Abstract: A working control device comprises an operation lever for making a boom cylinder (36), an arm cylinder (37) and others work to drive a shovel apparatus (30), and a delivered oil amount control device (a controller (150)). A working oil supply source includes a first electric motor (M1) and a first hydraulic pump (P1). When the operation lever is subjected to a single operation, a number of the motor revolution based on the lever operation is set to control the first electric motor. When the number of motor revolution is less than a necessary minimum number of revolutions, the necessary minimum number is set to control the first electric motor (M1). When the operation lever is subjected to a composite operation, a total number of motor revolutions based on the lever operations is set. When the total number is less than a necessary minimum number of revolutions, the necessary minimum number is set to control the first electric motor (M1).

Abstract: The copper-based metal polishing composition causes Cu or Cu alloy not to be dissolved at all in immersing Cu or Cu alloy therein, and makes it possible to polish Cu or Cu alloy at a high rate in polishing treatment. Such a copper-based metal polishing composition comprises a water-soluble first organic acid capable of reaction with copper to produce a copper complex compound which is substantially insoluble in water and has a mechanical strength lower than that of copper, at least one second organic acid selected from an organic acid having a single carboxyl group and a single hydroxyl group and oxalic acid, an abrasive grain, an oxidizing agent, and water.

Abstract: The copper-based metal polishing composition causes Cu or Cu alloy not to be dissolved at all in immersing Cu or Cu alloy therein, and makes it possible to polish Cu or Cu alloy at a high rate in polishing treatment. Such a copper-based metal polishing composition comprises a water-soluble first organic acid capable of reaction with copper to produce a copper complex compound which is substantially insoluble in water and has a mechanical strength lower than that of copper, at least one second organic acid selected from an organic acid having a single carboxyl group and a single hydroxyl group and oxalic acid, an abrasive grain, an oxidizing agent, and water.

Abstract: The copper-based metal polishing composition causes Cu or Cu alloy not to be dissolved at all in immersing Cu or Cu alloy therein, and makes it possible to polish Cu or Cu alloy at a high rate in polishing treatment. Such a copper-based metal polishing composition comprises a water-soluble first organic acid capable of reaction with copper to produce a copper complex compound which is substantially insoluble in water and has a mechanical strength lower than that of copper, at least one second organic acid selected from an organic acid having a single carboxyl group and a single hydroxyl group and oxalic acid, an abrasive grain, an oxidizing agent, and water.

Abstract: The invention is a method of processing a waste liquid containing at least an organic quaternary ammonium hydroxide. The waste liquid is brought into contact with a cation-exchanging material so as to make the organic quaternary ammonium ions adsorbed by the material to thereby remove the ions from the liquid (adsorbing step), and optionally the cation-exchanged water obtained by the contact is again processed to separate and remove resist peelings and surfactants therefrom. The invention is also a method of processing the organic quaternary ammonium hydroxide-containing waste liquid for recovering a valuable substance of the organic quaternary ammonium hydroxide therefrom.

Abstract: The invention is a method of processing a waste liquid containing at least an organic quaternary ammonium hydroxide. The waste liquid is brought into contact with a cation-exchanging material so as to make the organic quaternary ammonium ions adsorbed by the material to thereby remove the ions from the liquid (adsorbing step), and optionally the cation-exchanged water obtained by the contact is again processed to separate and remove resist peelings and surfactants therefrom. The invention is also a method of processing the organic quaternary ammonium hydroxide-containing waste liquid for recovering a valuable substance of the organic quaternary ammonium hydroxide therefrom.

Abstract: A distillable liquid containing non-volatile impurities is freed of those impurities by boiling the liquid to form vapors of the liquid, passing the vapors through a packed column heated to a temperature such that liquid entrained in the vapors is completely vaporized and the non-volatile impurities remain in the packed column, and condensing the vapors from the column.

Abstract: This invention provides a process for producing silica from silica sol which comprises preparing an acidic silica sol applied with a hydrogen peroxide treatment from an aqueous solution of alkali silicate, purifying the acidic silica sol by using a cationic exchange resin after pH adjustment and preparing silica from the silica sol obtained by neutralizing the thus purified acidic silica sol, that is, a production process for highly pure silica capable of removing, Ti as much as possible in the same manner as impurities such as Fe and Al.

Abstract: An aqueous quaternary ammonium hydroxide solution is produced by a method which is characterized by the steps of synthesizing an inorganic acid salt of quaternary ammonium by the reaction of a trialkylamine with a dialkyl carbonate and the electrolyzing the inorganic acid salt with an electrolytic cell using a cation-exchange membrane as a diaphragm thereby producing quaternary ammonium hydroxide.

Abstract: A method of manufacturing quarternary ammonium hydroxide by electrolyzing a quarternary ammonium salt in an electrolytic cell whose diaphragm is prepared from a cation exchange membrane, wherein said quarternary ammonium salt is represented by an organic acid salt expressed by the general structural formula: ##STR1## where R.sub.1 to R.sub.4 =methyl radical or ethyl radical (at least R.sub.1 to R.sub.3 denote the same radical; X represents formic acid).