Patents by Inventor Shumay Shang

Shumay Shang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Model-based SRAF insertion
    Publication number: 20060200790
    Abstract: A system for producing mask layout data retrieves target layout data defining a pattern of features, or portion thereof and an optimized mask layout pattern that includes a number of printing and non-printing features. Mask layout data for one or more subresolution assist features (SRAFs) is then defined to approximate one or more non-printing features of the optimized mask layout pattern.
    Type: Application
    Filed: September 30, 2005
    Publication date: September 7, 2006
    Inventors: Shumay Shang, Lisa Swallow, Yuri Granik