Patents by Inventor Shukai YE

Shukai YE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of manufacturing integrated circuits using isotropic and anisotropic etching processes
    Patent number: 10847711
    Abstract: A method of fabricating a magnetoresistive device includes etching a magnetoresistive stack using a first etching process to form one or more sidewalls, and etching the stack using a second etching process after forming the one or more sidewalls. Wherein, the second etching process may be relatively more isotropic than the first etching process.
    Type: Grant
    Filed: November 28, 2018
    Date of Patent: November 24, 2020
    Assignee: Everspin Technologies, Inc.
    Inventors: Sarin A. Deshpande, Jon Slaughter, Cong Hai, Hyunwoo Yang, Naganivetha Thiyagarajah, Shukai Ye
  • METHODS OF MANUFACTURING INTEGRATED CIRCUITS USING ISOTROPIC AND ANISOTROPIC ETCHING PROCESSES
    Publication number: 20190173004
    Abstract: A method of fabricating a magnetoresistive device includes etching a magnetoresistive stack using a first etching process to form one or more sidewalls, and etching the stack using a second etching process after forming the one or more sidewalls. Wherein, the second etching process may be relatively more isotropic than the first etching process.
    Type: Application
    Filed: November 28, 2018
    Publication date: June 6, 2019
    Applicant: Everspin Technologies, Inc.
    Inventors: Sarin A. DESHPANDE, Jon SLAUGHTER, Cong HAI, Hyunwoo YANG, Naganivetha THIYAGARAJAH, Shukai YE