to oppose the lower electrode via the piezoelectric layer. A step portion 20A is formed at a peripheral portion of the piezoelectric layer at a side of the lower electrode such that a surface of the piezoelectric layer at the side of the lower electrode is larger than a surface of the piezoelectric layer at a side of the upper electrode.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: January 14, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Shuji Takahashi
  • Publication number: 20140002566
    Abstract: A receipt issuing apparatus includes a conveying unit conveys a receipt paper which consists of a strip-shaped thermal recording paper and on which pieces of promotion-related information are pre-printed at predetermined positions which are arranged at regular intervals in the longitudinal direction of the receipt paper, a thermal printing unit prints the detail data of a commodity transaction on the receipt paper conveyed by the conveying unit by thermal printing, a mask printing control unit overprints a mask data for hiding the information over the information printed on the receipt paper by the thermal printing unit and an issuing control unit issues a receipt by cutting off the receipt paper on which mask data is printed by the mask printing control unit at a position more upstream than the printing position of the mask data in the conveying direction of the conveying unit.
    Type: Application
    Filed: June 27, 2013
    Publication date: January 2, 2014
    Inventor: Shuji Takahashi
  • Publication number: 20130316139
    Abstract: A method for manufacturing a silicon substrate, including: performing a rapid heat treatment to a silicon substrate with a rapid-heating and rapid-cooling apparatus by maintaining the silicon substrate at a temperature that is higher than 1300° C. and not greater than a silicon melting point for 1 to 60 seconds, the silicon substrate being sliced from a silicon single crystal ingot grown by the Czochralski method; performing a first temperature decrease process down to a temperature in the range of 600 to 800° C. at a temperature decrease rate of 5 to 150° C./sec; and performing a second temperature decrease process in such a mariner that a cooling time of X seconds and a temperature decrease rate of Y° C./sec meet Y?0.15X?4.5 when X<100 and meet Y?10 when X?100.
    Type: Application
    Filed: February 2, 2012
    Publication date: November 28, 2013
    Applicant: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Tetsuya Oka, Koji Ebara, Shuji Takahashi
  • Publication number: 20130244352
    Abstract: A method of manufacturing a nozzle plate includes: a mask pattern layer forming step of, with respect to a laminated substrate constituted of a first silicon substrate having a (111) surface orientation and a second silicon substrate having a (100) surface orientation, forming a frame-shaped mask pattern layer on the second silicon substrate; a non-through hole forming step of forming a straight section of the nozzle in the first silicon substrate; a protective film forming step of forming a protective film over a first portion on the second silicon substrate that is not covered with the mask pattern layer, and over inner surfaces of the first and second silicon substrates defining the non-through hole; and an anisotropic etching step of anisotropically etching the second silicon substrate so as to form a tapered section of the nozzle defined with {111} surfaces exposed in the second silicon substrate by the anisotropic etching.
    Type: Application
    Filed: March 13, 2013
    Publication date: September 19, 2013
    Applicant: FUJIFILM CORPORATION
    Inventor: Shuji Takahashi